Citation: | CHEN Zhaoquan(陈兆权), ZHENG Xiaoliang(郑晓亮), XIA Guangqing(夏广庆), LI Ping(李平), HU Yelin(胡业林), DU Zhiwen(杜志文), ZHU Longji(祝龙记), LIU Minghai(刘明海), CHEN Minggong(陈明功), HU Xiwei(胡希伟). A 30 mm Wide DC-Driven Brush-Shaped Cold Air Plasma Without Airflow Supplement[J]. Plasma Science and Technology, 2014, 16(4): 329-334. DOI: 10.1088/1009-0630/16/4/06 |
1 Chen Z, Xia G, Zhou Q, et al. 2012, Rev. Sci. Instrum.,83: 084701;
|
2 Cvelbar U. 2011, J. Phys. D: Appl. Phys., 44: 174014;
|
3 Kong M, Kroesen G, Morˉll G, et al. 2009, New J.Phys., 11: 115012;
|
4 Chen Z, Xia G, Liu M, et al. 2012, IEEE Trans. Plasma Sci., 40: 2861;
|
5 Chu P K. 2007, IEEE Trans. Plasma Sci., 35 : 181;
|
6 Walsh J L and Kong M. 2008, Appl. Phys. Lett., 93:111501;
|
7 Laroussi M and Akman M A. 2011, AIP Adv., 1:032138;
|
8 Nie Q Y, Wang D Z, Ren C S, et al. 2008, Appl. Phys.Lett., 93: 011503;
|
9 Lu X, Jiang Z, Xiong Q, et al. 2008, Appl. Phys. Lett.,92: 151504;
|
10 Lu X, Laroussi M, and Puech V, 2012, Plasma Sources Sci. Technol., 21: 034005;
|
11 Hong Y and Uhm H. 2007, Phys. Plasmas, 14: 053503;
|
12 Hong Y, Kang W, Hong Y, et al. 2009, Phys. Plasmas,16: 123502;
|
13 Pei X, Lu X, Liu J, et al. 2012, J. Phys. D: Appl. Phys.,45: 165205;
|
14 Wu S, Lu X, Xiong Z, et al. 2010, IEEE Trans. Plasma Sci., 38: 3404; Wu S, Wang Z, Huang Q, et al. 2011,IEEE Trans. Plasma Sci., 39: 1489;
|
15 Wu S, Wang Z, Huang Q, et al. 2012, Phys. Plasmas,19: 103503;
|
16 Kang S K, Seo Y S, Lee H W, et al. 2011, J. Phys. D:Appl. Phys., 44: 435201;
|
17 Tang J, Cao W, Zhao W, et al. 2012, Phys. Plasmas,19: 013501;
|
18 Lu X, Wu S, Chu P K, et al. 2011, Plasma Sources Sci. Technol., 20: 065009;
|
19 Wang D, Zhao D, Feng K, et al. 2011, Appl. Phys.Lett., 98 : 161501;
|
20 Liu X, Hu J, Liu J, et al. 2012, Appl. Phys. Lett., 101:043705;
|
21 Xian Y, Wu S, Wang Z, et al. 2013, Plasma Process.Polym., 10: 372;
|
22 Lu X, Jiang Z, Xiong Q, et al. 2008, Appl. Phys. Lett.,92: 081502;
|
23 Wang Z, Ren C, Nie Q, et al. 2009, Plasma Sci. Tech-nol., 11: 177;
|
24 Wang Y H and Wang D Z. 2006, Plasma Sci. Technol.,8: 539
|