Citation: | Zahid Iqbal KHATTAK, Abdul Waheed KHAN, Faiq JAN, Muhammad SHAFIQ. Investigation of E–H mode transition in magnetic-pole-enhanced inductively coupled neon–argon mixture plasma[J]. Plasma Science and Technology, 2020, 22(6): 65403-065403. DOI: 10.1088/2058-6272/ab785e |
[1] |
Sharma A et al 2005 Environ. Sci. Technol. 39 339
|
[2] |
Becker K et al 2005 Plasma Phys. Control. Fusion 47 B513
|
[3] |
Herrmann H W et al 1999 Phys. plasmas. 6 2284
|
[4] |
Ricard A, Tetreault J and Hubert J 1991 J. Phys. B Atomic Mol.Opt. Phys. 24 1115
|
[5] |
Callede G et al 1991 J. Phys. D: Appl. Phys. 24 909
|
[6] |
Naveed M et al 2006 Phys. Lett. A
|
[7] |
Sun F S and Sturgeon R E 1999 Spectrochim. Acta B 54 2121
|
[8] |
Bai K H, Chang H Y and Uhm H S 2001 Appl. Phys Lett.79 1596
|
[9] |
Weber L F 2006 IEEE Trans. Plasma Sci. 34 268
|
[10] |
Nakano T and Samukawa S 1999 J. Vac. Sci. Technol. A 17 686
|
[11] |
Muñoz J et al 2018 J. Quant. Spectros. Radiat. Transfer 206 135
|
[12] |
Rehman N U et al 2008 J. Appl. Phys. 104 123304
|
[13] |
Jan F et al 2012 J. Appl. Phys. 112 063305
|
[14] |
Ma J and Pu Y K 2003 Phys. Plasmas 10 4118
|
[15] |
Lieberman M A and Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing (New York: Wiley)
|
[16] |
Chen F F and Chang J P 2012 Lecture Notes on Principles of Plasma Processing (New York: Springer)
|
[17] |
Meziani T, Colpo P and Rossi F 2006 J. Appl. Phys. 99 033303
|
[18] |
Kortshagen U, Gibson N D and Lawler J E 1996 J. Phys. D:Appl. Phys. 29 1224
|
[19] |
Seo S H et al 1999 Phys. Plasmas 6 614
|
[20] |
Lee M H et al 2007 Appl. Phys. Lett. 90 191502
|
[21] |
Lee Y W, Lee H L and Chung T H 2011 J. Appl. Phys. 109 113302
|
[22] |
Lee H C 2018 Appl. Phys. Rev. 5 011108
|
[23] |
Gao F et al 2010 Phys. Plasmas 17 103507
|
[24] |
Jing Xu et al 2015 Chin. Phys. B 24 115201
|
[25] |
Liu W et al 2013 Phys. Plasmas 20 123513
|
[26] |
Gao F et al 2013 Chin. Phys. B 22 115205
|
[27] |
Gao F et al 2012 Chin. Phys. B 21 075203
|
[28] |
Lee J K, Lee H C and Chung C W 2011 Curr. Appl. Phys.11 S149
|
[29] |
Seo S H, Chung C and Chang H Y 2000 Surf. Coat. Technol.131 1
|
[30] |
Guerra V, Galiaskarov E and Loureiro J 2003 Chem. Phys.Lett. 371 576
|
[31] |
Bang J Y et al 2012 Appl. Phys. Lett. 100 164107
|
[32] |
Han D et al 2015 Curr. Appl. Phys. 15 1036
|
[33] |
Khattak Z I, Shafiq M and Khan A W 2019 IEEE Trans.Plasma Sci. 47 2665
|
[34] |
Lee M H, Jang S H and Chung C W 2007 J. Appl. Phys. 101 033305
|
[35] |
Godyak V A and Demidov V I 2011 J. Phys. D: Appl. Phys. 44 233001
|
[36] |
Raju G G 2005 Gaseous Electronics: Theory and Practice (Boca Raton, FL: CRC Press)
|
[37] |
Younus M and Rehman N U 2017 Optik 130 877
|
[38] |
Pu Y K et al 2005 Plasma Phys. Control. Fusion 48 61
|
[39] |
Lee H C, Lee M H and Chung C W 2010 Appl. Phys. Lett. 96 041503
|
[40] |
Lee H C and Chung C W 2012 Phys. Plasmas 19 043505
|
[41] |
Chung C and Chang H Y 2002 Appl. Phys. Lett. 80 1725
|
[1] | Ronggang WANG (王荣刚), Ben LI (李犇), Tongkai ZHANG (张桐恺), Jiting OUYANG (欧阳吉庭), Yurong SUN (孙玉荣). The influence of defects in a plasma photonic crystal on the characteristics of microwave transmittance[J]. Plasma Science and Technology, 2020, 22(8): 85002-085002. DOI: 10.1088/2058-6272/ab777b |
[2] | Simin ZHOU (周思敏), Xiutao HUANG (黄修涛), Minghai LIU (刘明海). Electrical model and experimental analysis of a double spiral structure surface dielectric barrier discharge[J]. Plasma Science and Technology, 2019, 21(6): 65401-065401. DOI: 10.1088/2058-6272/ab0814 |
[3] | Hua LI (李花), Zhengduo WANG (王正铎), Lizhen YANG (杨丽珍), Qiang CHEN (陈强). Insight into the remaining high surface energy of atmospheric DBD plasma-treated polyethylene web after three months’ aging[J]. Plasma Science and Technology, 2019, 21(1): 15504-015504. DOI: 10.1088/2058-6272/aae2ad |
[4] | Ying CAO (曹颖), Jie LI (李杰), Nan JIANG (姜楠), Yan WU (吴彦), Kefeng SHANG (商克峰), Na LU (鲁娜). The structure optimization of gas-phase surface discharge and its application for dye degradation[J]. Plasma Science and Technology, 2018, 20(5): 54018-054018. DOI: 10.1088/2058-6272/aaa3d5 |
[5] | ZHANG Xiujie (张秀杰), PAN Chuanjie (潘传杰), XU Zengyu (许增裕). MHD Stability Analysis and Flow Controls of Liquid Metal Free Surface Film Flows as Fusion Reactor PFCs[J]. Plasma Science and Technology, 2016, 18(12): 1204-1214. DOI: 10.1088/1009-0630/18/12/11 |
[6] | JIN Yizhou (金逸舟), YANG Juan (杨涓), TANG Mingjie (汤明杰), LUO Litao (罗立涛), FENG Bingbing (冯冰冰). Diagnosing the Fine Structure of Electron Energy Within the ECRIT Ion Source[J]. Plasma Science and Technology, 2016, 18(7): 744-750. DOI: 10.1088/1009-0630/18/7/08 |
[7] | WAN Gang (弯港), JIN Yong (金涌), LI Haiyuan (李海元), LI Baoming (栗保明). Study on Free Surface and Channel Flow Induced by Low-Temperature Plasma via Lattice Boltzmann Method[J]. Plasma Science and Technology, 2016, 18(3): 331-336. DOI: 10.1088/1009-0630/18/3/19 |
[8] | SONG Yushou(宋玉收), YAN Qiang(颜强), JING Tian(井田), XI Yinyin(席印印), LIU Huilan(刘辉兰). The Distortion of Energy Deposit Distribution of 12C Ions in Water[J]. Plasma Science and Technology, 2012, 14(7): 665-669. DOI: 10.1088/1009-0630/14/7/22 |
[9] | JIAO Changfeng (焦长峰), XU Furong (许甫荣), SUN Yang (孙扬). Angular Momentum Projected Potential-energy-surface Calculation: Application to 178Hf[J]. Plasma Science and Technology, 2012, 14(6): 514-517. DOI: 10.1088/1009-0630/14/6/17 |
[10] | LIU Xuelan (刘雪兰), XU An (许安), DAI Yin (戴银), YUAN Hang (袁航), YU Zengliang (余增亮). Surface Etching and DNA Damage Induced by Low-Energy Ion Irradiation in Yeast[J]. Plasma Science and Technology, 2011, 13(3): 381-384. |