Citation: | Abhishek GUPTA, Suhas S JOSHI. Modelling effect of magnetic field on material removal in dry electrical discharge machining[J]. Plasma Science and Technology, 2017, 19(2): 25505-025505. DOI: 10.1088/2058-6272/19/2/025505 |
[1] |
Govindan P and Joshi S S 2011 Ann. CIRP 60 239
|
[2] |
Yoshida Z M 2003 Ann. CIRP 52 147
|
[3] |
Govindan P and Joshi S S 2010 Int. J. Mach. Tools Manuf. 50 431
|
[4] |
Kadam G 2009 Masters Dissertation Indian Institute of Technology Bombay
|
[5] |
Lin Y C and Lee H S 2011 Int. J. Mach. Tools Manuf. 48 1179
|
[6] |
Heinz K et al 2011 J. Manuf. Sci. Eng. 133 1
|
[7] |
Koike K and Ono N 2001 27th Int. Electric Propulsion Conf. IEPC-01-131
|
[8] |
Hashem M S M 1981 Radiat. Transfer 31 91
|
[9] |
Kulumbaev E B and Lelevkin V M 1999 High Temp. 38 653
|
[10] |
Petraconi G 2004 Braz. J. Phys. 34 1662
|
[11] |
Govindan P et al 2013 J. Mater. Process. Technol. 213 1048
|
[12] |
Sen S N 1962 Process Phys. 80 909
|
[13] |
Sen S N and Das R P 1973 Collision 39 448
|
[14] |
Kanmani S 2011 Adv. Mater. Res. 300 1334
|
[15] |
Beilis I I et al 1998 J. Appl. Phys. 83 709
|
[16] |
Lin Z Q 2005 Int. J. Adv. Manuf. Technol. 27 288
|
[17] |
Zworykin V K 1933 Electron Opt. 215 535
|
[18] |
Ryzko H 1965 Proc. Phys. Soc. 85 1283
|
[19] |
Temeev A A 1997 23rd Int. Conf. on Phenomena in Ionized Gases (17–22 July) (France: Universite Paul Sabatier)
|
[20] |
Kontaratos A N 1965 Appl. Sci. Res. 12 27
|
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