1 Konstantinou I K, Albanis T A. 2004, Appl. Catal. B:Environ., 49: 1 2 Jin X L, Wang X Y, Wang Q F, et al. 2010, Water Sci.Technol., 62: 1457 3 Liu Y N, Tian L, Li R, et al. 2013, Water Sci. Technol.,68: 1288 4 Manoj Kumar Reddy P, Ramaraju B, Subrahmanyam C. 2013, Water Sci. Technol., 67: 1097 5 Lukes P, Locke B R. 2005, J. Phys. D: Appl. Phys.,38: 4074 6 Liu Y, Wang D, Sun B, et al. 2010, J. Hazard. Mater.,181: 1010 7 Mok Y S, Jo J O, Whitehead J C. 2008, Chem. Eng.J., 142: 56 8 Sato M, Tokutake T, Ohshima T, et al. 2008, IEEE Trans. Ind. Appl., 44: 1397 9 Lu X P, Pan Y, Liu K F, et al. 2002, J. Appl. Phys.,91: 24 10 Hao X L, Zhou M H, Lei L C. 2007, J. Hazard. Mater.,141: 475 11 Grabowski L R, van Veldhuizen E M, Pemen A J M,et al. 2006, Plasma Chem. Plasma Process., 26: 3 12 Sano N, Kawashima T, Fujikawa J, et al. 2002, Ind.Eng. Chem. Res., 41: 5906 13 Faungnawakij K, Sano N, Charinpanitkul T, et al.2006, Environ. Sci. Technol., 40: 1622 14 Schiorlin M, Marotta E, Dal Molin M, et al. 2013, Environ. Sci. Technol., 47: 542 15 Shao G, Li J, Wang W L, et al. 2004, J. Electrostat.,62: 1 16 Sugiarto A T, Ohshima T, Sato M. 2002, Thin Solid Films, 407: 174 17 Li S, Ma X, Jiang Y, et al. 2014, Ecotoxicol. Environ.Saf., 106: 146 18 Hijosa-Valsero M, Molina R, Bayona J M. 2014, Environ. Technol., 35: 1418 19 Malik M A, Ubaid-ur-Rehman, Ghaffar A, et al. 2002,Plasma Sources Sci. Technol., 11: 236 20 Sugiarto A T, Ito S, Ohshima T, et al. 2003, J. Electrostat., 58: 135 21 Burlica R, Kirkpatrick M J, Finney W C, et al. 2004,J. Electrostat., 62: 309 22 Gao J Z, Ma D P, Guo X, et al. 2008, Plasma Sci.Technol., 10: 422 23 Gong J Y, Cai W M. 2007, Plasma Sci. Technol., 9:190 24 Malik M A. 2010, Plasma Chem. Plasma Process., 30:21 25 Akishev Y S, Deryugin A A, Kochetov I V, et al. 1993,J. Phys. D: Appl. Phys., 26: 1630 26 Qi B, Ren C S, Ma T C, et al. 2006, Acta Physica Sinica, 55: 331 27 Chen J H, Davidson J H. 2002, Plasma Chem. Plasma Process., 22: 199 28 Chen H F, Su P H, Yang S, et al. 2008, J. Adv. Oxid.Technol., 11: 116 29 Suarasan I, Ghizdavu L, Ghizdavu I. 2002, J. Electrostat., 54: 207 30 Akishev Y, Goossens O, Callebaut T, et al. 2001, J.Phys. D: Appl. Phys., 34: 2875 31 Henson B L. 1981, J. Appl. Phys., 52: 52709 32 Meng X B, Zhang H, Zhu J X. 2008, J. Phys. D: Appl.Phys., 41: 065209 33 Callebaut T, Kochetov I, Akishev Y, et al. 2004,Plasma Sources Sci. Technol., 13: 245 34 Ge H, Yan L, Mi D, et al. 2012, Spectrosc. Spect.Anal., 32: 886 35 Chang J S. 1993, NATO ASI Ser., Ser. G, 34: 1 36 Zhang Y Z, Zheng J T, Qu X F, et al. 2008, Chemosphere, 70: 1518 37 Bo L, Quan, X, Chen S, et al. 2006, Water Res., 40:3061 38 Xu H, Zhang D X, Xu W G. 2008, J. Hazard. Mater.,158: 445 39 Riga A, Soutsas K, Ntampegliotis K, et al. 2007, Desalination, 211: 72
|