Citation: | Kai ZHAO (赵凯), Yongxin LIU (刘永新), Quanzhi ZHANG (张权治), Demetre J ECONOMOU, Younian WANG. Magnetic probe diagnostics of nonlinear standing waves and bulk ohmic electron power absorption in capacitive discharges[J]. Plasma Science and Technology, 2021, 23(11): 115404. DOI: 10.1088/2058-6272/ac1cce |
[1] |
Xu P et al 2018 Appl. Phys. Lett. 112 242402
|
[2] |
Godyak V A and Kolobov V I 1997 Phys. Rev. Lett. 79 4589
|
[3] |
Stenzel R L and Urrutia J M 2015 Phys. Rev. Lett. 114 205005
|
[4] |
Takahashi K et al 2016 Phys. Rev. Lett. 116 135001
|
[5] |
Reilly M P, Lewis W and Miley G H 2009 Rev. Sci. Instrum.80 053508
|
[6] |
Reynolds J A, Blevin H A and Thonemann P C 1969 Phys.Rev. Lett. 22 762
|
[7] |
Kolobov V I and Economou D J 1997 Plasma Sources Sci.Technol. 6 R1
|
[8] |
Godyak V A et al 1998 Phys. Rev. Lett. 80 3264
|
[9] |
Lee H C and Chung C W 2012 Appl. Phys. Lett. 101 244104
|
[10] |
Ding Z F, Sun B and Huo W G 2015 Phys. Plasmas 22 063504
|
[11] |
Han J et al 2019 Phys. Plasmas 26 103503
|
[12] |
Turner M M 1993 Phys. Rev. Lett. 71 1844
|
[13] |
Cunge G et al 1999 Plasma Sources Sci. Technol. 8 576
|
[14] |
Turner M M and Lieberman M A 1999 Plasma Sources Sci.Technol. 8 313
|
[15] |
Xu S et al 2001 Phys. Plasmas 8 2549
|
[16] |
Godyak V A, Piejak R B and Alexandrovich B M 1999 J. Appl. Phys. 85 703
|
[17] |
Everson E T et al 2009 Rev. Sci. Instrum. 80 113505
|
[18] |
Collette A and Gekelman W 2010 Phys. Rev. Lett. 105 195003
|
[19] |
Koizumi H et al 2007 Phys. Plasmas 14 033506
|
[20] |
Sekine H, Koizumi H and Komurasaki K 2021 AIP Adv. 11 015102
|
[21] |
King J D et al 2014 Rev. Sci. Instrum. 85 083503
|
[22] |
Delgado-Aparicio L et al 2013 Phys. Rev. Lett. 110 065006
|
[23] |
Savrukhin P V and Shestakov E A 2012 Rev. Sci. Instrum. 83 013505
|
[24] |
Liu Y et al 2014 Rev. Sci. Instrum. 85 11E802
|
[25] |
Heeter R F et al 2000 Rev. Sci. Instrum. 71 4092
|
[26] |
Chabert P 2007 J. Phys. D: Appl. Phys. 40 R63
|
[27] |
Perret A et al 2005 Appl. Phys. Lett. 86 021501
|
[28] |
Abdel-Fattah E and Sugai H 2003 Appl. Phys. Lett. 83 1533
|
[29] |
Jariwala C et al 2008 Appl. Phys. Lett. 93 191502
|
[30] |
Lieberman M A et al 2002 Plasma Sources Sci. Technol. 11 283
|
[31] |
Sansonnens L and Schmitt J 2003 Appl. Phys. Lett. 82 182
|
[32] |
Perret A et al 2003 Appl. Phys. Lett. 83 243
|
[33] |
Chabert P et al 2004 Phys. Plasmas 11 1775
|
[34] |
Sansonnens L, Howling A A and Hollenstein C 2006 Plasma Sources Sci. Technol. 15 302
|
[35] |
Hebner G A et al 2006 Plasma Sources Sci. Technol. 15 879
|
[36] |
Lee I, Graves D B and Lieberman M A 2008 Plasma Sources Sci. Technol. 17 015018
|
[37] |
Rauf S, Bera K and Collins K 2008 Plasma Sources Sci.Technol. 17 035003
|
[38] |
Eremin D et al 2013 J. Phys. D: Appl. Phys. 46 084017
|
[39] |
Schüngel E et al 2015 Appl. Phys. Lett. 106 054108
|
[40] |
Liu Y X et al 2015 Plasma Sources Sci. Technol. 24 025013
|
[41] |
Zhao K et al 2018 Plasma Sources Sci. Technol. 27 055017
|
[42] |
Zhao K et al 2016 Phys. Plasmas 23 123512
|
[43] |
Rauf S, Bera K and Collins K 2010 Plasma Sources Sci. Technol. 19 015014
|
[44] |
Sharma S et al 2019 J. Phys. D: Appl. Phys. 52 365201
|
[45] |
Wilczek S et al 2018 Plasma Sources Sci. Technol. 27 125010
|
[46] |
Sharma S et al 2016 Phys. Plasmas 23 110701
|
[47] |
Sharma S et al 2019 Phys. Plasmas 26 103508
|
[48] |
Sharma S et al 2020 Plasma Sources Sci. Technol. 29 045003
|
[49] |
Czarnetzki U, Mussenbrock T and Brinkmann R P 2006 Phys.Plasmas 13 123503
|
[50] |
Mussenbrock T et al 2008 Phys. Rev. Lett. 101 085004
|
[51] |
Miller P A et al 2006 Plasma Sources Sci. Technol. 15 889
|
[52] |
Sawada I et al 2014 Jpn. J. Appl. Phys. 53 03DB01
|
[53] |
Lane B et al 2016 J. Vac. Sci. Technol. A 34 031302
|
[54] |
Lieberman M A et al 2015 Plasma Sources Sci. Technol. 24 055011
|
[55] |
Wen D Q et al 2016 Plasma Sources Sci. Technol. 26 015007
|
[56] |
Zhao K et al 2019 Phys. Rev. Lett. 122 185002
|
[57] |
Wilczek S et al 2016 Phys. Plasmas 23 063514
|
[58] |
Franck C M, Grulke O and Klinger T 2002 Rev. Sci. Instrum.73 3768
|
[59] |
Black D C and Mayo R M 1996 Rev. Sci. Instrum. 67 1508
|
[60] |
Messer S et al 2006 Rev. Sci. Instrum. 77 115104
|
[61] |
Zhao K et al 2018 Rev. Sci. Instrum. 89 105104
|
[62] |
Karkari S K, Ellingboe A R and Gaman C 2008 Appl. Phys.Lett. 93 071501
|
[63] |
Gogna G S and Karkari S K 2010 Appl. Phys. Lett. 96 151503
|
[64] |
Godyak V 2021 J. Appl. Phys. 129 041101
|
[65] |
Gustrau F 2012 RF and Microwave Engineering: Fundamentals of Wireless Communications (New York:Wiley)
|
[66] |
Lieberman M A and Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing 2nd edn (New York: Wiley)
|
[67] |
Yuan Q H et al 2008 J. Phys. D: Appl. Phys. 41 205209
|
[68] |
Kawamura E, Lieberman M A and Graves D B 2014 Plasma Sources Sci. Technol. 23 064003
|
[69] |
Turner M M 1995 Phys. Rev. Lett. 75 1312
|
[70] |
Mussenbrock T and Brinkmann R P 2006 Appl. Phys. Lett. 88 151503
|
[71] |
Gozadinos G, Turner M M and Vender D 2001 Phys. Rev. Lett.87 135004
|
[72] |
Kaganovich I D 2002 Phys. Rev. Lett. 89 265006
|
[73] |
Sharma S and Turner M M 2013 Plasma Sources Sci. Technol.22 035014
|
[74] |
Kawamura E, Lieberman M A and Lichtenberg A J 2006 Phys.Plasmas 13 053506
|
[75] |
Lafleur T, Chabert P and Booth J P 2014 Plasma Sources Sci.Technol. 23 035010
|
[76] |
Wilczek S et al 2020 J. Appl. Phys.J. Appl. Phys. 127 181101
|
[77] |
Surendra M and Dalvie M 1993 Phys. Rev. E 48 3914
|
[78] |
Schulze J et al 2018 Plasma Sources Sci. Technol. 27 055010
|
1. | Osca Engelbrecht, M., Ridgers, C.P., Dedrick, J. et al. Particle-in-cell simulations of high frequency capacitively coupled plasmas including spatially localised inductive-like heating. Plasma Sources Science and Technology, 2023, 32(12): 125003. DOI:10.1088/1361-6595/ad0fb1 |
2. | Eremin, D., Kemaneci, E., Matsukuma, M. et al. Modeling of very high frequency large-electrode capacitively coupled plasmas with a fully electromagnetic particle-in-cell code. Plasma Sources Science and Technology, 2023, 32(4): 044007. DOI:10.1088/1361-6595/accecb |
3. | Sun, G., Zhang, S., Sun, A. et al. On the electron sheath theory and its applications in plasma-surface interactions. Plasma Science and Technology, 2022, 24(9): 095401. DOI:10.1088/2058-6272/ac6aa7 |
4. | Xing, Y., Qiao, N., Yu, J. et al. Spectroscopic depth profilometry of organic thin films upon inductively coupled plasma etching. Review of Scientific Instruments, 2022, 93(7): 073903. DOI:10.1063/5.0088718 |
5. | Vass, M., Wilczek, S., Derzsi, A. et al. Evolution of the bulk electric field in capacitively coupled argon plasmas at intermediate pressures. Plasma Sources Science and Technology, 2022, 31(4): 045017. DOI:10.1088/1361-6595/ac6361 |
6. | Su, Z.-X., Shi, D.-H., Liu, Y.-X. et al. Radially-dependent ignition process of a pulsed capacitively coupled RF argon plasma over 300 mm-diameter electrodes: Multi-fold experimental diagnostics. Plasma Sources Science and Technology, 2021, 30(12): 125013. DOI:10.1088/1361-6595/ac3e3f |
7. | Zhao, K., Guo, Y.-Q., Zhang, Q.-Z. et al. Experimental Investigation of Nonlinear Standing Waves in DC/VHF Hybrid Capacitive Discharges. IEEE Transactions on Plasma Science, 2021, 49(11): 3392-3397. DOI:10.1109/TPS.2021.3120596 |