1 Shao T, Yang W, Zhang C, et al. 2014, Appl. Phys.Lett., 105: 071607 2 Krile J T, Vela R, Neuber A, et al. 2007, IEEE Trans.Plasma Sci., 35: 1580 3 Zhang H, Liu J. 2014, Rev. Sci. Instrum., 85: 044709 4 Jadidian J, Zahn M, Lavesson N, et al. 2012, Appl.Phys. Lett., 100: 172903 5 Tewari S V, Kshirsagar R J, Roy A, et al. 2014, Laser Part. Beams, 32: 681 6 Cheng X, Liu J, Qian B. 2012, Appl. Phys. Lett., 101:082903 7 Douar M A, Beroual A, Souche X. 2015, IEEE Trans.Dielectr. Electr. Insul., 22: 391 8 Kim K S, Kam S K, Mok Y S. 2015, Chem. Eng. J.,271: 31 9 Shao T, Zhou Y, Zhang C, et al. 2015, IEEE Trans.Dielectr. Electr. Insul., 22: 1747 10 Zhang C, Zhou Y, Shao T, et al. 2014, Appl. Surf. Sci.,311: 468 11 Roggendorf C, Schnettler A. 2012, IEEE Trans. Dielectr. Electr. Insul., 19: 973 12 Kumara S, Ma B, Serdyuk Y V, et al. 2012, IEEE Trans. Dielectr. Electr. Insul., 19: 2189 13 Wang R, Zhang C, Liu X, et al. 2015, Appl. Surf. Sci.,328: 509 14 Drabik M, Kousal J, Celma C, et al. 2014, Plasma Processes Polym., 11: 496 15 Liu X, Lin H, Liang Y, et al. 2015, Transactions of China Electrotechnical Society, 30: 158 (in Chinese) 16 Zhang C, Shao T, Wang R, et al. 2015, IEEE Trans.Dielectr. Electr. Insul., 22: 1907 17 Morales K P, Krile J T, Neuber A, et al. 2006, IEEE Trans. Dielectr. Electr. Insul., 13: 803 18 Neuber A A, Krile J T, Edmiston G F, et al. 2007,Phys. Plasmas, 14: 057102 19 Edmiston G F, Krile J T, Neuber A. 2008, IEEE Trans.Plasma Sci., 36: 946 20 Ran H, Wang J, Wang T, et al. 2013, IEEE Trans.Dielectr. Electr. Insul., 20: 1161 21 Ran H, Wang L, Wang J, et al. 2014, Plasma Sci. Technol., 16: 465 22 Tanaka T. 2002, IEEE Trans. Dielectr. Electr. Insul.,9: 704 23 Bian X, Chen L, Yu D, et al. 2012, Appl. Phys. Lett.,101: 174103
|