Fabrication of Diamond Microstructures by Using Dry and Wet Etching Methods

Diamond films have great potential for micro-electro-mechanical system (MEMS) application. For device realization, precise patterning of diamond films at micrometer scale is indispensable. In this paper, simple and facile methods will be demonstrated for smart patterning of diamond films, in which two etching techniques, i.e., plasma dry etching and chemical wet etching (including isotropic-etching and anisotropic-etching) have been developed for obtaining diamond microstructures with different morphology demands. Free-standing diamond micro-gears and micro-combs were achieved as examples by using the experimental procedures. It is confirmed that as-designed diamond structures with a straight side wall and a distinct boundary can be fabricated effectively and efficiently by using such methods.