Citation: | Abhishek GUPTA, Suhas S JOSHI. Modelling effect of magnetic field on material removal in dry electrical discharge machining[J]. Plasma Science and Technology, 2017, 19(2): 25505-025505. DOI: 10.1088/2058-6272/19/2/025505 |
[1] |
Govindan P and Joshi S S 2011 Ann. CIRP 60 239
|
[2] |
Yoshida Z M 2003 Ann. CIRP 52 147
|
[3] |
Govindan P and Joshi S S 2010 Int. J. Mach. Tools Manuf. 50 431
|
[4] |
Kadam G 2009 Masters Dissertation Indian Institute of Technology Bombay
|
[5] |
Lin Y C and Lee H S 2011 Int. J. Mach. Tools Manuf. 48 1179
|
[6] |
Heinz K et al 2011 J. Manuf. Sci. Eng. 133 1
|
[7] |
Koike K and Ono N 2001 27th Int. Electric Propulsion Conf. IEPC-01-131
|
[8] |
Hashem M S M 1981 Radiat. Transfer 31 91
|
[9] |
Kulumbaev E B and Lelevkin V M 1999 High Temp. 38 653
|
[10] |
Petraconi G 2004 Braz. J. Phys. 34 1662
|
[11] |
Govindan P et al 2013 J. Mater. Process. Technol. 213 1048
|
[12] |
Sen S N 1962 Process Phys. 80 909
|
[13] |
Sen S N and Das R P 1973 Collision 39 448
|
[14] |
Kanmani S 2011 Adv. Mater. Res. 300 1334
|
[15] |
Beilis I I et al 1998 J. Appl. Phys. 83 709
|
[16] |
Lin Z Q 2005 Int. J. Adv. Manuf. Technol. 27 288
|
[17] |
Zworykin V K 1933 Electron Opt. 215 535
|
[18] |
Ryzko H 1965 Proc. Phys. Soc. 85 1283
|
[19] |
Temeev A A 1997 23rd Int. Conf. on Phenomena in Ionized Gases (17–22 July) (France: Universite Paul Sabatier)
|
[20] |
Kontaratos A N 1965 Appl. Sci. Res. 12 27
|
[1] | Liuxiu HE (何柳秀), Minghai LIU (刘明海), Shuangyun ZHAO (赵双云). Spontaneous magnetic field multipolar structure in toroidal plasmas based on 2D equilibrium[J]. Plasma Science and Technology, 2019, 21(4): 45101-045101. DOI: 10.1088/2058-6272/aaf78d |
[2] | Yafeng BAI (白亚锋), Shiyi ZHOU (周诗怡), Yushan ZENG (曾雨珊), Yihan LIANG (梁亦寒), Rong QI (齐荣), Wentao LI (李文涛), Ye TIAN(田野), Xiaoya LI (李晓亚), Jiansheng LIU (刘建胜). Optical measurements and analytical modeling of magnetic field generated in a dieletric target[J]. Plasma Science and Technology, 2018, 20(1): 14010-014010. DOI: 10.1088/2058-6272/aa8c6f |
[3] | Y WANG (王宇), G ZHAO (赵高), C NIU (牛晨), Z W LIU (刘忠伟), J T OUYANG (欧阳吉庭), Q CHEN (陈强). Reversal of radial glow distribution in helicon plasma induced by reversed magnetic field[J]. Plasma Science and Technology, 2017, 19(2): 24003-024003. DOI: 10.1088/2058-6272/19/2/024003 |
[4] | WU Ding (吴鼎), LIU Ping (刘平), SUN Liying (孙立影), HAI Ran (海然), DING Hongbin (丁洪斌). Influence of a Static Magnetic Field on Laser Induced Tungsten Plasma in Air[J]. Plasma Science and Technology, 2016, 18(4): 364-369. DOI: 10.1088/1009-0630/18/4/06 |
[5] | CHENG Yuguo (成玉国), CHENG Mousen (程谋森), WANG Moge (王墨戈), YANG Xiong (杨雄), LI Xiaokang (李小康). Analysis of the Plasma Properties Affected by Magnetic Confinement with Special Emphasis on Helicon Discharges[J]. Plasma Science and Technology, 2014, 16(12): 1119-2225. DOI: 10.1088/1009-0630/16/12/06 |
[6] | LIU Huiping(刘惠平), ZOU Xiu(邹秀), QIU Minghui(邱明辉). Sheath Criterion for an Electronegative Plasma Sheath in an Oblique Magnetic Field[J]. Plasma Science and Technology, 2014, 16(7): 633-636. DOI: 10.1088/1009-0630/16/7/01 |
[7] | ZHAO Qing(赵青), XING Xiaojun(邢晓俊), XUAN Yinliang(宣银良), LIU Shuzhang(刘述章). The Influence of Magnetic Field on Antenna Performance in Plasma[J]. Plasma Science and Technology, 2014, 16(6): 614-619. DOI: 10.1088/1009-0630/16/6/14 |
[8] | DUAN Ping(段萍), ZHOU Xinwei(周新维), LIU Yuan(刘媛), CAO Anning(曹安宁), QIN Haijuan(覃海娟), CHEN Long(陈龙), YIN Yan(殷燕). Effects of Magnetic Field and Ion Velocity on SPT Plasma Sheath Characteristics[J]. Plasma Science and Technology, 2014, 16(2): 161-167. DOI: 10.1088/1009-0630/16/2/13 |
[9] | WANG Changquan (王长全), ZHANG Guixin (张贵新), WANG Xinxin (王新新). Surface Treatment of Polypropylene Films Using Dielectric Barrier Discharge with Magnetic Field[J]. Plasma Science and Technology, 2012, 14(10): 891-896. DOI: 10.1088/1009-0630/14/10/07 |
[10] | HE Yinghua (何迎花), YU Yi(余羿), WEN Yizhi (闻一之), LIU Wandong(刘万东), LI Ding(李定), YU Changxuan(俞昌旋), XIE Jinlin(谢锦林), LI Hong(李弘), LAN Tao (兰涛), WANG Haoyu(王昊宇). Upgrading of the Magnetic Confinement Plasma Device KT-5E[J]. Plasma Science and Technology, 2012, 14(2): 94-96. DOI: 10.1088/1009-0630/14/2/02 |