Control of Beam Energy and Flux Ratio in an Ion-Beam-Background Plasma System Produced in a Double Plasma Device

WEI Zian (卫子安); MA Jinxiu (马锦秀); LI Yuanrui (李元瑞); SUN Yan (孙彦); JIANG Zhengqi (江正琦)

doi:10.1088/1009-0630/18/11/04

Plasma Science and Technology > 2016 > 18(11): 1076-1080. > DOI: 10.1088/1009-0630/18/11/04

WEI Zian (卫子安), MA Jinxiu (马锦秀), LI Yuanrui (李元瑞), SUN Yan (孙彦), JIANG Zhengqi (江正琦). Control of Beam Energy and Flux Ratio in an Ion-Beam-Background Plasma System Produced in a Double Plasma Device[J]. Plasma Science and Technology, 2016, 18(11): 1076-1080. DOI: 10.1088/1009-0630/18/11/04

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Control of Beam Energy and Flux Ratio in an Ion-Beam-Background Plasma System Produced in a Double Plasma Device

1CAS Key Laboratory of Geospace Environment, Department of Modern Physics, University of Science and Technology of China, Hefei 230026, China 2Ming Hsieh Department of Electrical Engineering, University of Southern California, Los Angeles, CA 90089, USA

Funds: supported by National Natural Science Foundation of China (Nos. 11575183, 11175177)

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Received Date: December 24, 2015

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Abstract

Abstract

Plasmas containing ion beams have various applications both in plasma technology and in fundamental research. The ion beam energy and flux are the two factors characterizing the beam properties. Previous studies have not achieved the independent adjustment of these two parameters. In this paper, an ion-beam-background-plasma system was produced with hot-cathode discharge in a double plasma device separated by two adjacent grids, with which the beam energy and flux ratio (the ratio between the beam flux and total ion flux) can be controlled independently. It is shown that the discharge voltage (i.e., voltage across the hot-cathode and anode) and the voltage drop between the two separation grids can be used to effectively control the beam energy while the flux ratio is not affected by these voltages. The flux ratio depends sensitively on hot-filaments heating current whose influence on the beam energy is relatively weak, and thus enabling approximate control of the flux ratio
- ion beam,
- background plasma,
- beam energy,
- flux ratio

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References

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