Effects of Oxygen Concentration on Pulsed Dielectric Barrier Discharge in Helium-Oxygen Mixture at Atmospheric Pressure

WANG Xiaolong (王晓龙); TAN Zhenyu (谭震宇); PAN Jie (潘杰); CHEN Xinxian (陈歆羡)

doi:10.1088/1009-0630/18/8/08

Plasma Science and Technology > 2016 > 18(8): 837-843. > DOI: 10.1088/1009-0630/18/8/08

WANG Xiaolong (王晓龙), TAN Zhenyu (谭震宇), PAN Jie (潘杰), CHEN Xinxian (陈歆羡). Effects of Oxygen Concentration on Pulsed Dielectric Barrier Discharge in Helium-Oxygen Mixture at Atmospheric Pressure[J]. Plasma Science and Technology, 2016, 18(8): 837-843. DOI: 10.1088/1009-0630/18/8/08

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Effects of Oxygen Concentration on Pulsed Dielectric Barrier Discharge in Helium-Oxygen Mixture at Atmospheric Pressure

Province Shandong Provincial Key laboratory of UHV Transmission Technology and Equipment, School of Electrical Engineering, Shandong University, Jinan 250061, China

Funds: supported by the Fundamental Research Funds of Shandong University, China (No. 2016JC016)

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Received Date: August 10, 2015

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Abstract

Abstract

In this work the effects of O₂concentration on the pulsed dielectric barrier discharge in helium-oxygen mixture at atmospheric pressure have been numerically researched by using a one-dimensional fiuid model in conjunction with the chosen key species and chemical reactions. The reliability of the used model has been examined by comparing the calculated discharge current with the reported experiments. The present work presents the following significant results. The dominative positive and negative particles are He⁺₂and O⁻₂, respectively, the densities of the reactive oxygen species (ROS) get their maxima nearly at the central position of the gap, and the density of the ground state O is highest in the ROS. The increase of O₂ concentration results in increasingly weak discharge and the time lag of the ignition. For O₂ concentrations below 1.1%, the density of O is much higher than other species, the averaged dissipated power density presents an evident increase for small O₂ concentration and then the increase becomes weak. In particular, the total density of the reactive oxygen species reaches its maximums at the O₂ concentration of about 0.5%. This characteristic further convinces the experimental observation that the O₂ concentration of 0.5% is an optimal O₂/He ratio in the inactivation of bacteria and biomolecules when radiated by using the plasmas produced in a helium oxygen mixture.
- pulsed dielectric barrier discharge,
- cold atmospheric pressure plasmas,
- helium-oxygen mixture,
- numerical simulation

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References

1 Kong M G, Kroesen G, Morˉll G, et al. 2009, New J. Phys., 11: 115012 2 Niemi K, Reuter S, Graham L M, et al. 2010, J. Phys. D: Appl. Phys., 43: 124006 3 He J and Zhang Y T. 2012, Plasma Process. Polym., 9: 919 4 Yang A, Liu D, Rong M, et al. 2014, Phys. Plasmas, 21: 083501 5 Lu X and Laroussi M. 2006, J. Appl. Phys., 100: 063302 6 Laroussi M, Lu X, Kolobov V, et al. 2004, J. Appl. Phys., 96: 3028 7 Lu X and Laroussi M. 2008, Appl. Phys. Lett., 92: 051501 8 Walsh J L, Liu D X, Iza F, et al. 2010, J. Phys. D: Appl. Phys., 43: 032001 9 Lu X, Ye T, Cao Y, et al. 2008, J. Appl. Phys., 104: 053309 10 Nie L L, Tan Z Y, Chen B, et al. 2013, IEEE Trans. Plasma Sci., 41: 1648 11 Wang X L, Tan Z Y, Nie L L, et al. 2014, IEEE Trans. Plasma Sci., 42: 2245 12 Rauf S and Kushner M J. 1999, J. Appl. Phys., 85: 3460 13 Wang Q, Economou D J, Donnelly V M. 2006, J. Appl. Phys., 100: 023301 14 Deloche R, Monchicourt P, Cheret M, et al. 1976, Phys. Rev. A, 13: 1140 15 Golubovskii Y B, Maiorov V A, Behnke J, et al. 2003, J. Phys. D: Appl. Phys., 36: 39 16 Kim S, Lieberman M A, Lichtenberg A J, et al. 2006, J. Vac. Sci. Technol. A, 24: 2025 17 Leveille V and Coulombe S. 2005, Plasma Sources Sci. Technol., 14: 467 18 Gudmundsson J T, Kouznetsov I G, Patel K K, et al. 2001, J. Phys. D: Appl. Phys., 34: 1100 19 Stafford D S and Kushner M J. 2004, J. Appl. Phys., 96: 2451 20 Gordillo-Vazquez F J. 2008, J. Phys. D: Appl. Phys., 41: 234016 21 Hadi-Ziane S, Held B, Pignolet P, et al. 1992, J. Phys. D: Appl. Phys., 25: 677 22 Baulch D L, Cox R A, Crutzen P J, et al. 1982, J. Phys. Chem. Ref. Data, 11: 327 23 Soria C, Pontiga F, Castellanos A. 2004, Plasma Sources Sci. Technol., 13: 95 24 Kulikovsky A A. 1994, J. Phys. D: Appl. Phys., 27: 2556 25 Scharfetter D L and Gummel H K. 1969, IEEE Trans. Electron Dev., 16: 64 26 Shi H, Zhang Y H, Wang D Z. 2008, Phys. Plasmas, 15: 122306 27 Nikandrov D S, Tsendin L D, Kolobov V I, et al. 2008, IEEE Trans. Plasma Sci., 36: 131 28 Oda A, Sakai Y, Akashi H, et al. 1999, J. Phys. D: Appl. Phys., 32 : 2726 29 Nikandrov D S, Arslanbekov R R, Kolobov V I. 2008, IEEE Trans. Plasma Sci., 36 : 932 30 Liu S and Neiger M. 2001, J. Phys. D: Appl. Phys., 34: 1632 31 Laroussi M, Lu X, Kolobov V, et al. 2004, J. Appl. Phys., 96: 3028 32 Lu X and Laroussi M. 2006, J. Phys. D: Appl. Phys., 39: 1127 33 Deng X T, Shi J J and Kong M G. 2007, J. Appl. Phys., 101: 074701 34 Yu H, Perni S, Shi J J, et al. 2006, J. Appl. Microbiology, 101: 1323 35 Lichtenberg A J, Kouznetsov I G, Lee Y T, et al. 1997, Plasma Sources Sci. Technol., 6: 437

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