Fabrication and characterization of He-charged ODS-FeCrNi films deposited by a radio-frequency plasma magnetron sputtering technique

Liang SONG (宋亮); Xianping WANG (王先平); Le WANG (王乐); Ying ZHANG (张营); Wang LIU (刘旺); Weibing JIANG (蒋卫斌); Tao ZHANG (张涛); Qianfeng FANG (方前锋); Changsong LIU (刘长松)

doi:10.1088/2058-6272/aa57f0

Plasma Science and Technology > 2017 > 19(4): 45502-045502. > DOI: 10.1088/2058-6272/aa57f0

Liang SONG (宋亮), Xianping WANG (王先平), Le WANG (王乐), Ying ZHANG (张营), Wang LIU (刘旺), Weibing JIANG (蒋卫斌), Tao ZHANG (张涛), Qianfeng FANG (方前锋), Changsong LIU (刘长松). Fabrication and characterization of He-charged ODS-FeCrNi films deposited by a radio-frequency plasma magnetron sputtering technique[J]. Plasma Science and Technology, 2017, 19(4): 45502-045502. DOI: 10.1088/2058-6272/aa57f0

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Fabrication and characterization of He-charged ODS-FeCrNi films deposited by a radio-frequency plasma magnetron sputtering technique

1 Key Laboratory of Materials Physics, Institute of Solid State Physics, Chinese Academy of Sciences, Hefei 230031, People’s Republic of China 2 University of Science and Technology of China, Hefei 230026, People’s Republic of China

Funds: This work was financially supported by National Natural Science Foundation of China (No. 11374299).

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Received Date: September 17, 2016

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Abstract

Abstract

He-charged oxide dispersion strengthened (ODS) FeCrNi films were prepared by a radio-frequency (RF) plasma magnetron sputtering method in a He and Ar mixed atmosphere at 150 °C. As a comparison, He-charged FeCrNi films were also fabricated at the same conditions through direct current (DC) plasma magnetron sputtering. The doping of He atoms and Y₂O₃ in the FeCrNi films was realized by the high backscattered rate of He ions and Y₂O₃/FeCrNi composite target sputtering method, respectively. Inductive coupled plasma (ICP) and x-ray photoelectron spectroscopy (XPS) analysis confirmed the existence of Y₂O₃ in FeCrNi films, and Y₂O₃ content hardly changed with sputtering He/Ar ratio. Cross-sectional scanning electron microscopy (SEM) shows that the FeCrNi films were composed of dense columnar nanocrystallines and the thickness of the films was obviously dependent on He/Ar ratio. Nanoindentation measurements revealed that the FeCrNi films fabricated through DC/RF plasma magnetron sputtering methods exhibited similar hardness values at each He/Ar ratio, while the dispersion of Y₂O₃ apparently increased the hardness of the films. Elastic recoil detection (ERD) showed that DC/RF magnetron sputtered FeCrNi films contained similar He amounts (∼17 at.%). Compared with the minimal change of He level with depth in DC-sputtered films, the He amount decreases gradually in depth in the RF-sputtered films. The Y₂O₃-doped FeCrNi films were shown to exhibit much smaller amounts of He owing to the lower backscattering possibility of Y₂O₃ and the inhibition effect of nano-sized Y₂O₃ particles on the He element.

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References (8)

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