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S. Hamideh MORTAZAVI, Mahmood GHORANNEVISS, Soheil PILEHVAR, Sina ESMAEILI, Hamzeh JODAT. Effect of Low-Pressure Nitrogen DC Plasma Treatment on the Surface Properties of Biaxially Oriented Polypropylene, Poly (Methyl Methacrylate) and Polyvinyl Chloride Films[J]. Plasma Science and Technology, 2013, 15(4): 362-367. DOI: 10.1088/1009-0630/15/4/10
Citation: S. Hamideh MORTAZAVI, Mahmood GHORANNEVISS, Soheil PILEHVAR, Sina ESMAEILI, Hamzeh JODAT. Effect of Low-Pressure Nitrogen DC Plasma Treatment on the Surface Properties of Biaxially Oriented Polypropylene, Poly (Methyl Methacrylate) and Polyvinyl Chloride Films[J]. Plasma Science and Technology, 2013, 15(4): 362-367. DOI: 10.1088/1009-0630/15/4/10

Effect of Low-Pressure Nitrogen DC Plasma Treatment on the Surface Properties of Biaxially Oriented Polypropylene, Poly (Methyl Methacrylate) and Polyvinyl Chloride Films

  • In this study, commercial biaxially oriented polypropylene (BOPP), polyvinyl chlo- ride (PVC) and poly (methyl methacrylate) (PMMA) flims were treated with nitrogen plasma over different exposure times in a Pyrex tube surrounded by a DC variable magnetic field. The chemi- cal changes that appeared on the surface of the samples were investigated using Fourier transform infrared (FT-IR) spectroscopy and attenuated total reflectance Fourier transform infrared (ATR- FTIR) spectroscopy after treatment for 2 min, 4 min and 6 min in a nitrogen plasma chamber. E®ects of the plasma treatment on the surface topographies and contact angles of the untreated and plasma treated films were also analyzed by atomic force microscopy (AFM) and a contact angle measuring system. The results show that the plasma treated films become more hydrophilic with an enhanced wettability due to the formation of some new polar groups on the surface of the treated films. Moreover, at higher exposure times, the total surface energy in all treated films increased while a reduction in contact angle occurred. The behavior of surface roughness in each sample was completely di®erent at higher exposure times.
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