Advanced Search+
WENG Ming (翁明), XU Weijun (徐伟军). The Influence of Electrode Surface Mercury Film Deformation on the Breakdown Voltage of a Sub-Nanosecond Pulse Discharge Tube[J]. Plasma Science and Technology, 2012, 14(11): 1024-1029. DOI: 10.1088/1009-0630/14/11/12
Citation: WENG Ming (翁明), XU Weijun (徐伟军). The Influence of Electrode Surface Mercury Film Deformation on the Breakdown Voltage of a Sub-Nanosecond Pulse Discharge Tube[J]. Plasma Science and Technology, 2012, 14(11): 1024-1029. DOI: 10.1088/1009-0630/14/11/12

The Influence of Electrode Surface Mercury Film Deformation on the Breakdown Voltage of a Sub-Nanosecond Pulse Discharge Tube

More Information
  • Received Date: April 01, 2011
  • A sub-nanosecond pulse discharge tube is a gas discharge tube which can generate a rapid high-voltage pulse of kilo-volts in amplitude and sub-nanoseconds in width. In this paper, the sub-nanosecond pulse discharge tube and its working principles are described. On that basis, a view is presented that the breakdown voltage of the sub-nanosecond pulse discharge tube is dynamic. Because of the phenomenon that the deformation process of the mercury film on the electrode surface lags behind the charging process, the mercury film deformation process affects the dynamic breakdown voltage of the tube directly. The deformation of the mercury film is observed microscopically, and the dynamic breakdown voltage of the tube is measured using an oscillograph. The results show that all the parameters in the charging process, such as charging resistance, charging capacitance and DC power supply, affect the dynamic breakdown voltage of the tube. Based on these studies, the output pulse amplitude can be controlled continuously and individually by adjusting the power supply voltage. When the DC power supply is adjusted from 7 to 10 kV, the dynamic breakdown voltage ranges from 6.5 to 10 kV. According to our research, a kind of sub-nanosecond pulse generator is made, with a pulse width ranging from 0.5 to 2.5 ns, a rise time from 0.32 to 0.58 ns, and a pulse amplitude that is adjustable from 1.5 to 5 kV.
  • Related Articles

    [1]Kang AN, Shuai ZHANG, Siwu SHAO, Jinlong LIU, Junjun WEI, Liangxian CHEN, Yuting ZHENG, Qing LIU, Chengming LI. Effects of the electric field at the edge of a substrate to deposit a Ø100 mm uniform diamond film in a 2.45 GHz MPCVD system[J]. Plasma Science and Technology, 2022, 24(4): 045502. DOI: 10.1088/2058-6272/ac4deb
    [2]Ming SUN (孙明), Zhan TAO (陶瞻), Zhipeng ZHU (朱志鹏), Dong WANG (王东), Wenjun PAN (潘文军). Spectroscopic diagnosis of plasma in atmospheric pressure negative pulsed gas-liquid discharge with nozzle-cylinder electrode[J]. Plasma Science and Technology, 2018, 20(5): 54005-054005. DOI: 10.1088/2058-6272/aab601
    [3]LAN Hui (兰慧), WANG Xinbing (王新兵), ZUO Duluo (左都罗). Time-Resolved Optical Emission Spectroscopy Diagnosis of CO2 Laser-Produced SnO2 Plasma[J]. Plasma Science and Technology, 2016, 18(9): 902-906. DOI: 10.1088/1009-0630/18/9/05
    [4]WU Zhonghang(吴忠航), LI Zebin(李泽斌), JU Jiaqi(居家奇), HE Kongduo(何孔多), YANG Xilu(杨曦露), YAN Hang(颜航), CHEN Zhenliu(陈枕流), OU Qiongrong(区琼荣), LIANG Rongqing(梁荣庆). Experimental Investigation of Surface Wave Plasma Excited by a Cylindrical Dielectric Rod[J]. Plasma Science and Technology, 2014, 16(2): 118-122. DOI: 10.1088/1009-0630/16/2/06
    [5]WANG Huan(王欢), YANG Lizhen(杨丽珍), CHEN Qiang(陈强). Investigation of Microwave Surface-Wave Plasma Deposited SiO x Coatings on Polymeric Substrates[J]. Plasma Science and Technology, 2014, 16(1): 37-40. DOI: 10.1088/1009-0630/16/1/08
    [6]FU Wenjie (傅文杰), YAN Yang (鄢扬). Analysis of High-Power Microwave Propagation in a Magnetized Plasma Filled Waveguide[J]. Plasma Science and Technology, 2013, 15(10): 974-978. DOI: 10.1088/1009-0630/15/10/03
    [7]LI Cong (李聪), ZHANG Jialiang (张家良), YAO Zhi (姚志), WU Xingwei (吴兴伟), et al.. Diagnosis of Electron, Vibrational and Rotational Temperatures in an Ar/N 2 Shock Plasma Jet Produced by a Low Pressure DC Cascade Arc Discharge[J]. Plasma Science and Technology, 2013, 15(9): 875-880. DOI: 10.1088/1009-0630/15/9/08
    [8]LU Wenqi (陆文琪), JIANG Xiangzhan (蒋相站), LIU Yongxin (刘永新), YANG Shuo (杨烁), et al. Improved Double-Probe Technique for Spatially Resolved Diagnosis of Dual-Frequency Capacitive Plasmas[J]. Plasma Science and Technology, 2013, 15(6): 511-515. DOI: 10.1088/1009-0630/15/6/05
    [9]CHEN Zhaoquan (陈兆权), LIU Minghai (刘明海), HU Yelin (胡业林), ZHENG Xiaoliang (郑晓亮), LI Ping (李平), XIA Guangqing (夏广庆). Character Diagnosis for Surface-Wave Plasmas Excited by Surface Plasmon Polaritons[J]. Plasma Science and Technology, 2012, 14(8): 754-758. DOI: 10.1088/1009-0630/14/8/13
    [10]PANG Jianhua (庞见华), LU Wenqi (陆文琪), XIN Yu (辛煜), WANG Hanghang (王行行), HE Jia (贺佳), XU Jun (徐军). Plasma Diagnosis for Microwave ECR Plasma Enhanced Sputtering Deposition of DLC Films[J]. Plasma Science and Technology, 2012, 14(2): 172-176. DOI: 10.1088/1009-0630/14/2/17

Catalog

    Article views (379) PDF downloads (1507) Cited by()

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return