e-dimensional fluid model of pulse modulated radio-frequency SiH4/N2/O2 discharge

WANG Yan(王燕); LIU Xiang-Mei(刘相梅); SONG Yuan-Hong(宋远红); WANG You-Nian(王友年)

doi:10.1088/1009-0630/14/2/05

Plasma Science and Technology > 2012 > 14(2): 107-110. > DOI: 10.1088/1009-0630/14/2/05

WANG Yan(王燕), LIU Xiang-Mei(刘相梅), SONG Yuan-Hong(宋远红), WANG You-Nian(王友年). e-dimensional fluid model of pulse modulated radio-frequency SiH₄/N₂/O₂ discharge[J]. Plasma Science and Technology, 2012, 14(2): 107-110. DOI: 10.1088/1009-0630/14/2/05

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e-dimensional fluid model of pulse modulated radio-frequency SiH₄/N₂/O₂ discharge

1 School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China 2 School of Physics, Huazhong University of Science and Technology, Wuhan 430074, China

Funds: supported by National Natural Science Foundation of China (No.10775025), Important National Science & Technology Specific Project (Grant No: 2011ZX02403-001), and Program for New Century Excellent Talents in University (NCET-08-0073).

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Abstract

Abstract

Driven by pulse modulated radio-frequency source, the behavior of SiH4/N2/O2 plasma in capacitively coupled discharge are studied by using a one-dimensional fluid model. Totally, 48 different species (electrons, ions, neutrals, radicals and excited species) are involved in this simulation. Time evolution of the particle densities and electron temperature with different duty cycles are obtained, as well as the electronegativity n_SH3-/n_e of the main negative ion (SH₃^- ). The results show that, by reducing the duty cycle, higher electron temperature and particle density can be achieved for the same average dissipated power, and the ion energy can also be effectively reduced, which will offer evident improvement in plasma deposition processes compared with the case of continuous wave discharge.
- pulsed modulation,
- SiH₄/N₂/O₂ discharge,
- capacitively coupled plasma,
- fluid model

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