Diagnostic of capacitively coupled radio frequency plasma from electrical discharge characteristics: comparison with optical emission spectroscopy and fluid model simulation

Xiang HE (何湘); Chong LIU (刘冲); Yachun ZHANG (张亚春); Jianping CHEN (陈建平); Yudong CHEN (陈玉东); Xiaojun ZENG (曾小军); Bingyan CHEN (陈秉岩); Jiaxin PANG (庞佳鑫); Yibing WANG (王一兵)

doi:10.1088/2058-6272/aa9a31

Plasma Science and Technology > 2018 > 20(2): 24005-024005. > DOI: 10.1088/2058-6272/aa9a31

Xiang HE (何湘), Chong LIU (刘冲), Yachun ZHANG (张亚春), Jianping CHEN (陈建平), Yudong CHEN (陈玉东), Xiaojun ZENG (曾小军), Bingyan CHEN (陈秉岩), Jiaxin PANG (庞佳鑫), Yibing WANG (王一兵). Diagnostic of capacitively coupled radio frequency plasma from electrical discharge characteristics: comparison with optical emission spectroscopy and fluid model simulation[J]. Plasma Science and Technology, 2018, 20(2): 24005-024005. DOI: 10.1088/2058-6272/aa9a31

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Diagnostic of capacitively coupled radio frequency plasma from electrical discharge characteristics: comparison with optical emission spectroscopy and fluid model simulation

1 College of Science, Hohai University, Nanjing 210098, People’s Republic of China 2 College of Science, Nanjing University Science and Technology, Nanjing 210094, People’s Republic of China 3 Beijing Aeronautical Technology Research Center, Beijing 100076, People’s Republic of China

Funds: This work is supported by National Natural Science Foundation of China (Grant No. 61378037), the Fundamental Research Funds for the Central Universities (Nos. 2013B33614, 2017B15214), the Research Funds of Innovation and Entrepreneurship Education Reform for Chinese Universities (No. 16CCJG01Z004), and the Changzhou Science and Technology Program (No. CJ20160027).

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Received Date: July 27, 2017

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Abstract

Abstract

The capacitively coupled radio frequency (CCRF) plasma has been widely used in various fields. In some cases, it requires us to estimate the range of key plasma parameters simpler and quicker in order to understand the behavior in plasma. In this paper, a glass vacuum chamber and a pair of plate electrodes were designed and fabricated, using 13.56 MHz radio frequency (RF) discharge technology to ionize the working gas of Ar. This discharge was mathematically described with equivalent circuit model. The discharge voltage and current of the plasma were measured at different pressures and different powers. Based on the capacitively coupled homogeneous discharge model, the equivalent circuit and the analytical formula were established. The plasma density and temperature were calculated by using the equivalent impedance principle and energy balance equation. The experimental results show that when RF discharge power is 50–300 W and pressure is 25–250 Pa, the average electron temperature is about 1.7–2.1 eV and the average electron density is about 0.5×10¹⁷ – 3.6×10¹⁷ m^-3. Agreement was found when the results were compared to those given by optical emission spectroscopy and COMSOL simulation.
- plasma diagnostic,
- equivalent circuit model,
- optical emission spectrometry,
- COMSOL simulation

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References (24)

References

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