Citation: | LIU Huiping(刘惠平), ZOU Xiu(邹秀), QIU Minghui(邱明辉). Sheath Criterion for an Electronegative Plasma Sheath in an Oblique Magnetic Field[J]. Plasma Science and Technology, 2014, 16(7): 633-636. DOI: 10.1088/1009-0630/16/7/01 |
1.Valentini H B. 1996, Phys. Plasmas, 3: 1459.
|
2.Valentini H B, Herrmann F. 1996, J. Phys. D: Appl..Phys., 29: 1175.
|
3.Riemann K U. 1991, J. Phys. D: Appl. Phys., 24: 493.
|
4.Riemann K U. 1991, Phys. Fluids B, 3: 3331.
|
5.Riemann K U, Meyer P. 1996, Phys. Plasmas, 3: 4751.
|
6.Riemann K U. 1997, Phys. Plasmas, 4: 4158.
|
7.Chen X P. 1998, Phys. Plasmas, 5: 804.
|
8.Franklin N R, Snell J. 2000, Phys. Plasmas, 7: 3077.
|
9.Liu J Y, Wang Z X, Wang X G. 2003, Phys. Plasmas,10: 3032.
|
10.Liu J Y, Wang Z X, Wang X G, et al. 2003, Phys.Plasmas, 10: 3507.
|
11.Chodura R. 1982, Phys. Fluids, 25: 1628.
|
12.Stangeby P C. 1995, Phys. Plasmas, 2: 702.
|
13.Riemann K U. 1994, Phys. Plasmas, 1: 552.
|
14.Valsaque F, Manfredi G. 2001, J. Nucl. Mater., 290- 293: 763.
|
15.Femandez Palop J I, Ballesteros J, Colomer V, et al.1995, J. Appl. Phys., 77: 2937.
|
16.Femandez Palop J I, Colomer V, Ballesteros J, et al.1996, Surface and Coatings Technology, 84: 341.
|
17.Wang Z X, Liu J Y, Zou X, et al. 2003, Chin. Phys.Lett., 20: 1537.
|
18.Gong Y, Duan P, Zhang J H, et al. 2010, Chinese Journal of Computational Physics, 27: 883.
|
19.Ji Y K, Zou X, Liu H P, et al. 2011, Plasma Science and Technology, 13: 519.
|
20.Ghomi H. 2011, J. Fusion Energ., 30: 481.
|
21.Yasserian K, Aslaninejad M. 2012, Phys. Plasmas, 19:073507.
|
22.Hatami M M, Shokri B. 2013, Phys. Plasmas,.20:033506.
|
23.Li J J, Ma J X, Wei Z A. 2013, Phys. Plasmas, 20:063503.
|
24.Amemiya H, Annaratone B M, Allen J E. 1998, J.Appl. Phys., 60: 81.
|
25.Ming L, Michael A V, Steven K D, et al. 2000, IEEE.Transactions on Plasma Science, 28: 248.
|
26.Hatami M M, Shokri B, Niknam A R. 2008, Phys.Plasmas, 15: 123501.
|
27.Qiu M H, Liu H P, Zou X. 2012, Acta Phys. Sin., 60:155204 (in Chinese).
|