Temporal electric field of a helium plasma jet by electric field induced second harmonic (E-FISH) method

Xu LI; Shaohui JIN; Ke SONG; Lanlan NIE; Dawei LIU; Xinpei LU

doi:10.1088/2058-6272/ac8419

Plasma Science and Technology > 2023 > 25(1): 015402. > DOI: 10.1088/2058-6272/ac8419

Xu LI, Shaohui JIN, Ke SONG, Lanlan NIE, Dawei LIU, Xinpei LU. Temporal electric field of a helium plasma jet by electric field induced second harmonic (E-FISH) method[J]. Plasma Science and Technology, 2023, 25(1): 015402. DOI: 10.1088/2058-6272/ac8419

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Temporal electric field of a helium plasma jet by electric field induced second harmonic (E-FISH) method

1.
State Key Laboratory of Advanced Electromagnetic Engineering and Technology, School of Electrical and Electronic Engineering, Huazhong University of Science and Technology, Wuhan 430074, People's Republic of China
2.
Center of Stomatology, Tongji Hospital, Tongji Medical College, Huazhong University of Science and Technology, Wuhan 430030, People's Republic of China
3.
School of Stomatology, Tongji Medical College, Huazhong University of Science and Technology, Wuhan 430030, People's Republic of China

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Author Bio:
Xinpei LU, E-mail: luxinpei@hust.edu.cn
Received Date: April 22, 2022
Revised Date: July 20, 2022
Accepted Date: July 24, 2022
Available Online: December 05, 2023
Published Date: November 10, 2022

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Abstract

Abstract

Electric field is an important parameter of plasma, which is related to electron temperature, electron density, excited species density, and so on. In this work, the electric field of an atmospheric pressure plasma jet is diagnosed by the electric field induced second harmonic (E-FISH) method, and the time-resolved electric field under different conditions is investigated. When positive pulse voltage is applied, the electric field has a peak of about 25 kV cm⁻¹ at the rising edge of the voltage pulse. A dark channel is left behind the plasma bullet and the electric field in the dark channel is about 5 kV cm⁻¹. On the other hand, when negative pulse voltage is applied, the electric field has a peak of −16 kV cm⁻¹ when the negative voltage is increased to −8 kV. A relatively bright channel is left behind the plasma head and the electric field in this relatively bright channel is about −6 kV cm⁻¹. When the pulse rising time increases from 60 to 200 ns, the peak electric field at both the rising edge and the falling edge of the voltage decreases significantly. When 0.5% of oxygen is added to the main working gas helium, the peak electric field at the rising edge is only about 15 kV cm⁻¹. On the other hand, when 0.5% nitrogen is added, the peak electric field increases especially at the falling edge of the voltage pulse, where it increases reversely from −12 to −16 kV cm⁻¹ (the minus sign only represents the direction of electric field).

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Acknowledgments

This work was supported by National Key Research and Development Program of China (No. 2021YFE0114700) and National Natural Science Foundation of China (Nos. 52130701 and 51977096).

References (42)

References

[1]	Lu X et al 2014 Phys. Rep. 540 123 doi: 10.1016/j.physrep.2014.02.006
[2]	Kim G C et al 2009 J. Phys. D: Appl. Phys. 42 032005 doi: 10.1088/0022-3727/42/3/032005
[3]	Lu X et al 2016 Phys. Rep. 630 1 doi: 10.1016/j.physrep.2016.03.003
[4]	Lu X P et al 2008 Appl. Phys. Lett. 92 151504 doi: 10.1063/1.2912524
[5]	Wang R X et al 2019 J. Phys. D: Appl. Phys. 52 074002 doi: 10.1088/1361-6463/aaf4c8
[6]	Laroussi M and Lu X 2005 Appl. Phys. Lett. 87 113902 doi: 10.1063/1.2045549
[7]	Reuter S et al 2009 Plasma Sources Sci. Technol. 18 015006 doi: 10.1088/0963-0252/18/1/015006
[8]	Bernhardt T et al 2019 Oxid. Med. Cell. Longevity 2019 3873928 doi: 10.1155/2019/3873928
[9]	Shashurin A et al 2008 Appl. Phys. Lett. 93 181501 doi: 10.1063/1.3020223
[10]	Deng X L et al 2013 J. Appl. Phys. 113 023305 doi: 10.1063/1.4774328
[11]	Gao J et al 2019 Int. Wound J. 16 1103 doi: 10.1111/iwj.13161
[12]	Von Woedtke T et al 2013 Phys. Rep. 530 291 doi: 10.1016/j.physrep.2013.05.005
[13]	Graves D B 2012 J. Phys. D: Appl. Phys. 45 263001 doi: 10.1088/0022-3727/45/26/263001
[14]	Laroussi M 2009 IEEE Trans. Plasma Sci. 37 714 doi: 10.1109/TPS.2009.2017267
[15]	Lee H W et al 2010 Plasma Process. Polym. 7 274 doi: 10.1002/ppap.200900083
[16]	Sarron V et al 2011 IEEE Trans. Plasma Sci. 39 2356 doi: 10.1109/TPS.2011.2155099
[17]	Lu X P et al 2008 J. Appl. Phys. 104 053309 doi: 10.1063/1.2977674
[18]	Robert E et al 2015 Phys. Plasmas 22 122007 doi: 10.1063/1.4934655
[19]	Duan J W et al 2020 Plasma Process. Polym. 17 2000005 doi: 10.1002/ppap.202000005
[20]	Raizer Y P 1991 Gas Discharge Physics (New York: Springer)
[21]	Lietz A M and Kushner M J 2018 J. Appl. Phys. 124 153303 doi: 10.1063/1.5049430
[22]	Naidis G V and Babaeva N Y 2020 High Volt. 5 650 doi: 10.1049/hve.2020.0065
[23]	Sretenovic G B et al 2014 J. Phys. D: Appl. Phys. 47 102001 doi: 10.1088/0022-3727/47/10/102001
[24]	Kovačević V V et al 2018 J. Phys. D: Appl. Phys. 51 065202 doi: 10.1088/1361-6463/aaa288
[25]	Sretenovic G B et al 2011 Appl. Phys. Lett. 99 161502 doi: 10.1063/1.3653474
[26]	Goldberg B M et al 2018 Appl. Phys. Lett. 112 064102 doi: 10.1063/1.5019173
[27]	Huang B D et al 2020 Plasma Sources Sci. Technol. 29 044001 doi: 10.1088/1361-6595/ab7854
[28]	Huang B D et al 2021 High Volt. 6 665 doi: 10.1049/hve2.12067
[29]	Cui Y Z, Zhuang C J and Zeng R 2019 Appl. Phys. Lett. 115 244101 doi: 10.1063/1.5129778
[30]	Orr K et al 2020 Plasma Sources Sci. Technol. 29 035019 doi: 10.1088/1361-6595/ab6e5b
[31]	Bigio I J, Finn R S and Ward J F 1975 Appl. Opt. 14 336 doi: 10.1364/AO.14.000336
[32]	Finn R S and Ward J F 1974 J. Chem. Phys. 60 454 doi: 10.1063/1.1681062
[33]	Chng T L, Starikovskaia S M and Schanne-Klein M C 2020 Plasma Sources Sci. Technol. 29 125002 doi: 10.1088/1361-6595/abbf93
[34]	Luque A, Ratushnaya V and Ebert U 2008 J. Phys. D: Appl. Phys. 41 234005 doi: 10.1088/0022-3727/41/23/234005
[35]	Naidis G V 2011 Appl. Phys. Lett. 98 141501 doi: 10.1063/1.3576940
[36]	Xiong Z et al 2010 J. Appl. Phys. 108 103303 doi: 10.1063/1.3511448
[37]	Jiang C, Chen M T and Gundersen M A 2009 J. Phys. D: Appl. Phys. 42 232002 doi: 10.1088/0022-3727/42/23/232002
[38]	Simeni M S et al 2018 Plasma Sources Sci. Technol. 27 015011 doi: 10.1088/1361-6595/aaa06e
[39]	Park G et al 2008 Plasma Process. Polym. 5 569 doi: 10.1002/ppap.200800019
[40]	Joh H M et al 2014 Sci. Rep. 4 6638 doi: 10.1038/srep06638
[41]	Van Gessel A F H, Alards K M J and Bruggeman P J 2013 J. Phys. D: Appl. Phys. 46 265202 doi: 10.1088/0022-3727/46/26/265202
[42]	Chng T L et al 2022 Plasma Sources Sci. Technol. 31 015010 doi: 10.1088/1361-6595/ac4592

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Temporal electric field of a helium plasma jet by electric field induced second harmonic (E-FISH) method

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