Modeling of the impurity-induced silicon nanocone growth by low energy helium plasma irradiation

Quan SHI (石权); Shin KAJITA; Shuyu DAI (戴舒宇); Shuangyuan FENG (冯双园); Noriyasu OHNO

doi:10.1088/2058-6272/abea71

Plasma Science and Technology > 2021 > 23(4): 45503-045503. > DOI: 10.1088/2058-6272/abea71

Quan SHI (石权), Shin KAJITA, Shuyu DAI (戴舒宇), Shuangyuan FENG (冯双园), Noriyasu OHNO. Modeling of the impurity-induced silicon nanocone growth by low energy helium plasma irradiation[J]. Plasma Science and Technology, 2021, 23(4): 45503-045503. DOI: 10.1088/2058-6272/abea71

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Modeling of the impurity-induced silicon nanocone growth by low energy helium plasma irradiation

¹ Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
² Institute of Materials and Systems for Sustainability, Nagoya University, Nagoya 464-8603, Japan
³ Key Laboratory of Materials Modification by Laser, Ion and Electron Beams Ministry of Education, School of Physics, Dalian University of Technology, Dalian 116024, People's Republic of China

Funds: This work was supported in part by a Grant-in Aid for Scientific Research (Nos. 17KK0132, 19H01874) from the Japan
Society for the Promotion of Science (JSPS). The contribution by Dr Shuyu Dai was also supported by National MCF
Energy R&D Program of China (Nos. 2018YFE0311100 and 2018YFE0303105) and National Natural Science Foundation of China (No. 12075047).

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Received Date: November 04, 2020
Revised Date: February 24, 2021
Accepted Date: February 25, 2021

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Abstract

Abstract

The formation mechanism of nanocone structure on silicon (Si) surface irradiated by helium plasma has been investigated by experiments and simulations. Impurity (molybdenum) aggregated as shields on Si was found to be a key factor to form a high density of nanocone in our previous study. Here to concrete this theory, a simulation work has been developed with SURO code based on the impurity concentration measurement of the nanocones by using electron dispersive x-ray spectroscopy. The formation process of the nanocone from a flat surface was presented. The modeling structure under an inclining ion incident direction was in good agreement with the experimental result. Moreover, the redeposition effect was proposed as another important process of nanocone formation based on results from the comparison of the cone diameter and sputtering yield between cases with and without the redeposition effect.
- black silicon,
- helium plasma,
- nanocone,
- simulation

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References

[1]	Kanechika M, Sugimoto N and Mitsushima Y 2002 J. Vac. Sci. Technol. B 20 1298
[2]	Ao X Y et al 2012 Appl. Phys. Lett. 101 111901
[3]	Steglich M et al 2014 J. Appl. Phys. 116 173503
[4]	Xia Y et al 2011 Sol. Energy 85 1574
[5]	Her T H et al 1998 Appl. Phys. Lett. 73 1673
[6]	Kajita S et al 2013 J. Appl. Phys. 113 134301
[7]	Kajita S et al 2014 App. Surf. Sci. 303 438
[8]	Takamura S et al 2016 Japan. J. Appl. Phys. 55 120301
[9]	Takamura S et al 2019 Appl. Surf. Sci. 487 755
[10]	Thompson M et al 2020 Plasma Process. Polym. 17 2000126
[11]	Shi Q et al 2020 J. Appl. Phys. 128 023301
[12]	Ozaydin G et al 2008 J. Vac. Sci. Technol. B 26 551
[13]	Tanemura M et al 2004 Nucl. Instrum. Methods Phys. Res. B 215 137
[14]	Qiu Y et al 2012 Opt. Express 20 22087
[15]	Ma X L et al 2002 J. Cryst. Growth 234 654
[16]	Nishijima D et al 2019 Nucl. Mater. Energy 18 67
[17]	Robinson R S and Rossnagel S M 1982 J. Vac. Sci. Technol. 21 790
[18]	Dai S Y et al 2015 J. Nucl. Mater. 463 372
[19]	Shi Q et al 2017 Contrib. Plasma Phys. 57 329
[20]	Goldstein J I, Williams D B and Cliff G 1986 Quantitative x-ray analysis Principles of Analytical Electron Microscopy ed D C Joy et al (Boston: Springer) p 155
[21]	Gnaser H 2007 Energy and angular distributions of sputtered species Sputtering by Particle Bombardment. Topics in Applied Physics ed R Behrisch and W Eckstein (Berlin: Springer) p 231
[22]	Eckstein W et al 1996 Physical sputtering and radiationenhanced sublimation Physical Processes of the Interaction of Fusion Plasmas with Solids (New York: Academic) p 93
[23]	Yamamura Y and Mizuno Y 1985 Low-energy sputterings with the Monte Carlo Program ACAT Institute of Plasma Physics, Nagoya University IPPJ-AM-40
[24]	Eckstein W et al 1993 Sputtering data Report IPP 9/82 Max-Planck-Institut für Plasmaphysik
[25]	Wehner G K 1985 J. Vac. Sci. Technol. A 3 1821
[26]	Begrambekov L B, Zakharov A M and Telkovsky V G 1996 Nucl. Instrum. Methods Phys. Res. B 115 456

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Modeling of the impurity-induced silicon nanocone growth by low energy helium plasma irradiation