Frequency dependence of electron temperature in hollow cathode-type discharge as measured by several different floating probe methods

Shuichi SATO; Hiromu KAWANA; Tatsushi FUJIMINE; Mikio OHUCHI

doi:10.1088/2058-6272/aabfcd

Plasma Science and Technology > 2018 > 20(8): 85405-085405. > DOI: 10.1088/2058-6272/aabfcd

Shuichi SATO, Hiromu KAWANA, Tatsushi FUJIMINE, Mikio OHUCHI. Frequency dependence of electron temperature in hollow cathode-type discharge as measured by several different floating probe methods[J]. Plasma Science and Technology, 2018, 20(8): 85405-085405. DOI: 10.1088/2058-6272/aabfcd

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Frequency dependence of electron temperature in hollow cathode-type discharge as measured by several different floating probe methods

Department of Electronic Engineering, Tokyo Denki University, 5 Senju-Asahi-cho, Adachi-ku, Tokyo 120-8551, Japan

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Received Date: February 05, 2018

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Abstract

Abstract

We measured electron temperatures through a hollow cathode-type discharge tube using several different floating probe methods. This method detected a shift in the floating potential when an AC voltage was applied to a probe through an intermediary blocking capacitor. The shift in the floating potential is described as a function of the electron temperature and the applied AC voltage. In this study, the effects of the frequency and waveform on the electron temperatures were systematically investigated. The electron temperature measured when using the floating probe method with applied sinusoidal and triangular voltages was lower than that measured with an applied rectangular voltage. The value in the high frequency range was close to that of the tail electron temperature.
- electrostatic probe,
- Langmuir probe,
- floating potential,
- electron temperature,
- sheath

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References (23)

References

[1]	Chhowalla M et al 2001 J. Appl. Phys. 90 5308
[2]	Choy K L 2003 Prog. Mater. Sci. 48 57
[3]	Pai P G et al 1986 J. Vac. Sci. Technol. A 4 689
[4]	Chu P K et al 2002 Mater. Sci. Eng. R 36 143
[5]	Hopwood J 1992 Plasma Sources Sci. Technol. 1 109
[6]	Mayrhofer P H et al 2006 Prog. Mater. Sci. 51 1032
[7]	Coburn J W and Winters H F 1979 J. Appl. Phys. 50 3189
[8]	Pearton S J et al 2005 Prog. Mater. Sci. 50 293
[9]	Pearton S J et al 1999 J. Appl. Phys. 86 1
[10]	Lindl J 1995 Phys. Plasmas 2 3933
[11]	Booth J P et al 2010 Plasma Sources Sci. Technol. 19 015005
[12]	Braithwaite N S J, Sheridan T E and Boswell R W 2003 J. Phys. D: Appl. Phys. 36 2837
[13]	Franz P et al 2013 Nucl. Fusion 53 053011
[14]	Mott-Smith H M and Langmuir I 1926 Phys. Rev. 28 727
[15]	Kokura H et al 1999 Japan. J. Appl. Phys. 38 5262
[16]	Takayama K, Ikegami H and Miyazaki S 1960 Phys. Rev. Lett. 5 238
[17]	Hosea J C et al 1973 Phys. Rev. Lett. 30 839
[18]	Booth J and Hancock G 1993 Mater. Sci. Forum 140 219
[19]	Auciello O and Flamm D L 1989 Plasma Diagnostics: Discharge Parameters and Chemistry (London: Academic)
[20]	Nodomi S, Sato S and Ohuchi M 2016 Plasma Sci. Technol. 18 1089
[21]	Lieberman M A and Lichtenberg A J 2005 Principles of Plasma Discharges and Materials (New York: Wiley)
[22]	Chapman B 1980 Glow Discharge Processes: Sputtering and Plasma Etching (New York: Wiley)
[23]	Braithwaite N S J, Booth J and Cunge G 1996 Plasma Sources Sci. Technol. 5 677 8

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