Super-hydrophobic film deposition by an atmospheric-pressure plasma process and its anti-icing characteristics

Qinghua HUANG (黄清华); Lin XIONG (熊琳); Xiaolong DENG (邓小龙); Zhan SHU (舒展); Qiang CHEN (陈强); Bing BAO (包兵); Mingli CHEN (陈明礼); Qing XIONG (熊青)

doi:10.1088/2058-6272/ab01f4

Plasma Science and Technology > 2019 > 21(5): 55502-055502. > DOI: 10.1088/2058-6272/ab01f4

Qinghua HUANG (黄清华), Lin XIONG (熊琳), Xiaolong DENG (邓小龙), Zhan SHU (舒展), Qiang CHEN (陈强), Bing BAO (包兵), Mingli CHEN (陈明礼), Qing XIONG (熊青). Super-hydrophobic film deposition by an atmospheric-pressure plasma process and its anti-icing characteristics[J]. Plasma Science and Technology, 2019, 21(5): 55502-055502. DOI: 10.1088/2058-6272/ab01f4

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Super-hydrophobic film deposition by an atmospheric-pressure plasma process and its anti-icing characteristics

¹ State Key Laboratory of Power Transmission Equipment & System Security and New Technology, Chongqing University, Chongqing 400044, People’s Republic of China
² College of Aerospace Science and Engineering. National University of Defense Technology, Changsha 410073, People’s Republic of China
³ Fujian Provincial Key Laboratory of Plasma and Magnetic Resonance, Department of Electronic Science, Institute of Electromagnetics and Acoustics, Xiamen University, Xiamen 361005, People’s Republic of China
⁴ Chongqing Landscape and Gardening Research Institute, Chongqing 401329, People’s Republic of China
⁵ State Grid Longchang Electric Power Supply Branch, Longchang 642150, People’s Republic of China

Funds: This work was partly supported by the State Key Laboratory of Advanced Electromagnetic Engineering and Technology (No. AEET 2018KF003), National Natural Science Foundation of China (Nos. 51637002, 11405144), the Fundamental Research Funds for the Central Universities (Nos. 2018CDXYTW0031, 20720150022), the Construction Committee of Chongqing (No. 2018-1-3-6), the International Science & Technology Cooperation Program of China (No. 2015DFR70390), and the Natural Science Foundation of Hunan Province (No. 2018JJ3587).

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Received Date: November 08, 2018

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Abstract

Abstract

In this work, the super-hydrophobic (SH) surface was prepared through chemical vapor deposition process by an argon atmospheric pressure plasma jet source with HMDSN (hexamethyldisilazane) as the polymerization precursor. Plasma synthesized organosilicon (SiO_xC_yH_z) thin films with water contact angle over 160° and sliding angle below 5°, were able to be achieved. FTIR and XPS analysis indicates a large number of hydrocarbon compositions were polymerized in the thin films enduing the latter very-low surface free energy. SEM shows the SH films display micro-nanostructure and with high degree of averaged surface roughness 190 nm evaluated by AFM analysis. From experiments under controlled low-temperature and moisture conditions, the prepared SH surface exhibits good anti-icing effects. Significantly prolonging freezing time was achievable on the SH thin films for both static and sliding water droplets. This investigation demonstrates the anti-icing potentials of SH surface prepared through low-cost simple atmospheric-pressure plasma polymerization process.
- hydrophobicity,
- anti-icing,
- atmospheric-pressure plasma,
- polymerization

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References (29)

References

[1]	Lu Y et al 2015 Science 347 1132
[2]	Hao P F, Lv C J and Yao Z H 2013 Langmuir 29 5160
[3]	Wong T S et al 2011 Nature 477 443
[4]	Jung S et al 2011 Langmuir 27 3059
[5]	Liao R J et al 2014 Appl. Surf. Sci. 317 701
[6]	Varanasi K K et al 2010 Appl. Phys. Lett. 97 234102
[7]	Matsumoto K and Kobayashi T 2007 Int. J. Refrig. 30 851
[8]	Zhang S N et al 2017 Small 13 1701867
[9]	Bhushan B and Jung Y C 2011 Prog. Mater Sci. 56 1
[10]	Crick C R and Parkin I P 2010 Chem. Eur. J. 16 3568
[11]	Tuteja A et al 2007 Science 318 1618
[12]	Jafari R, Asadollahi S and Farzaneh M 2013 Plasma Chem. Plasma Process. 33 177
[13]	Dimitrakellis P et al 2017 Plasma Process. Polym. 14 1600069
[14]	Huang C, Lin H H and Li C 2015 Plasma Chem. Plasma Process. 35 1015
[15]	Han D and Moon S Y 2015 Plasma Process. Polym. 12 172
[16]	Dimitrakellis P and Gogolides E 2018 Adv. Colloid Interface Sci. 254 1
[17]	Hubert J et al 2015 J. Mater. Res. 30 3177
[18]	Dimitrakellis P and Gogolides E 2018 Microelectron. Eng. 194 109
[19]	Iqbal M M et al 2015 Plasma Process. Polym. 12 201
[20]	Kim J H, Liu G M and Kim S H 2006 J. Mater. Chem. 16 977
[21]	Kwong C H et al 2014 Fiber. Polym. 15 1596
[22]	Ma W C, Lin C H and Huang C 2015 Plasma Process. Polym. 12 362
[23]	Bashir M and Bashir S 2015 Plasma Chem. Plasma Process. 35 739
[24]	Kylián O et al 2014 Vacuum 100 57
[25]	Yang S H et al 2009 Thin Solid Films 517 5284
[26]	Boscher N D et al 2013 ACS Appl. Mater. Interfaces 5 1053
[27]	Barshilia H C and Gupta N 2014 Vacuum 99 42
[28]	Fernández V and Khayet M 2015 Front. Plant Sci. 6 510
[29]	O’Hare L A, Parbhoo B and Leadley S R 2004 Surf. Interface Anal. 36 1427