Citation: | Qinwen XUE (薛钦文), Xiaohua WANG (王晓华), Chenglin LIU (刘成林), Youwen LIU (刘友文). Pressure-controlled terahertz filter based on 1D photonic crystal with a defective semiconductor[J]. Plasma Science and Technology, 2018, 20(3): 35504-035504. DOI: 10.1088/2058-6272/aa98d8 |
[1] |
Yablonovitch E 1987 Phys. Rev. Lett. 58 2059
|
[2] |
John S 1987 Phys. Rev. Lett. 58 2486
|
[3] |
Pipa V I, Liptuga A I and Morozhenko V 2013 J. Optics 15 075104
|
[4] |
Maigyte L and Staliunas K 2015 Appl. Phys. Rev. 2 011102
|
[5] |
Hojo H and Mase A 2004 J. Plasma Fusion Res. 80 89
|
[6] |
Guo B, Peng L and Qiu X M 2013 Plasma Sci. Technol. 15 609
|
[7] |
Zhang H F et al 2012 Phys. Plasmas 19 112102
|
[8] |
Zhang H F et al 2013 J. Supercond. Nov. Magn. 26 77
|
[9] |
Ding G W et al 2015 Physica B 468–469 1
|
[10] |
Kong X K et al 2017 Opt. Commun. 383 391
|
[11] |
Jamshidi-Ghaleh K and Moslemi F 2017 Appl. Opt. 56 4146
|
[12] |
Abouti O E et al 2016 Phys. Plasmas 23 082115
|
[13] |
Zhang H F, Liu S B and Yang H 2014 J. Supercond. Nov. Magn. 27 41
|
[14] |
Zhang H F et al 2013 J. Supercond. Nov. Magn. 26 3391
|
[15] |
HungH C, Wu CJ and Chang S J 2011 J. Appl. Phys. 110 093110
|
[16] |
Yang J et al 2016 Sci. Rep. 6 38732
|
[17] |
Chang T W, Chien J R and Wu C J 2016 Appl. Opt. 55 943
|
[18] |
Feng Y C et al 2017 Plasmonics (https://doi.org/10.1007/ s11468-017-0557-6)
|
[19] |
LiPNandLiuY W2009 Phys. Lett. A 373 1870
|
[20] |
Wilson K S J and Navaneethakrishnan K 2005 Phys. Stat. Sol. 242 2515
|
[21] |
Wang H and Li Y P 2001 Acta Phys. Sin. 50 2172 (in Chinese)
|
[1] | Reza SAFARI, Farshad SOHBATZADEH. Effect of methane content and the oscillating electric field between electrodes on atmospheric Ar/methane plasma jet and DLC coating deposition[J]. Plasma Science and Technology, 2020, 22(8): 85401-085401. DOI: 10.1088/2058-6272/ab8550 |
[2] | Haibing LI (李海冰), Jie ZHU (朱杰), Wei YANG (杨威), Xu ZHANG (张旭), Donglai WANG (王东来), Junyu ZHU (朱俊谕), Xingming BIAN (卞星明). Humidity effects on the ground-level resultant electric field of positive DC conductors[J]. Plasma Science and Technology, 2019, 21(7): 74001-074001. DOI: 10.1088/2058-6272/ab0a3f |
[3] | Kefeng SHANG (商克峰), Jie LI (李杰), Rino MORENT. Hybrid electric discharge plasma technologies for water decontamination: a short review[J]. Plasma Science and Technology, 2019, 21(4): 43001-043001. DOI: 10.1088/2058-6272/aafbc6 |
[4] | Ahmed Rida GALALY, Guido VAN OOST. Fast inactivation of microbes and degradation of organic compounds dissolved in water by thermal plasma[J]. Plasma Science and Technology, 2018, 20(8): 85504-085504. DOI: 10.1088/2058-6272/aac1b7 |
[5] | Li ZHANG (张丽), Dezheng YANG (杨德正), Sen WANG (王森), Wenchun WANG (王文春). Spatiotemporal characteristics of nanosecond pulsed discharge in an extremely asymmetric electric field at atmospheric pressure[J]. Plasma Science and Technology, 2017, 19(6): 64006-064006. DOI: 10.1088/2058-6272/aa632d |
[6] | WANG Xiaoping(王小平), LI Zhongjian(李中坚), ZHANG Xingwang(张兴旺), LEI Lecheng(雷乐成). Characteristics of Electrode-Water-Electrode Discharge and its Application to Water Treatment[J]. Plasma Science and Technology, 2014, 16(5): 479-485. DOI: 10.1088/1009-0630/16/5/07 |
[7] | RAN Huijuan(冉慧娟), WANG Lei(王磊), WANG Jue(王珏), WANG Tao(王涛), YAN Ping(严萍). Discharge Characteristics of SF6 in a Non-Uniform Electric Field Under Repetitive Nanosecond Pulses[J]. Plasma Science and Technology, 2014, 16(5): 465-470. DOI: 10.1088/1009-0630/16/5/05 |
[8] | LIU Wenzheng(刘文正), WANG Hao(王浩), DOU Zhijun(窦志军). Impact of the Insulator on the Electric Field and Generation Characteristics of Vacuum Arc Metal Plasmas[J]. Plasma Science and Technology, 2014, 16(2): 134-141. DOI: 10.1088/1009-0630/16/2/09 |
[9] | LIU Wenzheng(刘文正), LI Chuanhui(李传辉). Study on the Generation Characteristics of Dielectric Barrier Discharge Plasmas on Water Surface[J]. Plasma Science and Technology, 2014, 16(1): 26-31. DOI: 10.1088/1009-0630/16/1/06 |
[10] | ZHU Linan (朱丽楠), WANG Yongjun (王永军), REN Zhijun (任芝军), LIU Guifang (刘桂芳), et al.. The Degradation of Organic Pollutants by Bubble Discharge in Water[J]. Plasma Science and Technology, 2013, 15(10): 1053-1058. DOI: 10.1088/1009-0630/15/10/17 |