Advanced Search+
ZHAO Yong (赵勇), CHEN Xian (陈贤), FANG Liguang (方利广), YANG Lianfang (杨莲芳), et al.. Effects of Annealing on the Structural and Photoluminescent Properties of Ag-Doped ZnO Nanowires Prepared by Ion Implantation[J]. Plasma Science and Technology, 2013, 15(8): 817-820. DOI: 10.1088/1009-0630/15/8/19
Citation: ZHAO Yong (赵勇), CHEN Xian (陈贤), FANG Liguang (方利广), YANG Lianfang (杨莲芳), et al.. Effects of Annealing on the Structural and Photoluminescent Properties of Ag-Doped ZnO Nanowires Prepared by Ion Implantation[J]. Plasma Science and Technology, 2013, 15(8): 817-820. DOI: 10.1088/1009-0630/15/8/19

Effects of Annealing on the Structural and Photoluminescent Properties of Ag-Doped ZnO Nanowires Prepared by Ion Implantation

Funds: supported by National Natural Science Foundation of China (No.11005059), and partially by the Science and Technology Project of Department of Education of Jiangxi Province, China (No.GJJ12119)
More Information
  • Received Date: March 01, 2012
  • ZnO nanowires deposited on Si substrates were prepared by thermal evaporation of a mixture of ZnO and carbon powder. Ag ions with an energy of 63 keV and a dose of 5×10 15 ions/cm 2 were implanted into the as-prepared ZnO nanowires. After ion implantation, the Ag-implanted ZnO nanowires were annealed in air at different temperatures from 600 ?C to 1000 ?C. Effects of ion implantation and thermal annealing on the structural and photolumines- cent (PL) properties of the ZnO nanowires were investigated by transmission electron microscopy (TEM), selected area energy dispersive X-ray spectroscopy (SAEDX), X-ray diffraction (XRD), and fluorescence spectrophotometry. TEM, HR-TEM, and SAEDX analyses demonstrated that efficient doping of Ag was achieved by ion implantation and the subsequent annealing process. XRD patterns revealed that the hexagonal wurtzite structure of ZnO nanowires was maintained after ion implantation. Photoluminescent emissions of ZnO nanowires were decreased significantly by Ag implantation but could be recovered by thermal annealing. The mechanism of the influence of ion implantation and annealing on the PL intensity was assessed.
  • Related Articles

    [1]Xian CHENG (程显), Peiyuan YANG (杨培远), Guowei GE (葛国伟), Qiliang WU (吴启亮), Wei XIE (谢伟). Dynamic dielectric recovery performance of serial vacuum and SF6 gaps in HVDC interruption and its regulation method[J]. Plasma Science and Technology, 2019, 21(7): 74010-074010. DOI: 10.1088/2058-6272/ab1720
    [2]Yi CHEN (陈毅), Fei YANG (杨飞), Hao SUN (孙昊), Yi WU (吴翊), Chunping NIU (纽春萍), Mingzhe RONG (荣命哲). Influence of the axial magnetic field on sheath development after current zero in a vacuum circuit breaker[J]. Plasma Science and Technology, 2017, 19(6): 64003-064003. DOI: 10.1088/2058-6272/aa65c8
    [3]ZHANG Junmin (张俊民), LU Chunrong (卢春荣), GUAN Yonggang (关永刚), LIU Weidong (刘卫东). Calculation of Nozzle Ablation During Arcing Period in an SF6 Auto-Expansion Circuit Breaker[J]. Plasma Science and Technology, 2016, 18(5): 506-511. DOI: 10.1088/1009-0630/18/5/11
    [4]ZHONG Jianying (钟建英), GUO Yujing (郭煜敬), ZHANG Hao (张豪). Pressure and Arc Voltage Measurement in a 252 kV SF6 Puffer Circuit Breaker[J]. Plasma Science and Technology, 2016, 18(5): 490-493. DOI: 10.1088/1009-0630/18/5/08
    [5]WU Yifei (吴益飞), REN Zhigang (任志刚), FENG Ying (冯英), LI Mei (李美), ZHANG Hantian (张含天). Analysis of Fault Arc in High-Speed Switch Applied in Hybrid Circuit Breaker[J]. Plasma Science and Technology, 2016, 18(3): 299-304. DOI: 10.1088/1009-0630/18/3/14
    [6]ZHANG Junmin (张俊民 ), CHI Chengbin (迟程缤), GUAN Yonggang (关永刚), LIU Weidong (刘卫东), WU Junhui (吴军辉). Simulation of Arc Rotation and Its Effects on Pressure of Expansion Volume in an Auto-Expansion SF6 Circuit Breaker[J]. Plasma Science and Technology, 2016, 18(3): 287-291. DOI: 10.1088/1009-0630/18/3/12
    [7]NIU Chunping (纽春萍), DING Juwen (丁炬文), WU Yi (吴翊), YANG Fei (杨飞), DONG Delong (董得龙), FAN Xingyu (范星宇), RONG Mingzhe (荣命哲). Simulation and Experimental Analysis of Arc Motion Characteristics in Air Circuit Breaker[J]. Plasma Science and Technology, 2016, 18(3): 241-246. DOI: 10.1088/1009-0630/18/3/05
    [8]LIN Xin (林莘), WANG Feiming (王飞鸣), XU Jianyuan (徐建源), XIA Yalong (夏亚龙), LIU Weidong (刘卫东). Study on the Mathematical Model of Dielectric Recovery Characteristics in High Voltage SF6 Circuit Breaker[J]. Plasma Science and Technology, 2016, 18(3): 223-229. DOI: 10.1088/1009-0630/18/3/02
    [9]ZHA Fengwei(查烽炜), SONG Zhiquan(宋执权), FU Peng(傅鹏), DONG Lin(董琳), WANG Min(王敏). Research on Reverse Recovery Transient of Parallel Thyristors for Fusion Power Supply[J]. Plasma Science and Technology, 2014, 16(7): 716-720. DOI: 10.1088/1009-0630/16/7/15
    [10]YANG Fei(杨飞), MA Ruiguang ( 马瑞光), WU Yi( 吴翊), SUN Hao( 孙昊), NIU Chunping( 纽春萍), RONG Mingzhe(荣命哲). Numerical study on arc plasma behavior during arc commutation process in direct current circuit breaker[J]. Plasma Science and Technology, 2012, 14(2): 167-171. DOI: 10.1088/1009-0630/14/2/16

Catalog

    Article views (247) PDF downloads (1681) Cited by()

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return