Best Magnetic Condition to Generate Hollow Cathode Glow Plasma in High Vacuum

ZHAO Xiaoling(赵小令); CHEN Shixiu(陈仕修); CHEN Kun(陈堃); CHEN Bokai(陈柏恺)

doi:10.1088/1009-0630/16/1/05

Plasma Science and Technology > 2014 > 16(1): 21-25. > DOI: 10.1088/1009-0630/16/1/05

ZHAO Xiaoling(赵小令), CHEN Shixiu(陈仕修), CHEN Kun(陈堃), CHEN Bokai(陈柏恺). Best Magnetic Condition to Generate Hollow Cathode Glow Plasma in High Vacuum[J]. Plasma Science and Technology, 2014, 16(1): 21-25. DOI: 10.1088/1009-0630/16/1/05

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Best Magnetic Condition to Generate Hollow Cathode Glow Plasma in High Vacuum

1 School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai 200240, China 2 School of Electrical Engineering, Wuhan University, Wuhan 430072, China

Funds: supported by National Natural Science Foundation of China (Nos.11075123 and 51207171)

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Received Date: August 20, 2013

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Abstract

Abstract

Based on magnetron hollow cathode discharge, the magnetic condition of glow plasma generation in high vacuum, including both direction and magnitude of the applied mag- netic field, is theoretically derived and experimentally evaluated in this paper. Single particle orbital theory is introduced to discuss the possibilities to generate glow plasma at gas pressure under 10⁻² Pa when the magnetic field direction is parallel or perpendicular or oblique to the electric field direction. A quantitative estimation criterion of magnetic induction intensity is also proposed in theory. The comparison with experiments suggests that glow plasma in high vacuum will form more easily in oblique magnetic field condition and that the criterion is accurate enough to estimate magnetic induction intensity at a certain gas pressure.
- high vacuum,
- magnetic condition,
- glow plasma,
- hollow cathode discharge

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References

1 Xu Xueji, Zhu Dingchang. 2008, Gas discharge physics. Fudan University Press, Shanghai (in Chinese) ;

2 Tang D L, Pu S H, Wang L S, et al. 2005, Review of Scientiˉc Instruments, 76: 11;

3 Krasik Ya E, Yamolich D, Gleizer J Z, et al. 2009,Physics of Plasmas, 16: 5;

4 Zhang Hao, Wu Guiqing, Li Heping, et al. 2009, IEEE Transactions on Plasma Science, 37: 1129;

5 Callegari Thierry, Gegot F, Pitchford L C, et al. 2005,IEEE Transactions on Plasma Science, 33: 384;

6 Ouitzau Meike, Wolter Matthias, Kersten Holger.2009, Plasma Processes and Polymers, 6: S392;

7 Li Ding, Chen Yinhua, Ma Jinxiu, et al. 2006, Plasma physics. Higher Education Press, Beijing (in Chinese) ;

8 Zhao Qing, Niu Shu, Tong Honghui. 2009, Plasma technology and application. National Defense Industry Press, Beijing (in Chinese) ;

9 Teii S. 1995, Plasma basic engineering: augmented edition, vol. 1. Uchida Roukakuho, Tokyo;

10 Hu Xiwei. 2006, Plasma theoretical basis. Peking University Press, Beijing (in Chinese) ;

11 Liu Shenggang, Baker R J, Zhu Dajun, et al. 2000,IEEE Transactions on Plasma Science, 28: 2135;

12 Xie Wenkai, Li Xiaoyun, Wang Bing, et al. 2006, High Power Laser and Particle Beams, 18: 235;

13 Bardos L, Barankova H, Lebedev Y A. 2003, Surface and Coatings Technology, 163: 654;

14 Korolev Yury D, Frants Oleg B, Landl Nikolay V, et al.2013, IEEE Transactions on Plasma Science, 41: 2087;

15 Azuma Kingo, Mieda Ryosuke, Yukimura Ken, et al.2011, Surface and Coatings Technology, 206: 938

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