Citation: | LUO Zhiren (罗志仁), LIU Xufeng (刘旭峰), DU Shuangsong (杜双松), WANG Zhongwei (王忠伟), SONG Yuntao (宋云涛). Integrated Design System of Toroidal Field Coil for CFETR[J]. Plasma Science and Technology, 2016, 18(9): 960-966. DOI: 10.1088/1009-0630/18/9/14 |
[1] | Zeyu HAO (郝泽宇), JianSONG(宋健), YueHUA(滑跃), Gailing ZHANG (张改玲), Xiaodong BAI (白晓东), Chunsheng REN (任春生). Frequency dependence of plasma characteristics at different pressures in cylindrical inductively coupled plasma source[J]. Plasma Science and Technology, 2019, 21(7): 75401-075401. DOI: 10.1088/2058-6272/ab1035 |
[2] | Yong WANG (王勇), Cong LI (李聪), Jielin SHI (石劼霖), Xingwei WU (吴兴伟), Hongbin DING (丁洪斌). Measurement of electron density and electron temperature of a cascaded arc plasma using laser Thomson scattering compared to an optical emission spectroscopic approach[J]. Plasma Science and Technology, 2017, 19(11): 115403. DOI: 10.1088/2058-6272/aa861d |
[3] | WANG Hongyu (王虹宇), JIANG Wei (姜巍), SUN Peng (孙鹏), ZHAO Shuangyun (赵双云), LI Yang (李阳). Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma[J]. Plasma Science and Technology, 2016, 18(2): 143-146. DOI: 10.1088/1009-0630/18/2/08 |
[4] | ZHANG Zhihui(张志辉), WU Xuemei(吴雪梅), NING Zhaoyuan(宁兆元). The Effect of Inductively Coupled Discharge on Capacitively Coupled Nitrogen-Hydrogen Plasma[J]. Plasma Science and Technology, 2014, 16(4): 352-355. DOI: 10.1088/1009-0630/16/4/09 |
[5] | XU Yijun (徐轶君), WU Xuemei (吴雪梅), YE Chao (叶超). Effect of Low-Frequency Power on Etching Characteristics of 6H-SiC in C 4 F 8 /Ar Dual-Frequency Capacitively Coupled Plasma[J]. Plasma Science and Technology, 2013, 15(10): 1066-1070. DOI: 10.1088/1009-0630/15/10/19 |
[6] | BAI Yang (柏洋), JIN Chenggang (金成刚), YU Tao (余涛), WU Xuemei (吴雪梅), et al.. Experimental Characterization of Dual-Frequency Capacitively Coupled Plasma with Inductive Enhancement in Argon[J]. Plasma Science and Technology, 2013, 15(10): 1002-1005. DOI: 10.1088/1009-0630/15/10/08 |
[7] | Panagiotis SVARNAS. Vibrational Temperature of Excited Nitrogen Molecules Detected in a 13.56 MHz Electrical Discharge by Sheath-Side Optical Emission Spectroscopy[J]. Plasma Science and Technology, 2013, 15(9): 891-895. DOI: 10.1088/1009-0630/15/9/11 |
[8] | HU Hui (胡辉), CHEN Weipeng(陈卫鹏), Zhang Jin-li (张锦丽), LU Xi (陆僖), HE Junjia(何俊佳). Influence of plasma temperature on the concentration of NO produced by pulsed arc discharge[J]. Plasma Science and Technology, 2012, 14(3): 257-262. DOI: 10.1088/1009-0630/14/3/13 |
[9] | YU Yiqing(虞一青), XIN Yu(辛煜), LU Wenqi(陆文琪), NING Zhaoyuan(宁兆元). Abnormal Enhancement of N2+ Emission Induced by Lower Frequencies in N2 Dual-Frequency Capacitively Coupled Plasmas[J]. Plasma Science and Technology, 2012, 14(3): 222-226. DOI: 10.1088/1009-0630/14/3/07 |
[10] | N. U. REHMAN, F. U. KHAN, S. NASEER, G. MURTAZA, S. S. HUSSAIN, I. AHMAD, M. ZAKAULLAH. Trace-Rare-Gas Optical Emission Spectroscopy of Nitrogen Plasma Generated at a Frequency of 13.56 MHz[J]. Plasma Science and Technology, 2011, 13(2): 208-212. |