Advanced Search+
RAN Huijuan(冉慧娟), WANG Lei(王磊), WANG Jue(王珏), WANG Tao(王涛), YAN Ping(严萍). Discharge Characteristics of SF6 in a Non-Uniform Electric Field Under Repetitive Nanosecond Pulses[J]. Plasma Science and Technology, 2014, 16(5): 465-470. DOI: 10.1088/1009-0630/16/5/05
Citation: RAN Huijuan(冉慧娟), WANG Lei(王磊), WANG Jue(王珏), WANG Tao(王涛), YAN Ping(严萍). Discharge Characteristics of SF6 in a Non-Uniform Electric Field Under Repetitive Nanosecond Pulses[J]. Plasma Science and Technology, 2014, 16(5): 465-470. DOI: 10.1088/1009-0630/16/5/05

Discharge Characteristics of SF6 in a Non-Uniform Electric Field Under Repetitive Nanosecond Pulses

Funds: supported by the National Basic Research Program of China (973 Program) (No.2011CB209405), National Natural Science Foun- dation of China (No.51207154), and the Opening Project of State Key Laboratory of Electrical Insulation and Power Equipment in Xi’an Jiaotong University of China (No.EIPE12204)
More Information
  • Received Date: November 29, 2012
  • The characteristics of high pressure sulphur hexafluoride (SF 6 ) discharges in a highly non-uniform electric field under repetitive nanosecond pulses are investigated in this paper. The influencing factors on discharge process, such as gas pressure, pulse repetition frequency (PRF), and number of applied pulses, are analyzed. Experimental results show that the corona intensity weakens with the increase of gas pressure and strengthens with the increase of PRF or number of applied pulses. Spark discharge images suggest that a shorter and thicker discharge plasma channel will lead to a larger discharge current. The number of applied pulses to breakdown descends with the increase of PRF and ascends with the rise of gas pressure. The reduced electric field (E/p) decreases with the increase of PRF in all circumstances. The experimental results provide significant supplements to the dielectric characteristics of strongly electronegative gases under repetitive nanosecond pulses.
  • 1. Fletcher R C. 1949, Phys. Rev., 76: 1501.
    2. Chadband W G. 1980, J. Phys. D: Appl. Phys., 13:1299.
    3. Levinson S J and Kunhardt E E. 1982, IEEE Trans.Plasma Sci., 10: 266.
    4. Pillai A S and Hackam R. 1984, J. Appl. Phys., 56:1374.
    5. Zhong H H, Krner H C, Gollor M. 1992, IEEE Trans.Electr. Insul., 27: 496.
    6. Beroual A, Zahn M, Badent A, et al. 1998, IEEE Elec-trical Insulation Magazine, 14: 6.
    7. Felsenthal P and Proud J M. 1965, Phys. Rev., 139:1796.
    8. Martin T H, Guenther A H, and Kristiansen M. 1996,Martin on Pulsed power. Plenum Press, New York.
    9. Neuber A A and Hat.eld L L. 2000,. IEEE. Trans.Plasma Sci., 28: 1593.
    10. Shao T, Tarasenko V F, Zhang C, et al. 2013, J. Appl.Phys., 113: 093301.
    11. Takashima K, Yin Z Y, and Adamovich I V. 2013,Plasma Sources Sci. Technol., 22: 015013.
    12. Shao T, Sun G S, Yan P, et al. 2006, J. Phys. D: Appl.Phys., 39: 2192.
    13. Chang J S, Wang H, Zhang Q G, et al. 2011, Plasma.Sci. Technol., 13: 719.
    14. Baksht E K, Burachenko A G, Erofeev M V, et al..2008, Laser Physics, 18: 732.
    15. Shao T, Zhang C, Jiang H, et al. 2011, IEEE Trans..Plasma Sci., 39: 1881.
    16. Tao F, Zhang Q, Gao B, et al. 2008, Plasma Sci. Tech-nol., 10: 588.
    17. Mesyats G A, Bychkov Y I and Kremnev V V. 1972,.Soviet Phys. Usp., 15: 282.
    18. Kunhardt E E and Byszewski W W. 1980, Phys. Rev.A, 21: 2069.
    19. Babich L P, Loiko T V and Tsukerman V A. 1990,.Soviet Phys. Usp., 33: 521.
    20. Meppelink J, Diederich K, Feser K, et al. 1989, IEEE.Trans. Power Delivery, 4: 223.
    21. Working Group 33. 1988, Very fast transient phenom-ena associated with GIS. CIGRE, Paris, France.
    22. Ran H J, Zhang C, and Wang L, et al. 2012, High. Current Electronics, 10: 112.
    23. Shao T, Zhang C, Long K H,. et. al. 2010,. Chinese.Physics B., 19: 040601.
    24. Pai D Z, Lacoste D A and Laux C O. 2010, Plasma. Sources Sci. Technol., 19: 065015.
  • Related Articles

    [1]Dongxuan ZHANG, Junxian YU, Mengyao LI, Jie PAN, Feng LIU, Zhi FANG. Experimental and numerical investigation on the uniformity of nanosecond pulsed dielectric barrier discharge influenced by pulse parameters[J]. Plasma Science and Technology, 2023, 25(11): 114004. DOI: 10.1088/2058-6272/acd83c
    [2]Minglei SHAN (单鸣雷), Bingyan CHEN (陈秉岩), Cheng YAO (姚澄), Qingbang HAN (韩庆邦), Changping ZHU (朱昌平), Yu YANG (杨雨). Electric characteristic and cavitation bubble dynamics using underwater pulsed discharge[J]. Plasma Science and Technology, 2019, 21(7): 74002-074002. DOI: 10.1088/2058-6272/ab0b62
    [3]Sen WANG (王森), Dezheng YANG (杨德正), Feng LIU (刘峰), Wenchun WANG (王文春), Zhi FANG (方志). Spectroscopic study of bipolar nanosecond pulse gas-liquid discharge in atmospheric argon[J]. Plasma Science and Technology, 2018, 20(7): 75404-075404. DOI: 10.1088/2058-6272/aabac8
    [4]Li ZHANG (张丽), Dezheng YANG (杨德正), Sen WANG (王森), Wenchun WANG (王文春). Spatiotemporal characteristics of nanosecond pulsed discharge in an extremely asymmetric electric field at atmospheric pressure[J]. Plasma Science and Technology, 2017, 19(6): 64006-064006. DOI: 10.1088/2058-6272/aa632d
    [5]TANG Jingfeng (唐井峰), WEI Liqiu (魏立秋), HUO Yuxin (霍玉鑫), SONG Jian (宋健), YU Daren (于达仁), ZHANG Chaohai (张潮海). Effect of Airflows on Repetitive Nanosecond Volume Discharges[J]. Plasma Science and Technology, 2016, 18(3): 273-277. DOI: 10.1088/1009-0630/18/3/10
    [6]GU Jianwei (顾建伟), ZHANG Cheng (章程), WANG Ruixue (王瑞雪), YAN Ping (严萍), SHAO Tao (邵涛). Improvement of Spatial Uniformity of Nanosecond-Pulse Diffuse Discharges in a Multi-Needle-to-Plane Gap[J]. Plasma Science and Technology, 2016, 18(3): 230-235. DOI: 10.1088/1009-0630/18/3/03
    [7]A. K. FEROUANI, M. LEMERINI, L. MERAD, M. HOUALEF. Numerical Modelling Point-to-Plane of Negative Corona Discharge in N2 Under Non-Uniform Electric Field[J]. Plasma Science and Technology, 2015, 17(6): 469-474. DOI: 10.1088/1009-0630/17/6/06
    [8]ZHENG Dianchun(郑殿春), WANG Jia(王佳), CHEN Chuntian(陈春天), ZHAO Dawei(赵大伟), ZHANG Chunxi(张春喜), YANG Jiaxiang(杨嘉祥). Dynamic Characteristics of SF 6 -N 2 -CO 2 Gas Mixtures in DC Discharge Process[J]. Plasma Science and Technology, 2014, 16(9): 848-855. DOI: 10.1088/1009-0630/16/9/08
    [9]LU Na(鲁娜), FENG Yingchun(冯迎春), LI Jie(李杰), SU Yan(宿艳), SHANG Kefeng(商克峰), WU Yan(吴彦). Electrical Characteristics of Pulsed Corona Discharge Plasmas in Chitosan Solution[J]. Plasma Science and Technology, 2014, 16(2): 128-133. DOI: 10.1088/1009-0630/16/2/08
    [10]SONG Huimin(宋慧敏), ZHANG Qiaogen(张乔根), LI Yinghong(李应红), JIA Min(贾敏), WU Yun(吴云), LIANG Hua(梁华). Plasma Sheet Actuator Driven by Repetitive Nanosecond Pulses with a Negative DC Component[J]. Plasma Science and Technology, 2012, 14(4): 327-332. DOI: 10.1088/1009-0630/14/4/11

Catalog

    Article views (196) PDF downloads (2049) Cited by()

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return