Citation: | Xiong YANG (杨雄), Mousen CHENG (程谋森), Dawei GUO (郭大伟), Moge WANG (王墨戈), Xiaokang LI (李小康). Characteristics of temporal evolution of particle density and electron temperature in helicon discharge[J]. Plasma Science and Technology, 2017, 19(10): 105402. DOI: 10.1088/2058-6272/aa808a |
[1] |
Biloiu C et al 2005 Plasma Sources Sci. Technol. 14 766
|
[2] |
Charles C and Boswell R W 2003 Appl. Phys. Lett. 82 1356
|
[3] |
Perry A J and Boswell R W 1989 Appl. Phys. Lett. 55 148
|
[4] |
Marinov D et al 2015 Plasma Sources Sci. Technol. 24 065008
|
[5] |
Charles C and Boswell R W 1998 J. Appl. Phys. 84 350
|
[6] |
Clarenbach B et al 2003 Plasma Sources Sci. Technol. 12 345
|
[7] |
Biloiu I A and Scime E E 2009 Appl. Phys. Lett. 95 051504
|
[8] |
Ashida S, Lee C and Lieberman M A 1995 J. Vac. Sci. Technol. A 13 2498
|
[9] |
Lieberman M and Ashida S 1996 Plasma Sources Sci. Technol. 5 145
|
[10] |
Yoon M et al 1998 J. Korean Phys. Soc. 32 L635
|
[11] |
Cho S 1999 Phys. Plasmas 6 359
|
[12] |
Ziemba T et al 2006 Plasma Sources Sci. Technol. 15 517
|
[13] |
Clarenbach B, Kr?mer M and Lorenz B 2007 J. Phys. D: Appl. Phys. 40 5117
|
[14] |
Takahashi K, Takao Y and Ando A 2016 Appl. Phys. Lett. 108 074103
|
[15] |
Boswell R W and Vender D 1995 Plasma Sources Sci. Technol. 4 534
|
[16] |
Chang L et al 2012 Phys. Plasmas 19 083511
|
[17] |
Chang L, Breizman B N and Hole M J 2013 Plasma Phys. Control. Fusion 55 025003
|
[18] |
Chang L et al 2016 Plasma Sci. Technol. 18 848
|
[19] |
Yang X et al 2017 Acta Phys. Sin. 66 025201
|
[20] |
Ahedo E and Navarro-Cavallé J 2013 Phys. Plasmas 20 043512
|
[21] |
Cheng Y G et al 2014 Plasma Sci. Technol. 16 1111
|
[22] |
Chen F F and Curreli D 2013 Phys. Plasmas 20 057102
|
[23] |
Chen F F 2008 IEEE Trans. Plasma Sci. 36 2095
|
[24] |
Fischer B, Kramer M and Enk T 1994 Plasma Phys. Control. Fusion 36 2003
|
[25] |
Kamenski I V and Borg G G 1996 Phys. Plasmas 3 4396
|
[26] |
Curreli D and Chen F F 2011 Phys. Plasmas 18 113501
|
[27] |
Lymberopoulos D P and Economou D J 1995 J. Res. Natl Inst. Stand. Technol. 100 473
|
[28] |
Sternberg N, Godyak V and Hoffman D 2006 Phys. Plasma 13 063511
|
[29] |
Hagelaar G J M and Pitchford L C 2005 Plasma Sources Sci. Technol. 14 722
|
[30] |
Lieberman M A and Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing 2nd edn (New York: Wiley)
|
[31] |
Cho S 1996 Phys. Plasmas 3 4268
|
[32] |
Cho S and Kwak J G 1997 Phys. Plasmas 4 4167
|
[33] |
Arnush D and Chen F F 1998 Phys. Plasmas 5 1239
|
[34] |
Arnush D 2000 Phys. Plasmas 7 3042
|
[35] |
Chen F F 2003 Phys. Plasmas 10 2586
|
[36] |
Vl?ek J 1989 J. Phys. D: Appl. Phys. 22 623
|
[37] |
Vl?ek J and Pelikan V 1989 J. Phys. D: Appl. Phys. 22 632
|