Fabrication of Diamond Microstructures by Using Dry and Wet Etching Methods

ZHANG Jicheng (张继成); ZHOU Minjie (周民杰); WU Weidong (吴卫东); TANG Yongjian (唐永建)

doi:10.1088/1009-0630/15/6/12

Plasma Science and Technology > 2013 > 15(6): 552-554. > DOI: 10.1088/1009-0630/15/6/12

ZHANG Jicheng (张继成), ZHOU Minjie (周民杰), WU Weidong (吴卫东), TANG Yongjian (唐永建). Fabrication of Diamond Microstructures by Using Dry and Wet Etching Methods[J]. Plasma Science and Technology, 2013, 15(6): 552-554. DOI: 10.1088/1009-0630/15/6/12

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Fabrication of Diamond Microstructures by Using Dry and Wet Etching Methods

Research Center of Laser Fusion, CAEP, Mianyang 621900, China

Funds: supported by National Natural Science Foundation of China (No. 60908023) and the Open Project of State Key Laboratory Cultivation Base for Nonmetal Composites and Functional Materials of China (No. 11zxfk19)

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Received Date: July 23, 2011

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Abstract

Abstract

Diamond films have great potential for micro-electro-mechanical system (MEMS) application. For device realization, precise patterning of diamond films at micrometer scale is indispensable. In this paper, simple and facile methods will be demonstrated for smart patterning of diamond films, in which two etching techniques, i.e., plasma dry etching and chemical wet etching (including isotropic-etching and anisotropic-etching) have been developed for obtaining diamond microstructures with different morphology demands. Free-standing diamond micro-gears and micro-combs were achieved as examples by using the experimental procedures. It is confirmed that as-designed diamond structures with a straight side wall and a distinct boundary can be fabricated effectively and efficiently by using such methods.
- MEMS,
- , diamond film,
- free-standing,
- reactive ion etching,
- anisotropic and isotropic wet etching

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