Investigation of Capacitively Coupled Argon Plasma Driven by Dual-Frequency with Different Frequency Configurations

YU Yiqing(虞一青); XIN Yu(辛煜); LU Wenqi(陆文琪); NING Zhaoyuan(宁兆元)

Plasma Science and Technology > 2011 > 13(5): 571-574.

YU Yiqing(虞一青), XIN Yu(辛煜), LU Wenqi(陆文琪), NING Zhaoyuan(宁兆元). Investigation of Capacitively Coupled Argon Plasma Driven by Dual-Frequency with Different Frequency Configurations[J]. Plasma Science and Technology, 2011, 13(5): 571-574.

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Investigation of Capacitively Coupled Argon Plasma Driven by Dual-Frequency with Different Frequency Configurations

1 School of Physical Science and Technology, Soochow University, Suzhou 215006, China 2 School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China

Funds: Supported by the National Natural Science Foundation of China (Nos. 10635010, 10775103)

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Received Date: December 01, 2010

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Abstract

Abstract

Low pressure argon dual-frequency (DF) capacitively coupled plasma (CCP) is generated by using different frequency configurations, such as 13.56/2, 27/2, 41/2, and 60/2 MHz. Characteristics of the plasma are investigated by using a floating double electrical probe and optical emission spectroscopy (OES). It is shown that in the DF-CCPs, the electron temperature Te decreases with the increase in exciting frequency, while the onset of 2 MHz induces a sudden increase in Te and the electron density increases basically with the increase in low frequency (LF) power. The intensity of 750.4 nm emission line increases with the LF power in the case of 13.56/2 MHz, while different tendencies of line intensity with the LF power appear for other configurations. The reason for this is also discussed.
- dual-frequency capacitively coupled plasma,
- double probe,
- optical emission spectroscopy

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