Low-pressure-RF plasma modification of UiO-66 and its application in methylene blue adsorption

Tian ZHOU; Douhao YANG; Yijun WANG; Jiushan CHENG; Qiang CHEN; Bowen LIU; Zhongwei LIU

doi:10.1088/2058-6272/acc3d2

Plasma Science and Technology > 2023 > 25(8): 085505. > DOI: 10.1088/2058-6272/acc3d2

Tian ZHOU, Douhao YANG, Yijun WANG, Jiushan CHENG, Qiang CHEN, Bowen LIU, Zhongwei LIU. Low-pressure-RF plasma modification of UiO-66 and its application in methylene blue adsorption[J]. Plasma Science and Technology, 2023, 25(8): 085505. DOI: 10.1088/2058-6272/acc3d2

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Low-pressure-RF plasma modification of UiO-66 and its application in methylene blue adsorption

Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600, People's Republic of China

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Corresponding author:
LIU Zhongwei, E-mail: liuzhongwei@bigc.edu.cn
¹ Tian Zhou and Douhao Yang contributed equally to this study.
Received Date: September 29, 2022
Revised Date: March 07, 2023
Accepted Date: March 12, 2023
Available Online: December 05, 2023
Published Date: April 18, 2023

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Abstract

Abstract

Defect engineering of metal-organic frameworks has attracted increasing attention in recent years for potential applications in gas storage and catalysis. In this study, defective UiO-66 is obtained by Ar and H₂ plasma treatments. Compared with the pristine UiO-66, a new aperture with a size of ~4 nm appears for a sample with the plasma modification, indicating the formation of mesopores within UiO-66 framework. Characterization results demonstrate that the pore volume, surface area and the number of Lewis and Brönsted acid sites can be easily tuned by varying the discharge parameters. The adsorption performance of UiO-66 is evaluated for the adsorption of methyl blue. In comparison to the pristine UiO-66 and the sample with H₂ plasma treatment, the Ar plasma modified sample shows excellent adsorption activity due to the suitable pore size and volume. Equilibrium adsorption capacity as high as 40.6 mg·g^-1 is achieved for the UiO-66 (Ar) sample.
- Ar plasma,
- UiO-66,
- defects,
- metal-organic frameworks

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Acknowledgments

This study is financially supported by National Natural Science Foundation of China (Nos. 12075032 and 12105021), the Natural Science Foundation of Beijing Municipality (Nos. KZ202010015022 and 8222055), the Yunnan Police College Project (Nos. YNPC-S2021002 and YJKF002) the and Beijing Institute of Graphic Communication Project (Nos. Ec202207 and S202210015021).

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