Automatic emissive probe apparatus for accurate plasma and vacuum space potential measurements

Jianquan LI (李建泉); Wenqi LU (陆文琪); Jun XU (徐军); Fei GAO (高飞); Younian WANG (王友年)

doi:10.1088/2058-6272/aa97cd

Plasma Science and Technology > 2018 > 20(2): 24002-024002. > DOI: 10.1088/2058-6272/aa97cd

Jianquan LI (李建泉), Wenqi LU (陆文琪), Jun XU (徐军), Fei GAO (高飞), Younian WANG (王友年). Automatic emissive probe apparatus for accurate plasma and vacuum space potential measurements[J]. Plasma Science and Technology, 2018, 20(2): 24002-024002. DOI: 10.1088/2058-6272/aa97cd

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Automatic emissive probe apparatus for accurate plasma and vacuum space potential measurements

1 Key Laboratory of Materials Modi?cation by Laser, Ion and Electron Beams (Dalian University of Technology), Ministry of Education, Dalian 116024, People’s Republic of China 2 School of Physics, Dalian University of Technology, Dalian 116024, People’s Republic of China

Funds: The study was supported by National Natural Science Foundation of China (No. 11675039).

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Received Date: July 16, 2017

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Abstract

Abstract

We have developed an automatic emissive probe apparatus based on the improved inflection point method of the emissive probe for accurate measurements of both plasma potential and vacuum space potential. The apparatus consists of a computer controlled data acquisition card, a working circuit composed by a biasing unit and a heating unit, as well as an emissive probe. With the set parameters of the probe scanning bias, the probe heating current and the fitting range, the apparatus can automatically execute the improved inflection point method and give the measured result. The validity of the automatic emissive probe apparatus is demonstrated in a test measurement of vacuum potential distribution between two parallel plates, showing an excellent accuracy of 0.1 V. Plasma potential was also measured, exhibiting high efficiency and convenient use of the apparatus for space potential measurements.
- space potential,
- emissive probe,
- probe heating current,
- LabVIEW

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References (26)

References

[1]	Langmuir I and Mott-Smith H M 1924 Gen. Electr. Rev. 27 449
[2]	Yuri P R 1991 Gas Discharged Physics (Berlin: Springer) ch 6
[3]	Bousselin G et al 2015 Phys. Plasmas 22 053511
[4]	Wang E Y et al 1986 Rev. Sci. Instrum. 57 2425
[5]	Schrittwieser R et al 2008 Plasma Phys. Control. Fusion 50 055004
[6]	Schrittwieser R et al 2002 Plasma Phys. Control. Fusion 44 567
[7]	Adamek J et al 2014 Contrib. Plasma Phys. 54 279
[8]	Balan P et al 2003 Rev. Sci. Instrum. 74 1583
[9]	Ionita C et al 2004 Rev. Sci. Instrum. 75 4331
[10]	Yamada H and Murphree D L 1971 Phys. Fluids 14 1120
[11]	Oksuz L and Hershkowitz N 2002 Phys. Rev. Lett. 89 145001
[12]	Kella V P et al 2016 Rev. Sci. Instrum. 87 043508
[13]	Cho M H et al 1984 Rev. Sci. Instrum. 55 631
[14]	Diebold D et al 1988 Rev. Sci. Instrum. 59 270
[15]	Hershkowitz N 1994 IEEE Trans. Plasma Sci. 22 11
[16]	Sheehan J P and Hershkowitz N 2011 Plasma Sources Sci. Technol. 20 063001
[17]	Chen F F 1965 Plasma Diagnostic Techniques ed R H Huddlestone and S L Leonard (New York: Academic) ch 4 p 184
[18]	Hoffmann C R and Lees D J 1971 Plasma Phys. 13 689
[19]	Kemp R F and Sellen J M 1966 Rev. Sci. Instrum. 37 455
[20]	Smith J R, Hershkowitz N and Coakley P 1979 Rev. Sci. Instrum. 50 210
[21]	Sheehan J P et al 2011 Phys. Plasmas 18 073501
[22]	Li J Q et al 2016 J. Vac. Sci. Technol. A 34 061304
[23]	LabVIEW User Manual (National Instruments Corporation, Austin, TX, 2003)
[24]	Abraham S and Marcel J E G 1964 Anal. Chem. 36 1627
[25]	Bai Y J et al 2016 Plasma Sci. Technol. 18 58
[26]	Bai Y J et al 2016 Phys. Plasmas 23 083522