Simulation of Dual-Electrode Capacitively Coupled Plasma Discharges

LU Yijia (路益嘉); JI Linhong (季林红); CHENG Jia (程嘉)

doi:10.1088/1009-0630/18/12/06

Plasma Science and Technology > 2016 > 18(12): 1175-1180. > DOI: 10.1088/1009-0630/18/12/06

LU Yijia (路益嘉), JI Linhong (季林红), CHENG Jia (程嘉). Simulation of Dual-Electrode Capacitively Coupled Plasma Discharges[J]. Plasma Science and Technology, 2016, 18(12): 1175-1180. DOI: 10.1088/1009-0630/18/12/06

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Simulation of Dual-Electrode Capacitively Coupled Plasma Discharges

State Key Laboratory of Tribology, Department of Mechanical Engineering, Tsinghua University, Beijing 100081, China

Funds: supported by National Natural Science Foundation of China (No. 51405261)

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Received Date: December 17, 2015

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Abstract

Abstract

Dual-electrode capacitively coupled plasma discharges are investigated here to lower the non-uniformity of plasma density. The dual-electrode structure proposed by Jung splits the electrode region and increases the flexibility of fine tuning non-uniformity. Different RF voltages, frequencies, phase-shifts and electrode areas are simulated and the influences are discussed. RF voltage and electrode area have a non-monotonic effect on non-uniformity, while frequency has a monotonic effect. Phase-shift has a cyclical influence on non-uniformity. A special combination of 224 V voltage and 11% area ratio with 10 MHz lowers the non-uniformity of the original set (200 V voltage and 0% area ratio with 10 MHz) by 46.5%. The position of the plasma density peak at the probe line has been tracked and properly tuning the phase-shift can obtain the same trace as tuning frequency or voltage.
- dual-electrode,
- non-uniformity,
- capacitively coupled plasma,
- fluid model

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References

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