High-power microwave propagation properties in the argon plasma array

Yang LIU (刘洋); Jiaming SHI (时家明); Li CHENG (程立); Jiachun WANG (汪家春); Zhongcai YUAN (袁忠才); Zongsheng CHEN (陈宗胜)

doi:10.1088/2058-6272/aae369

Plasma Science and Technology > 2019 > 21(1): 15402-015402. > DOI: 10.1088/2058-6272/aae369

Yang LIU (刘洋), Jiaming SHI (时家明), Li CHENG (程立), Jiachun WANG (汪家春), Zhongcai YUAN (袁忠才), Zongsheng CHEN (陈宗胜). High-power microwave propagation properties in the argon plasma array[J]. Plasma Science and Technology, 2019, 21(1): 15402-015402. DOI: 10.1088/2058-6272/aae369

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High-power microwave propagation properties in the argon plasma array

State Key Laboratory of Pulsed Power Laser Technology, National University of Defense Technology, Hefei 230037, People’s Republic of China

Funds: This work is supported by the National High Technology Research and Development Program of China (Grant No. 2015AA0392).

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Received Date: May 20, 2018

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Abstract

The argon plasma induced by the L-/C-band high-power microwave (HPM) is investigated theoretically and experimentally. Influences of the microwave power, pulse width, polarization and the plasma electron density on the protection performance of the plasma array against HPM are studied. The results show that the effect of HPM is caused by energy accumulation, with the gas breakdown emerging only after a short time. The attenuation of the wave by the plasma array with the tubes off can reach approximately 23 dB at 1.3 GHz. It can also be obtained that the protection performance of the plasma array against the TE wave is better than that against the TM one. The plasma array shows better protection performance in the L-band than in the C-band. In addition, the attenuation of 5.6 GHz HPM can reach 30 dB when the tubes are turned on in the experiment. The research shows that the plasma array has protection ability against HPM.
- high-power microwave,
- plasma array,
- argon breakdown,
- protection performance,
- experiment

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