Plasma Diagnosis for Microwave ECR Plasma Enhanced Sputtering Deposition of DLC Films

PANG Jianhua (庞见华); LU Wenqi (陆文琪); XIN Yu (辛煜); WANG Hanghang (王行行); HE Jia (贺佳); XU Jun (徐军)

doi:10.1088/1009-0630/14/2/17

Plasma Science and Technology > 2012 > 14(2): 172-176. > DOI: 10.1088/1009-0630/14/2/17

PANG Jianhua (庞见华), LU Wenqi (陆文琪), XIN Yu (辛煜), WANG Hanghang (王行行), HE Jia (贺佳), XU Jun (徐军). Plasma Diagnosis for Microwave ECR Plasma Enhanced Sputtering Deposition of DLC Films[J]. Plasma Science and Technology, 2012, 14(2): 172-176. DOI: 10.1088/1009-0630/14/2/17

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Plasma Diagnosis for Microwave ECR Plasma Enhanced Sputtering Deposition of DLC Films

1 Key Laboratory of Materials Modification by Laser, Ion and Electron Beams (Dalian University of Technology), Ministry of Education, Dalian 116024, China 2 .School of Physics and Optoelectronic Technology, Suzhou University, Suzhou 215000, China

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Received Date: August 05, 2011

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Abstract

Application of the Langmuir probe in plasma circumstance for deposition of Diamond-like Carbon (DLC) thin films usually faces the problem of rapid failure of the probe due to surface insulative coating. In this paper, we circumvent the problem by using the floating harmonic probe technique. In the real circumstance of DLC film deposition, the floating harmonic probe worked reliably over 3 hours, correctly indicating the ion density and electron temperature. The technique was practically used to measure the ion density and electron temperature in DLC film deposition processes using the microwave ECR plasma enhanced sputtering. Combined with the Raman spectroscopic characterization of the films, the condition for deposition of DLC films were investigated.
- floating harmonic probe,
- DLC films,
- microwave ECR plasma,
- Raman spectroscopy

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