1 Coburn J W, Winters H F. 1983, Annual Review of Materials Research, 13: 91 2 Lieberman M A, Lichtenberg A J. 2005, Principles of Plasma Discharges and Materials Processing. Wiley, New York 3 Georgieva V, Bogaerts A, Gijbels R. 2003, Journal of Applied Physics, 94: 3748 4 Lee J K, Babaeva N Y, Kim H C, et al. 2004, IEEE Transactions on Plasma Science, 32: 47 5 Lee J K, Manuilenko O V, Babaeva N Y, et al. 2005, Plasma Sources Science and Technology, 14: 89 6 Gans T, Schulze J, O'Connell D, et al. 2006, Applied Physics Letters, 89: 261502 7 Sharma S, Turner M M. 2013, Journal of Physics D: Applied Physics, 46: 285203 8 Sharma S, Turner M M. 2013, Plasma Sources Science and Technology, 22: 35014 9 Goto H H, Lowe H D, Ohmi T. 1993, IEEE Transactions on Semiconductor Manufacturing, 6: 58 10 Kitajima T, Takeo Y, Petrovic Z L, et al. 2000, Applied Physics Letters, 77: 489 11 Robiche J, Boyle P C, Turner M M, et al. 2003, Journal of Physics D: Applied Physics, 36: 1810 12 Lu Y, Yan D, Chen Y. 2009, Journal of Hydrodynamics, Ser. B, 21: 814 13 Lafleur T, Delattre P A, Johnson E V, et al. 2012, Applied Physics Letters, 101: 124104 14 Lieberman M A, Booth J P, Chabert P, et al. 2002, Plasma Sources Science and Technology, 11: 283 15 Sansonnens L, Howling A A, Hollenstein C. 2006, Plasma Sources Science and Technology, 15: 302 16 Hebner G A, Barnat E V, Miller P A, et al. 2006, Plasma Sources Science and Technology, 15: 879 17 Miller P A, Barnat E V, Hebner G A, et al. 2006, Plasma Sources Science and Technology, 15: 889 18 Chabert P. 2007, Journal of Physics D: Applied Physics, 40: R63 19 Lee I, Graves D B, Lieberman M A. 2008, Plasma Sources Science and Technology, 17: 15018 20 Eremin D, Hemke T, Brinkmann R P, et al. 2013, Journal of Physics D: Applied Physics, 46: 84017 21 Liu Y X, Zhang Y R, Bogaerts A, et al. 2015, Journal of Vacuum Science and Technology A, 33: 20801 22 Zhao G, Xu Y, Shang J, et al. 2011, Plasma Science and Technology, 13: 61 23 Schmidt H, Sansonnens L, Howling A A, et al. 2004, Journal of Applied Physics, 95: 4559 24 Schmidt N, Schulze J, Sch?ungel E, et al. 2013, Journal of Physics D: Applied Physics, 46: 505202 25 Volynets V, Shin H, Kang D, et al. 2010, Journal of Physics D: Applied Physics, 43: 85203 26 Zhang Y R, Xu X, Bogaerts A, et al. 2012, Journal of Physics D: Applied Physics, 45: 15202 27 Chen Z, Kenney J, Rauf S, et al. 2011, IEEE Transactions on Plasma Science, 39: 2526 28 Jung P G, Hoon S S, Wook C C, et al. 2013, Plasma Sources Science and Technology, 22: 55005 29 COMSOL. V4.4. 2013, PlasmaModelLibraryManual 30 Passchier J D P, Goedheer W J. 1993, Journal of Applied Physics, 74: 3744 31 Nitschke T E, Graves D B. 1994, Journal of Applied Physics, 76: 5646 32 Hagelaar G J M, Pitchford L C. 2005, Plasma Sources Science and Technology, 14: 722 33 Wang S, Xu X, Song Y, et al. 2008, Plasma Science and Technology, 10: 57 34 Phelps A V. Database. www.lxcat.net
|