Xiaogang YUAN (袁小刚), Haishan ZHOU (周海山), Haodong LIU (刘皓东), Bo LI (李波), Yong WANG (王勇), Lei CHANG (苌磊), Xin YANG (杨鑫), Chuang WANG (汪闯), Lupeng ZHANG (张潞鹏), Guangnan LUO (罗广南). Particle flux characteristics of a compact high-field cascaded arc plasma device[J]. Plasma Science and Technology, 2021, 23(11): 115402. DOI: 10.1088/2058-6272/ac1fd8
Citation:
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Xiaogang YUAN (袁小刚), Haishan ZHOU (周海山), Haodong LIU (刘皓东), Bo LI (李波), Yong WANG (王勇), Lei CHANG (苌磊), Xin YANG (杨鑫), Chuang WANG (汪闯), Lupeng ZHANG (张潞鹏), Guangnan LUO (罗广南). Particle flux characteristics of a compact high-field cascaded arc plasma device[J]. Plasma Science and Technology, 2021, 23(11): 115402. DOI: 10.1088/2058-6272/ac1fd8
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Xiaogang YUAN (袁小刚), Haishan ZHOU (周海山), Haodong LIU (刘皓东), Bo LI (李波), Yong WANG (王勇), Lei CHANG (苌磊), Xin YANG (杨鑫), Chuang WANG (汪闯), Lupeng ZHANG (张潞鹏), Guangnan LUO (罗广南). Particle flux characteristics of a compact high-field cascaded arc plasma device[J]. Plasma Science and Technology, 2021, 23(11): 115402. DOI: 10.1088/2058-6272/ac1fd8
Citation:
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Xiaogang YUAN (袁小刚), Haishan ZHOU (周海山), Haodong LIU (刘皓东), Bo LI (李波), Yong WANG (王勇), Lei CHANG (苌磊), Xin YANG (杨鑫), Chuang WANG (汪闯), Lupeng ZHANG (张潞鹏), Guangnan LUO (罗广南). Particle flux characteristics of a compact high-field cascaded arc plasma device[J]. Plasma Science and Technology, 2021, 23(11): 115402. DOI: 10.1088/2058-6272/ac1fd8
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