1 Gelet J L, Missiaen J M. 2003, Proceeding of the 7th International Conference on Electric Fuses and their Applications (ICEFA), profuseinternational, Gdansk p.78 2 Wright A, Newbery P G. 2004, Electric Fuses. IEE Power & Energy Series 49, British Library Cataloguing Data, London 3 Plesca A. 2012, Electric Power Systems Research, 83: 144 4 Rochette D, Bussiμere W, Touzzani R, et al. 2007, ICEFA, 10th International Conference on Electric Fuses and their Applications, Clermont-Ferrand France, IEEE Catalog Number: 07EX1870, p.87 5 Bussiμere W. 2012, IOP Conf. Ser.: Mater. Sci. Eng.,28: 012001 6 Gounaridis N, Douvris V P, Psomopoulos C S, et al.2014, Conference IET MedPower, Athena, Greece.DOI: 10.13140/2.1.1790.0488 7 Rochette D, Touzani R, Bussiμere W. 2007, J. Phys. D:Appl. Phys., 40: 4544 8 Bussiμere W, Rochette D, Velleaud G, et al. 2008, J.Phys. D: Appl. Phys., 41: 13 9 Barrow D R, Howe A F, Cook N. 1991, IEE Proceeding A, 138: 83 10 Psomopoulos C S, Karagiannopolous C G. 2002, Measurement, 32: 15 11 Rochette D, Bussiμere W, Andre P. 2004, Plasma Chemistry and Plasma Processing, 24: 475 12 Ranjan R, Barrault M R. 1980, IEE Proceedings C, Generation, Transmission and Distribution, 127: 199 13 Rochette D, Bussiμere W. 2004, Plasma Source Sciences and Technology, 13: 293 14 Rax J M. 2005, Physique des Plasmas, DUNOD Paris 15 Fridman A and Kennedy L A. 2004, Plasma Physics and Engineering. Taylor and Francis, London 16 Fortov V E, Iakubov I T, Khrapak A G. 2006, Physics of Strongly Coupled Plasma. Clarendon Press, Oxford 17 Boulos M I, Fauchais P, Pfender E. 1994, Thermal Plasmas. Plenum Press, New York 18 Drawin H W. 1970, High Pressure High Temperature, 2: 359 19 Wang W, Yan J D, Rong M, et al. 2013, J. Phys. D: Appl. Phys., 46: 065203 20 Wang W Z, Rong M Z, Yan J D, et al. 2011, Phys. Plasmas, 18: 113502 21 Murphy A B. 2000, Plasma Chemistry and Plasma Processing, 20: 279 22 Andre P, Bussiμere W, Rochette D. 2007, Plasma Chemistry and Plasma Processing, 27: 381 23 Ghorui S and Das A K. 2013, Physics of Plasmas, 20: 093504 24 Zarghoul M R, Bourham M A, Doster J M. 2000, J. Phys. D: Appl. Phys., 33: 977 25 Griem H S. 1962, Physical Review, 128: 997 26 Rat V, Murphy A B, Aubreton J, et al. 2008, J. Phys.D: Appl. Phys., 41: 183001 27 Capitelli M, Colonna G, d'Angola A. 2012,Fundamental Aspects of Plasma Chemical Physics, Springer Series on Atomic, Optical and Plasma Physic, London 28 Andre P. 1995, IEEE Transactions on Plasma Science, 23: 453 29 Andre P, Aubreton J, Elchinger M F, et al. 2004, Plasma Chemistry and Plasma Processing, 24 : 435 30 Cheron B. 2001, Theorie cinetique des gaz, Ellipse Edition, France (in French) 31 Mason E A, Munn R J, Smith Francis J. 1967, The Physics of Fluids, 10: 1827 32 Devoto R S. 1973, The Physics of Fluids, 16: 616 33 Fricke B. 1986, J. Chem. Phys., 84: 862 34 Mayol R, Salvat F. 1997, Atomic Data and Nuclear Data Tables, 65: 55 35 Andre P. 2005, Colloque sur les arcs electriques, p.37-42, http://hal.ccsd.cnrs.fr. (in French) 36 Aubreton A, Elchinger M F. 2003, J. Phys. D: Appl. Phys. 36: 1798 37 Trajmar S, Williams W, Srivastava S K. 1977, J. Phys. B: Molec. Phys., 10: 3323 38 Msezane Alfred Z, Henry Ronald J W. 1986, Physical Review A, 33: 1631 39 Scheibner K F, Hazi A U. 1987, Physical Review A, 35: 4869 40 Hirschfelder O, Curtiss C F, Byron Bird R. 1964, 819 Plasma Science and Technology, Vol.18, No.8, Aug. 2016 Molecular Theory of Gases and Liquids. New York, Wiley 41 Cressault Y, Gleizes A and Riquel G. 2012, J. Phys.D: Appl. Phys., 45: 265202 42 Schram D C. 2009, Plasma Sources Sci. Technol., 18:014003 43 Wang W Z, Rong M Z and Spencer J W. 2013, Phys.Plasmas, 20: 113504 44 Yeekinchoi E, Bourda C, Benjemaa N, et al. 2015,International Journal of Technology, Innovation, Physics, Energy and Environment, 1: 3 (in French)
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