Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma

WANG Hongyu (王虹宇); JIANG Wei (姜巍); SUN Peng (孙鹏); ZHAO Shuangyun (赵双云); LI Yang (李阳)

doi:10.1088/1009-0630/18/2/08

Plasma Science and Technology > 2016 > 18(2): 143-146. > DOI: 10.1088/1009-0630/18/2/08

WANG Hongyu (王虹宇), JIANG Wei (姜巍), SUN Peng (孙鹏), ZHAO Shuangyun (赵双云), LI Yang (李阳). Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma[J]. Plasma Science and Technology, 2016, 18(2): 143-146. DOI: 10.1088/1009-0630/18/2/08

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Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma

1School of Physics Science and Technology, Anshan Normal University, Anshan 114005, China 2School of Physics, Huazhong University of Science and Technology, Wuhan 430074, China

Funds: supported by National Natural Science Foundation of China (Nos. 11275007 and 11275039), partly supported by Program for Liaoning Excellent Talents in University of China (LJQ2012098)

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Received Date: April 17, 2015

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Abstract

Abstract

We analyzed perpendicularly configured dual-frequency (DF) capacitively coupled plasmas (CCP). In this configuration, two pairs of electrodes are arranged oppositely, and the discharging is perpendicularly driven by two radio frequency (RF) sources. Particle-in-cell/Monte Carlo (PIC/MC) simulation showed that the con?guration had some advantages as this configu?ration eliminated some dual frequency coupling effects. Some variation and potential application of the discharging con?guration is discussed briefly.
- CCP,
- dual frequency coupling,
- PIC/MC

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References

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