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Xiu ZOU (邹秀), Huiping LIU (刘惠平), Yongzheng ZHU (朱永政), Xiaonan ZHANG (张小楠), Minghui QIU (邱明辉). The structure of an electronegative magnetized plasma sheath with non-extensive electron distribution[J]. Plasma Science and Technology, 2020, 22(12): 125001. DOI: 10.1088/2058-6272/abb3dc
Citation: Xiu ZOU (邹秀), Huiping LIU (刘惠平), Yongzheng ZHU (朱永政), Xiaonan ZHANG (张小楠), Minghui QIU (邱明辉). The structure of an electronegative magnetized plasma sheath with non-extensive electron distribution[J]. Plasma Science and Technology, 2020, 22(12): 125001. DOI: 10.1088/2058-6272/abb3dc

The structure of an electronegative magnetized plasma sheath with non-extensive electron distribution

  • In this paper, an electronegative magnetized plasma sheath model with non-extensive electron distribution is established, and the Bohm criterion affected by the non-extensive parameter q is theoretically derived. The ion Mach number varies with q. The numerical simulation results show that compared with electronegative magnetized plasma sheath with Maxwell distribution (q = 1), the sheath structures with super-extensive distribution (q < 1) and sub-extensive distribution (q > 1) are different. The physical quantities including the sheath potential distribution, ion density distribution, the electron density distribution, negative ion density distribution and the net space charge density distribution are discussed. It is shown that the non-extensive parameter q has a significant influence on the structure of the electronegative magnetized plasma sheath. Due to the Lorentz force, both the magnitude and the angle of the magnetic field affect the structure of the sheath, whether the electrons are Maxwell distributed or non-extensively distributed.
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