Advanced Search+
GE Lei(葛蕾), ZHANG Yuantao(张远涛). A Simple Model for the Calculation of Plasma Impedance in Atmospheric Radio Frequency Discharges[J]. Plasma Science and Technology, 2014, 16(10): 924-929. DOI: 10.1088/1009-0630/16/10/05
Citation: GE Lei(葛蕾), ZHANG Yuantao(张远涛). A Simple Model for the Calculation of Plasma Impedance in Atmospheric Radio Frequency Discharges[J]. Plasma Science and Technology, 2014, 16(10): 924-929. DOI: 10.1088/1009-0630/16/10/05

A Simple Model for the Calculation of Plasma Impedance in Atmospheric Radio Frequency Discharges

Funds: supported by National Natural Science Foundation of China (No. 11375107) and Independent Innovation Foundation of Shandong University of China (No. 2012TS067)
More Information
  • Received Date: November 19, 2013
  • In atmospheric radio-frequency (rf) discharges, the plasma parameters, such as elec- tron density, sheath thickness and sheath voltage, are not easy to be probed experimentally, while the electrical characteristics, such as impedance, resistance and reactance, are relatively conve- nient to be measured. In this paper we presented a simple theoretical model derived from the fluid description of generated plasmas without considering the circuit model, to investigate the relationship between the plasma impedance and plasma parameters. By introducing a relaxation frequency, the plasma impedance could be predicted by formulas presented in this study, and the mean electron density and sheath thickness can also be calculated from the measured or simulated impedance and reactance, respectively.
  • 1 Roth J R. 1995, Industrial Plasma Engineering, Principles Vol. 1. Institute of Physics, Bristol
    2 Fridman G, Friedman G, Gutsol A, et al. 2008, Plasma Process. Polym., 5: 503
    3 Park J, Henins I, Herrmann H W, et al. 2001, J. Appl.Phys., 89: 20
    4 Balcon N, Hagelaar G J M and Boeuf J P. 2008, IEEE Trans. Plasma Sci., 36: 2782
    5 Moon S Y, Phee J K, Kim D B, et al. 2006, Phys.Plasmas, 13: 033502
    6 Yuan X and Raja L L. 2003, IEEE Trans. Plasma Sci.,31: 495
    7 Shi J J and Kong M G. 2005, J. Appl. Phys., 97:023306
    8 Lou J and Zhang Y T. 2013, IEEE Trans. Plasma Sci.,42: 274
    9 Moon S Y, Kim D B, Gweon B, et al. 2008, Appl.Phys. Lett., 93: 221506
    10 Walsh J L, Iza F, and Kong M G. 2008, Appl. Phys.Lett., 93: 251502
    11 Zhang Y T, Li Q Q, Lou J, et al. 2010, Appl. Phys. Lett., 97: 141504
    12 Knake N, Niemi K, Reuter S, et al. 2008, Appl. Phys. Lett., 93: 131503
    13 Li S Z, Lim J P, Kang J G, et al. 2006, Phys. Plasmas, 13: 093503
    14 Park G Y, Hong Y J, Lee H W, et al. 2010, Plasma Process. Polym, 7: 281
    15 He J and Zhang Y T. 2012, Plasma Process. Polym, 9: 919
    16 Zhang Y T and He J. 2013, Phys. Plasmas, 20: 013502
    17 Iza F, Kim G J, Lee S M, et al. 2008, Plasma Process. Polym., 5: 322
    18 Iza F, Lee J K and Kong M G. 2007, Phys. Rev. Lett., 99: 075004
    19 Lieberman M A and Lichtenberg A J. 2005, Principles of Plasma Discharges and Materials Processing. 2nd edn, Wiley, New York
    20 Bera K, Chen C A, and Vitello P. 2002, IEEE Trans. Plasma Sci., 30: 144
    21 Zhu W C, Wang B R, Yao Z X, et al. 2005, J. Phys. D: Appl. Phys., 38: 1396
    22 Byrns B, Wooten D, Lindsay A, et al. 2012, J. Phys. D: Appl. Phys., 45: 195204
    23 Overzet L J, Jung D, Mandra M A, et al. 2010, Eur. Phys. J. D, 60: 449
    24 Zhang Y T and Cui S Y. 2011, Phys. Plasmas., 18: 083509
    25 Zhang Y T, Wang D Z and Kong M G J. 2006, Appl. Phys., 100: 063304
  • Related Articles

    [1]H J YEOM, D H CHOI, Y S LEE, J H KIM, D J SEONG, S J YOU, H C LEE. Plasma density measurement and downstream etching of silicon and silicon oxide in Ar/NF3 mixture remote plasma source[J]. Plasma Science and Technology, 2019, 21(6): 64007-064007. DOI: 10.1088/2058-6272/ab0bd3
    [2]Feng XU (徐峰), Fang DING (丁芳), Xiahua CHEN (陈夏华), Liang WANG (王亮), Jichan XU (许吉禅), Zhenhua HU (胡振华), Hongmin MAO (毛红敏), Guangnan LUO (罗广南), Zhongshi YANG (杨钟时), Jingbo CHEN (陈竞博), Kedong LI (李克栋). Electron density calculation based on Stark broadening of D Balmer line from detached plasma in EAST tungsten divertor[J]. Plasma Science and Technology, 2018, 20(10): 105102. DOI: 10.1088/2058-6272/aad226
    [3]Xiang HE (何湘), Chong LIU (刘冲), Yachun ZHANG (张亚春), Jianping CHEN (陈建平), Yudong CHEN (陈玉东), Xiaojun ZENG (曾小军), Bingyan CHEN (陈秉岩), Jiaxin PANG (庞佳鑫), Yibing WANG (王一兵). Diagnostic of capacitively coupled radio frequency plasma from electrical discharge characteristics: comparison with optical emission spectroscopy and fluid model simulation[J]. Plasma Science and Technology, 2018, 20(2): 24005-024005. DOI: 10.1088/2058-6272/aa9a31
    [4]Yong WANG (王勇), Cong LI (李聪), Jielin SHI (石劼霖), Xingwei WU (吴兴伟), Hongbin DING (丁洪斌). Measurement of electron density and electron temperature of a cascaded arc plasma using laser Thomson scattering compared to an optical emission spectroscopic approach[J]. Plasma Science and Technology, 2017, 19(11): 115403. DOI: 10.1088/2058-6272/aa861d
    [5]PAN Jie (潘杰), LI Li (李莉), WANG Yunuan (王玉暖), XIU Xianwu (修显武), WANG Chao (王超), SONG Yuzhi (宋玉志). Particle Densities of the Atmospheric-Pressure Argon Plasmas Generated by the Pulsed Dielectric Barrier Discharges[J]. Plasma Science and Technology, 2016, 18(11): 1081-1088. DOI: 10.1088/1009-0630/18/11/05
    [6]NI Gengsong (倪耿松), QIAN Muyang (钱沐杨), YANG Congying (杨丛影), LIU Sanqiu (刘三秋), WANG Dezhen (王德真). N2 Mole Fraction Dependence of Plasma Bullet Propagation in Premixed He/N2 Plasma Needle Discharge at Atmospheric Pressure[J]. Plasma Science and Technology, 2016, 18(7): 751-758. DOI: 10.1088/1009-0630/18/7/09
    [7]ZHOU Qiujiao (周秋娇), QI Bing (齐冰), HUANG Jianjun (黄建军), PAN Lizhu (潘丽竹), LIU Ying (刘英). Measurement of Electron Density and Ion Collision Frequency with Dual Assisted Grounded Electrode DBD in Atmospheric Pressure Helium Plasma Jet[J]. Plasma Science and Technology, 2016, 18(4): 400-405. DOI: 10.1088/1009-0630/18/4/12
    [8]CHI Yangyang(匙阳阳), ZHANG Yuantao(张远涛). Theoretical Study on the Characteristics of Atmospheric Radio Frequency Discharges by Altering Electrode Gap[J]. Plasma Science and Technology, 2014, 16(6): 582-587. DOI: 10.1088/1009-0630/16/6/08
    [9]M. M. MORSHED, S. M. DANIELS. Electron Density and Optical Emission Measurements of SF6/O2 Plasmas for Silicon Etch Processes[J]. Plasma Science and Technology, 2012, 14(4): 316-320. DOI: 10.1088/1009-0630/14/4/09
    [10]DENG Yongfeng(邓永锋), TAN Chang(谭畅), HAN Xianwei(韩先伟), TAN Yonghua(谭永华). Numerical Simulation of the Self-Heating Effect Induced by Electron Beam Plasma in Atmosphere[J]. Plasma Science and Technology, 2012, 14(2): 89-93. DOI: 10.1088/1009-0630/14/2/01

Catalog

    Article views (218) PDF downloads (1823) Cited by()

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return