Exploration to generate atmospheric pressure glow discharge plasma in air

Wenzheng LIU (刘文正); Chuanlong MA (马传龙); Shuai ZHAO (赵帅); Xiaozhong CHEN (陈晓中); Tahan WANG (王踏寒); Luxiang ZHAO (赵潞翔); Zhiyi LI (李治一); Jiangqi NIU (牛江奇); Liying ZHU (祝莉莹); Maolin CHAI (柴茂林)

doi:10.1088/2058-6272/aa9885

Plasma Science and Technology > 2018 > 20(3): 35401-035401. > DOI: 10.1088/2058-6272/aa9885

Wenzheng LIU (刘文正), Chuanlong MA (马传龙), Shuai ZHAO (赵帅), Xiaozhong CHEN (陈晓中), Tahan WANG (王踏寒), Luxiang ZHAO (赵潞翔), Zhiyi LI (李治一), Jiangqi NIU (牛江奇), Liying ZHU (祝莉莹), Maolin CHAI (柴茂林). Exploration to generate atmospheric pressure glow discharge plasma in air[J]. Plasma Science and Technology, 2018, 20(3): 35401-035401. DOI: 10.1088/2058-6272/aa9885

Citation:

PDF (1808 KB)

Exploration to generate atmospheric pressure glow discharge plasma in air

School of Electrical Engineering, Beijing Jiaotong University, Beijing 100044, People’s Republic of China

More Information

Received Date: September 22, 2017

Graphical Abstract

Abstract

Abstract

Atmospheric pressure glow discharge (APGD) plasma in air has high application value. In this paper, the methods of generating APGD plasma in air are discussed, and the characteristics of dielectric barrier discharge (DBD) in non-uniform electric field are studied. It makes sure that APGD in air is formed by DBD in alternating current electric field with using the absorbing electron capacity of electret materials to provide initial electrons and to end the discharge progress. Through designing electric field to form two-dimensional space varying electric field and three-dimensional space varying electric field, the development of electron avalanches in air-gap is suppressed effectively and a large space of APGD plasma in air is generated. Further, through combining electrode structures, a large area of APGD plasma in air is generated. On the other hand, by using the method of increasing the density of initial electrons, millimeter-gap glow discharge in atmospheric pressure air is formed, and a maximum gap distance between electrodes is 8 mm. By using the APGD plasma surface treatment device composed of contact electrodes, the surface modification of high polymer materials such as aramid fiber and polyester are studied and good effect of modifications is obtained. The present paper provides references for the researchers of industrial applications of plasma.
- dielectric barrier discharge,
- electric field distribution,
- atmospheric pressure glow discharge plasmas

FullText(HTML)

References (36)

References

[1]	Kostov K G et al 2014 Appl. Surf. Sci. 314 367
[2]	Nishikawa K and Nojima H 2001 Japan. J. Appl. Phys. 40 L835
[3]	Lu X et al 2016 Phys. Rep. 630 1
[4]	Laroussi M and Lu X 2005 Appl. Phys. Lett. 87 113902
[5]	Massines F et al 2012 Plasma Process. Polym. 9 1041
[6]	Cui W S et al 2017 IEEE Trans. Plasma Sci. 45 328
[7]	Roth J R, Nourgostar S and Bonds T A 2007 IEEE Trans. Plasma Sci. 35 233
[8]	Sun J and Qiu Y P 2015 Plasma Sci. Technol. 17 402
[9]	Shao T et al 2010 Appl. Surf. Sci. 256 3888
[10]	Roth J R 1995 Industrial Plasma Engineering. Volume 1: Principles (Bristol, PA: Institute of Physic Publishing)
[11]	Roth J R 2001 Industrial Plasma Engineering. Volume 2— Applications to Nonthermal Plasma Processing (Boca Raton, FL: CRC Press)
[12]	TsaiJT HandKo HC2006 Appl. Phys. Lett. 88 013104
[13]	Boeuf J P 2003 J. Phys. D: Appl. Phys. 36 R53
[14]	Leipold F, Mohamed A A H and Schoenbach K H 2002 High electron density, atmospheric pressure air glow discharges Paper Presented at the Conf. Record of the 25th Int. Power Modulator Symp., 2002 and 2002 High-Voltage Workshop (Hollywood, CA, USA) (IEEE)
[15]	Engel A V et al 1933 Z. Phys. 85 144
[16]	Kanazawa S et al 1988 J. Phys. D: Appl. Phys. 21 838
[17]	Yokoyama T et al 1990 J. Phys. D: Appl. Phys. 23 1125
[18]	Massines F et al 1998 J. Appl. Phys. 83 2950
[19]	Massines F, Messaoudi R and Mayoux C 1998 Plasmas Polym. 3 43
[20]	Massines F et al 2003 Surf. Coat. Technol. 174-175 8
[21]	Roth J R, Laroussi M and Liu C Y 1992 Experimental generation of a steady-state glow discharge at atmospheric pressure Paper Presented at the IEEE Int. Conf. on Plasma Science, 1992. IEEE Conf. Record—Abstracts (Tampa, FL, USA) (IEEE)
[22]	Gadri R B et al 2000 Surf. Coat. Technol. 131 528
[23]	Roth J R et al 2005 J. Phys. D: Appl. Phys. 38 555
[24]	Urabe K, Sakai O and Tachibana K 2011 J. Phys. D: Appl. Phys. 44 115203
[25]	Lee Y H et al 2001 Surf. Coat. Technol. 146-147 474
[26]	Duten X et al 2002 IEEE Trans. Plasma Sci. 30 178
[27]	Wang D Y et al 2010 IEEE Trans. Plasma Sci. 38 2746
[28]	Pai D Z, Lacoste D A and Laux C O 2010 J. Appl. Phys. 107 093303
[29]	Shao T et al 2010 IEEE Trans. Dielectr. Electr. Insul. 17 1830
[30]	Liu W et al 2014 Phys. Plasmas 21 7011
[31]	Liu W Z 2017 Chin. Phys. Lett. 34 085203
[32]	Liu W Z et al 2017 Europhys. Lett. 118 45001
[33]	Liu W Z et al 2017 Appl. Phys. Lett. 110 024102
[34]	Liu W et al 2017 Plasma Chem. Plasma Process. 2017 1
[35]	Liu W et al 2016 Plasma Chem. Plasma Process. 2016 1
[36]	Raizer Y P and Braun C 1991 Gas Discharge Physics J. Applied Optics 31 2400

[1]	Dan ZHANG (张丹), Anmin CHEN (陈安民), Qiuyun WANG (王秋云), Ying WANG (王莹), Suyu LI (李苏宇), Yuanfei JIANG (姜远飞), Mingxing JIN (金明星). Effect of lens focusing distance on laser-induced silicon plasmas at different sample temperatures[J]. Plasma Science and Technology, 2019, 21(3): 34009-034009. DOI: 10.1088/2058-6272/aaec9b
[2]	Kang AN (安康), Liangxian CHEN (陈良贤), Jinlong LIU (刘金龙), Yun ZHAO (赵云), Xiongbo YAN (闫雄伯), Chenyi HUA (化称意), Jianchao GUO (郭建超), Junjun WEI (魏俊俊), Lifu HEI (黑立富), Chengming LI (李成明), Fanxiu LU (吕反修). The effect of substrate holder size on the electric field and discharge plasma on diamond-film formation at high deposition rates during MPCVD[J]. Plasma Science and Technology, 2017, 19(9): 95505-095505. DOI: 10.1088/2058-6272/aa7458
[3]	G C DAS. Some studies on transient behaviours of sheath formation in dusty plasma with the effect of adiabatically heated electrons and ions[J]. Plasma Science and Technology, 2017, 19(9): 95002-095002. DOI: 10.1088/2058-6272/aa750c
[4]	Feng WAN (弯峰), Chong LV (吕冲), Moran JIA (贾默然), Baisong XIE (谢柏松). Enhanced photon emission and pair production in laser-irradiated plasmas[J]. Plasma Science and Technology, 2017, 19(7): 75201-075201. DOI: 10.1088/2058-6272/aa64ed
[5]	WANG Ying (王莹), CHEN Anmin (陈安民), LI Suyu (李苏宇), SUI Laizhi (隋来志), LIU Dunli (刘敦利), LI Shuchang (李舒畅), LI He (李贺), JIANG Yuanfei (姜远飞), JIN Mingxing (金明星). Re-Heating Effect on the Enhancement of Plasma Emission Generated from Fe Under Femtosecond Double-Pulse Laser Irradiation[J]. Plasma Science and Technology, 2016, 18(12): 1192-1197. DOI: 10.1088/1009-0630/18/12/09
[6]	Hadar MANIS-LEVY, Tsachi LIVNEH, Ido ZUKERMAN, Moshe H. MINTZ, Avi RAVEH. Effect of Radio-Frequency and Low-Frequency Bias Voltage on the Formation of Amorphous Carbon Films Deposited by Plasma Enhanced Chemical Vapor Deposition[J]. Plasma Science and Technology, 2014, 16(10): 954-959. DOI: 10.1088/1009-0630/16/10/09
[7]	I. A. KHAN, R. S. RAWAT, R. VERMA, G. MACHARAGA, R. AHMAD, Z. A. UMAR, et al.. Role of Ion Beam Irradiation and Annealing Effect on the Deposition of AlON Nanolayers by Using Plasma Focus Device[J]. Plasma Science and Technology, 2013, 15(11): 1127-1135. DOI: 10.1088/1009-0630/15/11/10
[8]	V. SIVAKUMARAN, AJAI KUMAR, R. K. SINGH, V. PRAHLAD, H. C. JOSHI. Atomic Processes in Emission Characteristics of a Lithium Plasma Plume Formed by Double-Pulse Laser Ablation[J]. Plasma Science and Technology, 2013, 15(3): 204-208. DOI: 10.1088/1009-0630/15/3/02
[9]	LI Shengli (李胜利), HU Sheng (胡胜), ZHANG Han (张晗). A Novel Nanosecond Pulsed Power Unit for the Formation of •OH in Water[J]. Plasma Science and Technology, 2012, 14(4): 312-315. DOI: 10.1088/1009-0630/14/4/08
[10]	G.Yu. YUSHKOV, K.P. SAVKIN, A.G. NIKOLAEV, E.M. OKS, A.V. VODOPYANOV, I.V. IZOTOV, D.A. MANSFELD. Formation of Multicharged Metal Ions in Vacuum Arc Plasma Heated by Gyrotron Radiation[J]. Plasma Science and Technology, 2011, 13(5): 596-599.