The Spatial Effects of Antenna Configuration in a Large Area Inductively Coupled Plasma System for Flat Panel Displays

Seon-Geun OH; Young-Jun LEE; Jae-Hong JEON; Jong-Hyeon SEO; Hee-Hwan CHOE

doi:10.1088/1009-0630/16/8/06

Plasma Science and Technology > 2014 > 16(8): 758-766. > DOI: 10.1088/1009-0630/16/8/06

Seon-Geun OH, Young-Jun LEE, Jae-Hong JEON, Jong-Hyeon SEO, Hee-Hwan CHOE. The Spatial Effects of Antenna Configuration in a Large Area Inductively Coupled Plasma System for Flat Panel Displays[J]. Plasma Science and Technology, 2014, 16(8): 758-766. DOI: 10.1088/1009-0630/16/8/06

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The Spatial Effects of Antenna Configuration in a Large Area Inductively Coupled Plasma System for Flat Panel Displays

1 School of Electronics, Telecommunication and Computer Engineering, Korea Aerospace University, Goyang-si, South Korea 2 Department of Material Science and Engineering, Korea Aerospace University, Goyang-si, South Korea

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Received Date: September 02, 2013

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Spatial distributions of plasma parameters such as electron density, electron temperature and electric potential were investigated using a commercial simulation software (COMSOL ^TM ) to predict the effects of antenna configuration in a large area inductively cou- pled plasma (ICP) system for flat panel displays. Nine planar antenna sets were evenly placed above a ceramic window. While the electron density was influenced by both the input current and gas pressure, the electron temperature and electric potential were dominantly affected by the gas pressure.
- plasma,
- ICP,
- antenna configuration,
- simulation

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