The Characteristics of Columniform Surface Wave Plasma Excited Around a Quartz Rod by 2.45 GHz Microwaves

WU Zhonghang (吴忠航); LIANG Rongqing (梁荣庆); Masaaki NAGATSU (永津雅章); CHANG Xijiang (昌锡江)

doi:10.1088/1009-0630/18/10/04

Plasma Science and Technology > 2016 > 18(10): 987-991. > DOI: 10.1088/1009-0630/18/10/04

WU Zhonghang (吴忠航), LIANG Rongqing (梁荣庆), Masaaki NAGATSU (永津雅章), CHANG Xijiang (昌锡江). The Characteristics of Columniform Surface Wave Plasma Excited Around a Quartz Rod by 2.45 GHz Microwaves[J]. Plasma Science and Technology, 2016, 18(10): 987-991. DOI: 10.1088/1009-0630/18/10/04

Citation:

PDF (302 KB)

The Characteristics of Columniform Surface Wave Plasma Excited Around a Quartz Rod by 2.45 GHz Microwaves

1School of Medical Imaging, Shanghai University of Medicine and Health Sciences, Shanghai 201318, China 2Department of Light Sources and Illuminating Engineering, Fudan University, Shanghai 200433, China 3Graduate School of Science and Engineering, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8561, Japan 4School of Electronic and Electrical Engineering, Shanghai University of Engineering Science, Shanghai 201620, China

Funds: supported in part by National Natural Science of Foundation of China (Nos. 11005021, 51177017 and 11175049), the Grants-in-Aid for Scientific Research of Japan Society for the Promotion of Science (No. 21110010) and the Fudan University Excellent Doctoral Research Program (985 project) and the Ph.D Programs Foundation of Ministry of Education of China (No. 20120071110031)

More Information

Received Date: November 10, 2015

Graphical Abstract

Abstract

Abstract

A novel surface wave plasma (SWP) source excited with cylindrical Teflon waveguide has been developed in our previous work. The plasma characteristics have been simply studied. In this work, our experimental device has been significantly improved by replacing the Teflon waveguide with a quartz rod, and then better microwave coupling and higher gas purity can be obtained during plasma discharge. The plasma spatial distributions, both in radial and axial directions, have been measured and the effect of gas pressure has been investigated. Plasma density profiles indicate that this plasma source can produce uniform plasma in an axial direction at low pressure, which shows its potential in plasma processing on a curved surface such as an inner tube wall. A simplified circular waveguide model has been used to explain the principle of plasma excitation. The distinguishing features and potential application of this kind of plasma source with a hardware improvement have been shown.
- 2.45 GHz microwave,
- surface wave plasma,
- circular waveguide,
- plasma diagnosis

FullText(HTML)

References (1)

References

1 Moisan M, Beaudry C and Leprince P. 1975, IEEE Trans. Plasma Sci., PS-3: 55 2 Tuda M and Ono K. 1998, J. Vac. Sci. Technol. A, 16:2832 3 Tuda M, Ono K, Ootera H, et al. 2000, J. Vac. Sci.Technol. A, 18: 840 4 Kousaka H and Ono K. 2002, Jpn. J. Appl. Phys., 41:2199 5 Kousaka H and Ono K. 2003, Plasma Sources Sci.Technol., 12: 273 6 Yeh Y S, Iriyama Y, Matsuzawa Y, et al. 1988, J.Biomed. Mater. Res., 22: 795 7 Komachi K and Kobayashi S. 1989, J. Microwave Power Electromag. Energ., 25: 236 8 Werner F, Korzec D and Engemann J. 1994, Plasma Sources Sci. Technol., 3: 473 9 Odrobina I, Kúdela J and Kando M. 1998, Plasma Sources Sci. Technol., 7: 238 10 Nagatsu M, Xu G, Yamage M, et al. 1996, Jpn. J.Appl. Phys., 35: L341 11 Nagatsu M, Ito A, Toyoda N, et al. 1999, Jpn. J. Appl.Phys., 38: L679 12 Nagatsu M, Sano T, Takada N, et al. 2000, Jpn. J.Appl. Phys., 39: L929 13 Chang X, Kunii K, Liang R, et al. 2013, Plasma Sources Sci. Technol., 22: 1011 14 Kousaka H, Umehara N, Ono K, et al. 2005, Jpn. J.Appl. Phys., 44: L1154 15 Xu J, Fan H, Kousaka H, et al. 2007, Diam. Rel.Mater., 16: 161 16 Kousaka H and Umehara N. 2006, Vacuum, 80: 806 17 Xu J, Kousaka H, Umehara N, et al. 2006, Surf. Coat.Technol., 201: 408 18 Nie Z F, Liu F, Zhou Q H, et al. 2009, EPL, 86: 35001 19 Wu Z H, Chang X J, He L, et al. 2012, EPL, 100:25001 20 Libermann M A and Lichtenberg A J. 1994, Principles of Plasma Discharges and Materials Processing. Wiley,New York, p.443

Cited By