Characteristics of Single Cathode Cascaded Bias Voltage Arc Plasma

OU Wei (欧巍); DENG Baiquan (邓柏权); ZENG Xianjun (曾宪俊); GOU Fujun (芶富均); XUE Xiaoyan (薛晓艳); ZHANG Weiwei (张卫卫); CAO Xiaogang (曹小岗); YANG Dangxiao (杨党校); CAO Zhi (曹智)

doi:10.1088/1009-0630/18/6/08

Plasma Science and Technology > 2016 > 18(6): 627-633. > DOI: 10.1088/1009-0630/18/6/08

OU Wei (欧巍), DENG Baiquan (邓柏权), ZENG Xianjun (曾宪俊), GOU Fujun (芶富均), XUE Xiaoyan (薛晓艳), ZHANG Weiwei (张卫卫), CAO Xiaogang (曹小岗), YANG Dangxiao (杨党校), CAO Zhi (曹智). Characteristics of Single Cathode Cascaded Bias Voltage Arc Plasma[J]. Plasma Science and Technology, 2016, 18(6): 627-633. DOI: 10.1088/1009-0630/18/6/08

Citation:

PDF (384 KB)

Characteristics of Single Cathode Cascaded Bias Voltage Arc Plasma

1Institute of Nuclear Science and Technology, Sichuan University, Chengdu 610064, China 2Southwestern Institute of Physics, Chengdu 610041, China 3HOPE Innovations Inc., Mississauga, Ontario L40A5, Canada

Funds: supported by the International Thermonuclear Experimental Reactor (ITER) Program Special of Ministry of Science and Technology (No. 2013GB114003), and National Natural Science Foundation of China (Nos. 11275135, 11475122)

More Information

Received Date: May 14, 2015

Graphical Abstract

Abstract

Abstract

A single cathode with a cascaded bias voltage arc plasma source has been developed with a new quartz cathode chamber, instead of the previous copper chambers, to provide better diagnostic observation and access to the plasma optical emission. The cathode chamber cooling scheme is also modi?ed to be naturally cooled only by light emission without cooling water to improve the optical thin performance in the optical path. A single-parameter physical model has been developed to describe the power dissipated in the cascaded bias voltage arc discharge argon plasmas, which have been investigated by utilizing optical emission spectroscopy (OES) and Langmuir probe. In the experiments, discharge currents from 50 A to 100 A, argon flow rates from 800 sccm to 2000 sccm and magnetic fields of 0.1 T and 0.2 T were chosen. The results show: (a) the relationship between the averaged resistivity and the averaged current density exhibits an empirical scaling law as ηˉ∝ˉj-0.63369 and the power dissipated in the arc has a strong relation with the filling factor; (b) through the quartz, the argon ions optical emission lines have been easily observed and are dominating with wavelengths between 340 nm and 520 nm, which are the emissions of Ar+-434.81 nm and Ar+-442.60 nm line, and the intensities are increasing with the arc current and decreasing with the inlet argon flow rate; and (c) the electron density and temperature can reach 2.0 × 1019 m-3 and 0.48 eV, respectively, under the conditions of an arc current of 90 A and a magnetic field of 0.2 T. The half-width of the ne radial profile is approximatively equal to a few Larmor radii of electrons and can be regarded as the diameter of the plasma jet in the experiments.
- plasma source,
- cascaded arc,
- quartz chamber,
- single cathode

FullText(HTML)

References (1)

References

1 Rapp J, Koppers W R, van Eck H J N and van Rooij G J. 2010, Fusion Eng. Des., 85: 1455 2 van Rooij G J, Al R S, Brezinsek S, et al. 2007, Carbon erosion experiments in the ITER relevant flux regime. 34th EPS Conference on Plasma Physics, Warsaw 3 Kaufmann M and Neu R. 2007, Fusion Eng. Des., 82:521 4 Causey R A and Walsh D S. 1998, J. Nucl. Mater.,254: 84 5 Deng B Q, Li Z X, Li C Y, et al. 2011, Nucl. Fusion,51: 073041 6 Ou W, Zheng X J, Gou F J, et al. 2015, Nucl. Fusion,55: 043015 7 Xiao W W, Zou X L, Ding X T, et al. 2010, Phys. Rev.Lett., 104: 215001 8 Zhong W L, Shi Z B, Zou X L, et al. 2011, Rev. Sci.Instrum., 82: 103508 9 Duan Y M, Hu L Q, Mao S T, et al. 2012, Rev. Sci.Instrum., 83: 093501 10 Zhang X, Yuan Y, Xie X F, et al. 2013, Rev. Sci. Instrum., 84: 033506 11 Li E Z, Hu L Q, Ling B L, et al. 2010, Rev. Sci. Instrum., 81: 073506 12 Shen B, Sun Y W, Wan B N, et al. 2007, Rev. Sci.Instrum., 78: 093501 13 Takashima T, Ohta M, Shimizu M. 1978, Rev. Sci.Instrum., 49: 194 14 Giacomelli L, Zimbal A, Tittelmeier K, et al. 2011,Rev. Sci. Instrum., 82: 123504 15 Wright G M, Kleyn A W, Alves E, et al. 2009, J. Nucl.Mater., 390-391: 610 16 van Rooij G J, Westerhout J, Brezinsek S, et al. 2011,J. Nucl. Mater., 415: S137 17 Temmerman G De, van den Berg M A, Scholten J,et al. 2013, Fusion Eng. Des., 88: 483 18 Goebel D M, Campbell G, Conn R W. 1984, J. Nucl.Mater., 121: 277 19 Ye M Y, Takamura S, Ohno N. 1997, J. Nucl. Mater.,241-243: 1243 20 Ezumi N, Nishijima D, Kojima H, et al. 1999, J. Nucl.Mater., 266: 337 21 Vijvers W A J, van Gils C A J, Goedheer W J, et al.2008, Phys. Plasmas, 15: 093507 22 Vijvers W A J, de Groot B, Al R S, et al. 2009, Fusion Eng. Des., 84: 1933 23 Peerenboom K S C, van Dijk J, Goedheer W J, et al.2014, Plasma Sources Sci. Technol., 23: 025003 24 Matlock T S, Goebel D M, Conversano R, et al. 2014,Plasma Sources Sci. Technol., 23: 025014 25 Blackwell B D, Caneses J F and Samuell C M R, et al.2014, Plasma Sources Sci. Technol., 21: 055033 26 Takahashi K, Sato D, Takaki K, et al. 2013, Plasma Sources Sci. Technol., 22: 055002 27 Cao X, Chen S, Zhang W, et al. 2014, Fusion Eng.Des., 89: 2919 28 Cao X, Ou W, Tian S, et al. 2014, Fusion Eng. Des.,89: 2864 29 Cao X, Xia Yuxi, Chen Bingzhou, et al. 2015, Plasma Sci. Technol., 17: 20 30 Veremiyenko V. 2006, An ITER-relevant Magnetised Hydrogen Plasma Jet [Ph.D]. Eindhoven University of Technology, the Netherlands 31 Dahiya R P, de Graaf M J, Swelsen R J, et al. 1994,Phys. Plasmas, 1: 2086 32 Crintea D L, Czarnetzki U, Iordanova S, et al. 2009,J. Phys. D: Appl. Phys., 42: 45208

[1]	Jier QIU (邱吉尔), Deping YU (余德平), Yihong LI (李裔红), Lei LI (李磊), Tong YANG (杨彤), Yuqing DONG (董宇庆). Design and characteristics of a triple-cathode cascade plasma torch for spheroidization of metallic powders[J]. Plasma Science and Technology, 2020, 22(11): 115503. DOI: 10.1088/2058-6272/aba8ed
[2]	Mingming SUN (孙明明), Tianping ZHANG (张天平), Xiaodong WEN (温晓东), Weilong GUO (郭伟龙), Jiayao SONG (宋嘉尧). Plasma characteristics in the discharge region of a 20A emission current hollow cathode[J]. Plasma Science and Technology, 2018, 20(2): 25503-025503. DOI: 10.1088/2058-6272/aa8edb
[3]	Xin SONG (宋鑫), Qing WANG (王庆), Zeng LIN (蔺增), Puhui ZHANG (张谱辉), Shuhao WANG (王书豪). Control of vacuum arc source cathode spots contraction motion by changing electromagnetic field[J]. Plasma Science and Technology, 2018, 20(2): 25402-025402. DOI: 10.1088/2058-6272/aa8a30
[4]	Yong WANG (王勇), Cong LI (李聪), Jielin SHI (石劼霖), Xingwei WU (吴兴伟), Hongbin DING (丁洪斌). Measurement of electron density and electron temperature of a cascaded arc plasma using laser Thomson scattering compared to an optical emission spectroscopic approach[J]. Plasma Science and Technology, 2017, 19(11): 115403. DOI: 10.1088/2058-6272/aa861d
[5]	HU Guanghai (胡广海), JIN Xiaoli (金晓丽), YUAN Lin (袁林), ZHANG Qiaofeng (张乔枫), XIE Jinlin (谢锦林), LI Hong (李弘), LIU Wandong (刘万东). Oxide Coated Cathode Plasma Source of Linear Magnetized Plasma Device[J]. Plasma Science and Technology, 2016, 18(9): 918-923. DOI: 10.1088/1009-0630/18/9/08
[6]	CHEN Yuqian (陈俞钱), HU Chundong (胡纯栋), XIE Yahong (谢亚红). Analysis of Effects of the Arc Voltage on Arc Discharges in a Cathode Ion Source of Neutral Beam Injector[J]. Plasma Science and Technology, 2016, 18(4): 453-456. DOI: 10.1088/1009-0630/18/4/21
[7]	YIN Mingli (阴明利), TIAN Canxin (田灿鑫), WANG Zesong (王泽松), FU Dejun (付德君). Influences of Bias Voltage and Target Current on Structure, Microhardness and Friction Coefficient of Multilayered TiAlN/ CrN Coatings Synthesized by Cathodic Arc Plasma Deposition[J]. Plasma Science and Technology, 2013, 15(6): 582-585. DOI: 10.1088/1009-0630/15/6/17
[8]	Wang Xiaobao (王小保), Qi Chong (亓冲), Xu Furong (许甫荣). Eigen-Property of Single-j System and Seniority Conservation Condition[J]. Plasma Science and Technology, 2012, 14(5): 383-385. DOI: 10.1088/1009-0630/14/5/08
[9]	BAI Bing (白冰), ZHA Jun (査俊), ZHANG Xiaoning (张晓宁), WANG Cheng (王城), XIA Weidong (夏维东). Simulation of Magnetically Dispersed Arc Plasma[J]. Plasma Science and Technology, 2012, 14(2): 118-121. DOI: 10.1088/1009-0630/14/2/07
[10]	ZHOU Mulin (周木林), LIU Feng (刘峰), LI Chun (李春), DU Fei (杜飞), LI Yutong (李玉同), WANG Weimin(王伟民), SHENG Zhengming (盛政明), CHEN Limin (陈黎明), MA Jinlong (马景龙), LU Xin (鲁欣), DONG Quanli (董全力), ZHANG Jie(张杰). Single-Shot Broad Bandwidth Terahertz Pulse Measurement[J]. Plasma Science and Technology, 2012, 14(1): 20-23. DOI: 10.1088/1009-0630/14/1/05