Citation: | A. M. HALA, L. OKSUZ, ZHU Ximing. Preliminary Study of a Hybrid Helicon-ECR Plasma Source[J]. Plasma Science and Technology, 2016, 18(8): 832-836. DOI: 10.1088/1009-0630/18/8/07 |
1 Boswell R W. 1970, Phys. Lett. A, 33: 457 2 Boswell R W. 1984, Plasma Phys. Control. Fusion, 26: 1147 3 Chen F F. 1991, Plasma Phys. Control. Fusion, Plenum, New York 4 Chen F F. 1985, High Density Plasma Sources. Noyes Publications, Park Ridge, NJ 5 Miller D B. 1966, IEEE Trans. Microwave Theory Tech., 14: 162 6 Koshmahl H G, Miller D B and Bethke G W. 1967, J. Appl. Phys., 38: 4576 7 Consoli T, and Hal R B. 1963, Fusion Nucleaire, 3: 237 8 Bardet R, Consoli T, and Geller R. 1964, Physics Letters, 10: 67 9 Matsuo S and Adachi Y. 1982, Jpn. J. Appl. Phys., 21: L4 10 Torii Y, Shimada M, Watanabe I. 1987, Nucl. Instr. Meth. B, 21: 178 11 Torii Y, Shimada M, and Watanabe I. 1992, Rev. Sci. Instrum., 63: 2559 12 Holber W. 1989, Handbook of lon Beam Processing Technology. (J. Cuomo, S. Rossnagel, and H. Kaufman, eds., p. 21, Noyes Publications. Park Ridge, NJ) 13 Tokiguchi K, Sakudo N, and Koike H. 1986, Rev. Sci. Instrum., 57: 1526 14 Geller R. 1998, Rev. Sci. Instrum., 69: 613 15 Zhu Ximing, Pu Yikang. 2010, J. Phys. D: Appl. Phys., 43: 403001 16 Zhu Ximing, Pu Yikang, Celik Yusuf, et al. 2012, Plasma Sources Sci. Technol., 21: 024003 17 Crintea D L, Czarnetzki U, Iordanova S, et al. 2009, J. Phys. D: Appl. Phys., 42: 045208 18 Zhu Ximing and Pu Yikang. 2010, J. Phys. D: Appl. Phys., 43: 015204 19 Zhu Ximing, Tsankov Tsanko Vaskov, Luggenh?olshcer Dirk, et al. 2015, J. Phys. D: Appl. Phys., 48: 085201 20 Clarenbach B. 2003, Plasma Sources Sci. Technol., 12: 345
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