| Citation: |
ZHAO Xiaoling (赵小令), JIAO Juntao (焦俊韬), LI Bing (李冰), XIAO Dengming (肖登明). The Electronegativity Analysis of c-C4F8 as a Potential Insulation Substitute of SF6 [J]. Plasma Science and Technology, 2016, 18(3): 292-298. DOI: 10.1088/1009-0630/18/3/13
|
|
1 Dincer M, Aydin T. 1994, IEEE Transactions on Dielectrics and Electrical Insulation, 1: 139 2 Liu X L, Wang W J, Wang Y A, et al. 2008, Journal of Physics D: Applied Physics, 41: 015206 3 Xiao D M, Zhu L L, Chen Y Z. 1999, Journal of Physics D: Applied Physics, 32: L18 4 Xiao D M, Zhu L L, Li X G. 2000, Journal of Physics D: Applied Physics, 33: L145 5 De Urquijo J, Basurto E. 2001, Journal of Physics D:Applied Physics, 34: 2151 6 Wu Y, Wang W Z, Rong M Z, et al. 2014, IEEE Transaction on Dielectrics and Electrical Insulation, 21: 129 7 Wang W Z, Wu Y, Rong M Z, et al. 2012, Journal of Physics D: Applied Physics, 45: 285201 8 Christophorou L G, Olthoff J K. 1999, J. Phys. Chem.Ref. Data, 28: 967 9 Nema R S, Kulkarni S V, Husain E. 1982, Electron Swarm Parameters in and Gas Mixtures from Boltzmann Equation Analysis. Gaseous Dielectrics III.Knoxville, Tennessee, USA 10 Christophorou L G, Olthoff J K. 2001, J. Phys. Chem.Ref. Data, 30: 449 11 Fehsenfeld F C. 1970, The Journal of Chemical Physics, 53: 2000 12 Henis J M S, Mabie C A. 1970, The Journal of Chemical Physics, 53: 2999 13 Woodin R L, Foster M S, Beauchamp J L. 1980, The Journal of Chemical Physics, 72: 4223 14 Itoh H, Miyachi T, Kawaguchi M, et al. 1991, Journal of Physics D: Applied Physics, 24: 277 15 Kono A, Kato K. 2000, Applied Physics Letters, 77:495 16 Deng Y K, Lu C D, Xiao D M. 2012, IEEE Transactions on Plasma Science, 40: 2671 17 Hagelaar G J M, Pitchford L C. 2005, Plasma Sources Science and Technology, 14: 722 18 Hagelaar G J M. 2000, Modeling of Microdischarges for Display Technology. Technische Universiteit Eindhoven, Holland 19 Gogolides E, Sawin H H. 1992, Journal of Applied Physics, 72: 3971 20 Kee R J, Coltrin M E, Glarborg P. 2003, Chemically Reacting Flow Theory and Practice. John Wiley &Sons, USA 21 Bird R B, Stewart W E, Lightfoot E N. 2002, Transport Phenomena. John Wiley & Sons, USA 22 Deng Y K, Xiao D M. 2012, The European Physical Journal Applied Physics, 57: 20801 23 Liu X L, Xiao D M. 2007, The European Physical Journal Applied Physics, 38: 269 24 Yousfi M, Segur P, Vassiliadis T, et al. 1985, Journal of Physics D: Applied Physics, 18: 359 25 Christophorou L G, Olthoff J K. 2000, J. Phys. Chem.Ref. Data, 29: 267 26 Pitchford L C, Oneil S V, Rumble J R. 1981, Physical Review A, 23: 294 27 Michael A L, Allan J L. 2005, Principles of Plasma Discharge and Materials Processing (Second Edition).John Wiley & Sons, USA 28 Chen B, Chen S, Chen K, et al. 2014, Vacuum, 51: 19 (in Chinese)
|
| [1] | Vukoman JOKANOVIC, Bozana COLOVIC, Anka TRAJKOVSKA PETKOSKA, Ana MRAKOVIC, Bojan JOKANOVIC, Milos NENADOVIC, Manuela FERRARA, Ilija NASOV. Optical properties of titanium oxide films obtained by cathodic arc plasma deposition[J]. Plasma Science and Technology, 2017, 19(12): 125504. DOI: 10.1088/2058-6272/aa8806 |
| [2] | Jiaojiao LI (李娇娇), Qianghua YUAN (袁强华), Xiaowei CHANG (常小伟), Yong WANG (王勇), Guiqin YIN (殷桂琴), Chenzhong DONG (董晨钟). Deposition of organosilicone thin film from hexamethyldisiloxane (HMDSO) with 50kHz/ 33MHz dual-frequency atmospheric-pressure plasma jet[J]. Plasma Science and Technology, 2017, 19(4): 45505-045505. DOI: 10.1088/2058-6272/aa57e4 |
| [3] | LI Hailing(李海玲), WANG Qing(王庆), BA Dechun(巴德纯). Helium Plasma Damage of Low-k Carbon Doped Silica Film: the Effect of Si Dangling Bonds on the Dielectric Constant[J]. Plasma Science and Technology, 2014, 16(11): 1050-1053. DOI: 10.1088/1009-0630/16/11/09 |
| [4] | LI Zebin(李泽斌), WU Zhonghang(吴忠航), JU Jiaqi(居家奇), HE Kongduo(何孔多), CHEN Zhenliu(陈枕流), YANG Xilu(杨曦露), YAN Hang(颜航), OU Qiongrong(区琼荣), LIANG Rongqing(梁荣庆). Enhanced Work Function of Al-Doped Zinc-Oxide Thin Films by Oxygen Inductively Coupled Plasma Treatment[J]. Plasma Science and Technology, 2014, 16(1): 79-82. DOI: 10.1088/1009-0630/16/1/17 |
| [5] | WANG Xiaomin(王晓敏), YUAN Qianghua(袁强华), ZHOU Yongjie(周永杰), YIN Guiqin(殷桂琴), DONG Chenzhong(董晨钟). Deposition of Polymer Thin Film Using an Atmospheric Pressure Micro-Plasma Driven by Dual-Frequency Excitation[J]. Plasma Science and Technology, 2014, 16(1): 68-72. DOI: 10.1088/1009-0630/16/1/15 |
| [6] | I. A. KHAN, R. S. RAWAT, R. VERMA, G. MACHARAGA, R. AHMAD, Z. A. UMAR, et al.. Role of Ion Beam Irradiation and Annealing Effect on the Deposition of AlON Nanolayers by Using Plasma Focus Device[J]. Plasma Science and Technology, 2013, 15(11): 1127-1135. DOI: 10.1088/1009-0630/15/11/10 |
| [7] | ZHAO Yong (赵勇), CHEN Xian (陈贤), FANG Liguang (方利广), YANG Lianfang (杨莲芳), et al.. Effects of Annealing on the Structural and Photoluminescent Properties of Ag-Doped ZnO Nanowires Prepared by Ion Implantation[J]. Plasma Science and Technology, 2013, 15(8): 817-820. DOI: 10.1088/1009-0630/15/8/19 |
| [8] | XIONG Yuqing, SANG Lijun, CHEN Qiang, YANG Lizhen, WANG Zhengduo, LIU Zhongwei. Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films[J]. Plasma Science and Technology, 2013, 15(1): 52-55. DOI: 10.1088/1009-0630/15/1/09 |
| [9] | XIONG Liwei (熊礼威), WANG Jianhua (汪建华), LIU Fan (刘繁), MAN Weidong (满卫东), et al. Deposition and Boron Doping of Nano-Crystalline Diamond Thin Films on Poly-crystalline Diamond Thick Films[J]. Plasma Science and Technology, 2012, 14(10): 905-908. DOI: 10.1088/1009-0630/14/10/09 |
| [10] | YUAN Ying (袁颖), YE Chao (叶超), CHEN Tian (陈天), GE Shuibin (葛水兵), LIU Huiming (刘卉敏), CUI Jin (崔进), XU Yijun (徐轶君), DENG Yanhong (邓艳红), NING Zhaoyuan (宁兆元). C2F6/O2/Ar Plasma Chemistry of 60MHz/2MHz Dual- frequency Discharge and Its Effect on Etching of SiCOH Low-k Films[J]. Plasma Science and Technology, 2012, 14(1): 48-53. DOI: 10.1088/1009-0630/14/1/11 |
Supported by: Beijing Renhe Information Technology Co., Ltd. 
DownLoad: