| Citation: |
Liang LIAO, Yunfeng LIANG, Shaocheng LIU, Huaxiang ZHANG, Xiang JI, Youwen SUN, Wenyin WEI, Huihui WANG, Jinping QIAN, Liang WANG, Manni JIA, Long ZENG, Xiang GAO, the EAST Team. Physical design of a new set of high poloidal mode number coils in the EAST tokamak[J]. Plasma Science and Technology, 2022, 24(3): 035106. DOI: 10.1088/2058-6272/ac4b32
|
An external resonant magnetic perturbation (RMP) field, which is an effective method to mitigate or suppress the edge localized mode (ELM), has been planned to be applied on the ELM control issue in ITER. A new set of magnetic perturbation coils, named as high m coils, has been developed for the EAST tokamak. The magnetic perturbation field of the high m coils is localized in the midplane of the low field side, with the spectral characteristic of high m and wide n, where m and n are the poloidal and toroidal mode numbers, respectively. The high m coils generate a strong localized perturbation field. Edge magnetic topology under the application of high m coils should have either a small or no stochastic region. With the combination of the high m coils and the current RMP coils in the EAST, flexible working scenarios of the magnetic perturbation field are available, which is beneficial for ELM control exploration on EAST. Numerical simulations have been carried out to characterize the high m coil system, including the magnetic spectrum and magnetic topology, which shows a great flexibility of magnetic perturbation variation as a tool to investigate the interaction between ELM and external magnetic perturbation.
Radio-frequency capacitively coupled plasma sources (RF-CCPs) are widely utilized in the microelectronics industry [1, 2]. Two plate electrodes are usually utilized in typical RF-CCPs, and the electron density is often lower than 1015 m−3. Hence the etching and deposition rates are very low [3–5]. Raising the driving frequency [2, 6] or utilizing the magnetic field [7–10] can increase the electron density. However, the standing wave effect [11–14] and the skin effect [15, 16] may appear with a high driving frequency, and plasma non-uniformity occurs, which is not conducive to large-area plasma treatment. However, the standing wave effect and skin effect will not appear with a low driving frequency. Therefore, it is preferable for the microelectronics industry if plasma with high density can be obtained at a low driving frequency.
In addition to parallel-plate electrodes [17–19], hollow electrodes [20–25] are also frequently applied in RF and direct current (DC) discharges. With a hollow electrode, RF-CCPs can produce higher plasma density outside the cavity when a low frequency is utilized, which implies that plasma density enhancement effect exists in RF discharges with hollow electrodes [20–22, 26–28]. Moreover, utilizing hollow electrodes with different shapes, uniform plasma density can be obtained and the film deposition quality can be improved [29–31].
Due to the cavity structures, electrons are confined inside the hollow electrode [32] and oscillate between the side walls, forming the hollow cathode effect (HCE) [25, 33, 34]. Via the HCE, inelastic collisions increase [33], which cause higher ionization and plasma density inside the cavity [3, 4, 26]. Electron density up to (2–3)×1017 m−3 was obtained with a ring-shaped hollow electrode, which is ten times that of the density when parallel-plate electrodes are utilized [3]. In addition, RF-CCPs with multi-hole electrodes were also reported to enhance thin-film deposition rates [35] and increase the electron density [26, 36, 37] over large pressure ranges.
Although previous investigations have shown that RF-CCPs with hollow electrodes can enhance the electron density outside the cavity, the mechanism of density enhancement is still unclear. Previous studies have also found that discharge conditions affect the magnitude of electron density outside the cavity [21, 28, 38, 39]. For instance, electron density outside the cavity can be influenced by the pressure, magnetic field and electrode gap [28, 38, 40]. Furthermore, the shape, depth and diameter of the hollow electrode can also affect the magnitude of electron density outside the cavity [22, 26, 36]. However, the effect of these factors on the magnitude of electron density outside the cavity is not clear, which is important for the design of hollow electrodes and the modification of discharge conditions to improve plasma properties. In addition, in experimental studies, researchers often determine the strength of the HCE based on the magnitude of electron density outside the cavity [20, 21, 36], and they consider that the higher the electron density outside the cavity, the stronger the HCE inside the cavity. Hence, further investigation is needed to ascertain whether the above method to determine the HCE strength is suitable.
The purpose of this study is to investigate the plasma density enhancement mechanism and influence factors of the plasma density enhancement magnitude in RF-CCPs with hollow electrodes. This article is elaborated in the following sequence. The 2D PIC/MCC simulation is described in section 2. The results are shown in section 3. Section 4 provides a summary.
The reactor geometry studied here can be found in figure 1 of our previous work [41]. An RF source and a DC bias voltage VDC = −30 V are both applied on the hollow electrode, and the frequency of the RF source is 13.56 MHz, while radii r of the powered hollow electrode and the grounded plate electrode are both 1.6 cm. The distance d between the two electrodes is set to be 1 cm. The pressure p of the working gas argon is 1 Torr. A cylindrical coordinate is adopted for the axis-symmetric discharge device, and the simulation area is that enclosed by the red dashed line. The origin of the coordinates (Z = 0 cm, R = 0 cm) is located at the center of the orifice, with Z > 0 cm and Z < 0 cm denoting the axial positions inside and outside the hollow electrode, respectively.
An electrostatic 2D PIC-MCC code (the XOOPIC code) is adopted in this study [42–45]. A detailed model description is included in our previous study [40]. Therefore, only a brief description of this model is included here. The initial temperatures of electrons and argon ions are 2 eV and 0.04 eV, with the same density. The temperature of the working gas argon is also set to be 0.04 eV, with an invariant density. The time step of electrons is set to be 3×10−13 s, and the time step of ions is set to be 3×10−12 s. The spatial grids are set at 256 (R)×192 (Z).
In RF-CCPs with hollow electrodes, the ionization degree is low and collisions occur mainly between neutral and charged particles. Collisions between electrons and neutral particles are elastic, excitation and ionization collisions, and the collision cross-sections are taken from [46]. Charge-exchange collisions and elastic collisions are considered between ions and neutral particles, and the collision cross-sections are cited from [47]. The same collision types were considered in other RF hollow electrode discharges [33, 48–50].
Figure 1 depicts the electron density profiles with different cavity depths h of 0–1.5 cm when the sheath inside the hole is fully collapsed or expanded, with the cavity diameter D = 1 cm, RF voltage amplitude V0 = 210 V and secondary electron emission coefficient γAr+ = 0.1. As can be seen from figure 1, with h = 0.5–1.5 cm, an electron density peak exists at the Z axis inside the cavity, manifesting the existence of the HCE in the cavity [49]. Due to the HCE, with h = 0.5–1.5 cm, the electron density inside the cavity is higher than that with the parallel-plate configuration (h = 0 cm). To do a comparison, two vertical dashed lines are presented at the hollow electrode sheath fully collapsed and expanded phases of each cavity depth. As shown in figure 1, with different cavity depths of h = 0.2–1.5 cm, when the sheath inside the hole expands, electrons inside the hole move towards the grounded electrode, causing a decrease in the volume of electrons inside the hole.
Time-averaged electron density profiles along the Z axis with different h are shown in figure 2(a). As can be seen from figure 2(a), from inside to outside the hole, the electron density increases with the depth of the cavity, and the electron density outside the cavity is higher than that with the parallel-plate electrodes (h = 0 cm). Figure 2(b) shows the time-averaged radial sheath thickness along the side wall of the hollow electrode at different cavity depths h of 0.5–1.5 cm. The radial sheath thickness is the width between the radial sheath edge and the side wall of the hollow electrode, while the position of the radial sheath edge is obtained by finding where ∂2φ/∂R2 becomes zero for the first time (here φ is the potential) [33]. As can be seen from figure 2(b), from the orifice to the cavity bottom, the radial sheath thickness at the side wall increases, which means that the sheath at the side wall of the hollow electrode is tilted. Figure 2(c) shows the variation of the time-averaged radial plasma bulk width at the orifice with the cavity depth h, while the radial plasma bulk width is equal to the value of the cavity diameter D subtract twice the radial sheath thickness. As shown in figure 2(c), with the cavity depth h increasing from 0.5 to 1.5 cm, the radial width of bulk plasma at the orifice increases.
Figure 3 shows the electron density profiles with different RF voltages V0 of 150–210 V when the sheath inside the hole is fully collapsed or expanded, with the cavity diameter D = 1 cm, cavity depth h = 1.5 cm and γAr+ = 0.1. With different V0 of 150–210 V, an electron density peak exists at the Z axis inside the hole, manifesting the existence of the HCE in the hole. Due to the HCE, with V0 of 150–210 V, the electron density inside the cavity is higher than that with the parallel-plate configuration with V0 = 210 V (h = 0 cm). However, with V0 = 150 V, in the yellow dashed rectangular area, the electron density is lower than the initial electron density, which implies that discharges can only occur in the area between the hollow electrode hole and the grounded electrode when V0 is low and d is narrow. As also shown in figure 3, with different V0, when the sheath inside the hole expands, electrons inside the hole move towards the grounded electrode, causing a decrease in the volume of electrons inside the hole.
Time-averaged electron density profiles along the Z axis with different V0 are shown in figure 4(a). As can be seen from figure 4(a), from inside to outside the hole, the electron density increases with the RF voltage V0. Figure 4(b) shows the variation of the time-averaged radial plasma bulk width at the orifice with the RF voltage V0. The curve in figure 4(b) shows that the time-averaged radial plasma bulk width at the orifice increases with the RF voltage V0.
Figure 5 shows the electron density profiles with different D of 0–2 cm when the sheath inside the hole is fully collapsed or expanded, with the cavity depth h = 1.5 cm, RF voltage V0 = 210 V and γAr+ = 0.1. With the small cavity diameter D = 0.4 cm, even the sheath inside the hole is fully collapsed, there is no plasma inside the hole, and the electron density outside the hole is almost equal to that with the parallel-plate configuration (D = 0 cm). With D = 0.7 cm, an electron density peak with density up to 2.6×1016 m−3 exists at the Z axis inside the cavity, and the peak value is higher than that with D = 1–2 cm. The results indicate that the strongest HCE is obtained with D = 0.7 cm. With D increasing from 0.7 to 2 cm, the density of electrons inside the hole reduces, which means that the HCE intensity inside the cavity is gradually attenuated.
Time-averaged electron density profiles along the Z axis with different D are shown in figure 6(a). As can be seen from figure 6(a), at different axial positions, the electron density ne outside the cavity with D = 0.7–2 cm is higher than that with the parallel-plate configuration (D = 0 cm). However, with D = 0.7 cm, the electron density decreases dramatically along the Z axis, and after Z < −0.28 cm, the electron density with D = 0.7 cm is lower than that with D = 1–2 cm. Furthermore, it can be seen from figure 6(b) that the radial width of bulk plasma at the orifice with D = 0.7 cm is smaller than that with D = 1–2 cm.
Figure 7 shows the electron density profiles with different secondary electron emission coefficients γAr+ when the sheath inside the hole is fully collapsed or expanded, with the cavity diameter D = 1 cm, cavity depth h = 0.5 cm and RF voltage V0 = 210 V. As can be seen from figure 7, with different γAr+ of 0–0.2, an electron density peak exists at the Z axis inside the hole, manifesting the existence of the HCE in the hole, and the electron density inside the hole increases with γAr+. However, with γAr+ = 0.2, despite the sheath inside the hole is fully expanded, the electron density peak is located completely inside the cavity.
Time-averaged electron density profiles along the Z axis with different γAr+ are shown in figure 8(a), and the electron density with the parallel-plate configuration (h = 0 cm) with γAr+ = 0.1 is also shown for comparison. With γAr+ = 0.2, from inside to outside the cavity, the electron density decreases dramatically. Once Z < −0.15 cm, the electron density with γAr+ = 0.2 is lower than that with γAr+ = 0 and 0.1, and once Z < −0.3 cm, the electron density with γAr+ = 0.2 is almost equal to that with the parallel-plate configuration with γAr+ = 0.1. With γAr+ increasing from 0 to 0.2, the time-averaged radial width of bulk plasma at the orifice increases, as shown in figure 8(b).
The radial profiles of the time-averaged electron density ne with different h are shown in figure 9, and the parameters are the same as those used in section 3.1.1. As can be seen from figure 9, at different axial positions of Z = −0.3, −0.45 and −0.6 cm outside the cavity, the radial distributions of the electron density are not uniform, presenting a mountain-like distribution, with the electron density peak at the Z axis. In addition, the closer to the orifice, the higher the electron density outside the hole, and the worse the plasma uniformity. At different axial positions outside the cavity, with h = 0.2–1.5 cm, the electron density increases with the cavity depth h. However, with h increasing from 1.5 to 3 cm, the electron density decreases. Although the plasma uniformity needs to be improved, the maximum electron density can always be obtained outside the cavity with h = 1.5 cm. Therefore, with the parameter settings shown in section 3.1.1, the optimum cavity depth for the plasma density enhancement is h =1.5 cm.
Figure 10 shows the radial profiles of the time-averaged electron density ne with different D, and the other parameters are the same as those shown in section 3.1.3. It can be seen from figure 10 that the radial distributions of the electron density with different cavity diameters are not uniform, with electron density peaks at the Z axis. With different cavity diameters, the closer to the orifice, the higher the electron density outside the cavity. At axial positions Z = −0.3 and −0.45 cm, the electron density at the Z axis has the maximum value with D = 1 cm. However, at Z = −0.6 cm, the electron density at the Z axis has the maximum value with D = 1.5 cm. With the cavity diameter D increasing from 1 to 2 cm, the plasma uniformity is gradually improved.
As shown in figures 6(a) and 10, if Z > −0.5 cm, the maximum electron density outside the cavity is obtained with D = 1 cm, and high electron density plays a crucial role in the enhancement of the plasma etching rate. Therefore, if other parameters remain constant, as shown in sections 3.1.1 and 3.1.3, at Z > −0.5 cm, the optimum cavity depth and diameter for the plasma density enhancement are h = 1.5 cm and D = 1 cm, respectively, while the plasma uniformity can be improved by utilizing a multi-ring electrode [51].
According to the above simulation results, the enhancement mechanism of plasma density and influence factors of the plasma density enhancement magnitude outside hollow electrodes are analyzed.
The variations of the electron density with h and V0 are analyzed as follows. With different cavity depths h or RF voltages V0, an electron density peak exists at the orifice (see figures 1 and 3), which is generated via the HCE and contains numerous energetic electrons [4, 51]. When the sheath inside the hole expands, some energetic electrons in the electron density peak are pushed out of the cavity by the tilted sheath at the side wall and the expanding sheath at the cavity bottom [4, 51]. The electrons with high energy pushed out of the hole will cause high ionization and hence enhanced plasma density outside the hole [4, 51]. The electron energy distribution function (EEDF) at the orifice region and at the central region of two electrodes at ωt/2π = 0.41 is shown in figure 11, with V0 = 210 V, D = 1 cm, h = 1.5 cm and γAr+ = 0.1. Phase ωt/2π = 0.41 is close to phase ωt/2π = 0.5 when the sheath inside the hole is completely expanded. The EEDF is obtained by calculating the electron energy in a local area over 20 RF cycles after the discharge is stable. As shown in figure 11, at the orifice region, the probability of electrons with energy exceeding 15.76 eV (the first ionization energy of argon atom) is much higher than that at the central region of the two electrodes, which indicates that more energetic electrons are generated at the orifice region via the HCE.
In addition, with the cavity depth or the RF voltage increasing, both the radial plasma bulk width and the electron density at the orifice increase, and the electron density at the orifice with the cavity depth h = 1.5 cm or the RF voltage V0 = 210 V even reaches 1.3×1016 cm−3. This indicates that more energetic electrons can be pushed out of the hole through the expanding sheath of the hollow electrode and cause higher plasma density outside the hole. Therefore, with the depth of the hole or the RF voltage increasing, the electron density outside the hole also increases.
Since D varies from 0.4 to 2 cm, with D = 0.7 cm, the electron density has the maximum value at the orifice. However, outside the cavity, the electron density with D = 0.7 cm is lower than that with D = 1–2 cm after a certain axial distance from the orifice (see figure 6(a)). The reason is analyzed as follows. With D = 0.7 cm, the HCE in the cavity is the strongest and the electron density at the orifice is the highest (see figure 5). Hence, in the same orifice region, the probability of electrons with energy exceeding 15.76 eV has the maximum value with D = 0.7 cm, as shown in figure 12, and some electrons even reach an energy of 30 eV. High-energy electrons pushed out of the hole with the highest density cause the maximum electron density near the orifice. However, due to the minimum radial plasma bulk width with D = 0.7 cm (compared with D = 1–2 cm), the number of high-energy electrons pushed out of the hole is also the smallest, resulting in the sharp decrease in the plasma density along the axial distance. The results above also indicate that it is not suitable to determine the strength of the HCE through the magnitude of the electron density outside hollow electrodes.
Electron density profiles at shallow h or small D are analyzed as follows. With the shallow cavity depth h = 0.2 cm, a small amount of plasma exists inside the hole when the sheath inside the hole is completely collapsed (see figure 1). Bulk plasma electrons inside the hole gain high energy via repeated interactions with the expanding side wall sheath [51] and are all pushed out of the hole by the expanding sheath of the hollow electrode (see figure 1), hence the plasma density outside the hole is enhanced slightly (see figure 2(a)). However, with the small cavity diameter D = 0.4 cm, there is no plasma inside the cavity even at the hollow electrode sheath fully collapsed phase (see figure 5), hence the electron density outside the cavity is not enhanced (see figure 6(a)). Therefore, an essential condition for the plasma density enhancement outside the hole is that plasma exists inside the hole when the sheath inside the hole is fully collapsed.
The variations of the electron density with γAr+ are analyzed as follows. With γAr+ = 0.2, even the sheath inside the hole is fully expanded, and the electron density peak is completely located inside the cavity (see figure 7), which means that energetic electrons in the electron density peak can hardly be pushed out of the hole when the sheath inside the hole expands. Therefore, with γAr+ = 0.2, although the highest electron density is inside the cavity and the largest radial width of bulk plasma at the orifice (see figures 8(a) and (b)), the electron density outside the hole still decreases sharply with the axial distance (see figure 8(a)). However, due to the largest secondary electron emission coefficient, more secondary electrons will be emitted from the plane part of the hollow electrode. Therefore, compared with that of γAr+ = 0 and 0.1, the electron density has the maximum value above the plane part of the hollow electrode with γAr+ = 0.2 (see figure 7). To further illustrate the importance of the existence of the electron density peak at the orifice for the plasma density enhancement outside hollow electrodes, the EEDF at the orifice region with γAr+ = 0.1 and 0.2 at ωt/2π = 0.41 is presented in figure 13. Since the electron density peak generated via the HCE is not located at the orifice with γAr+ = 0.2, there are few energetic electrons with energy exceeding 15.76 eV located at the orifice region at ωt/2π = 0.41. However, with γAr+ = 0.1, an electron density peak exists at the orifice. Hence more energetic electrons with energy exceeding 15.76 eV are located at the orifice region. When the sheath inside the hole expands, more electrons with high energy are pushed out of the hole and cause higher ionization and plasma density. Therefore, the electron density with γAr+ = 0.1 is higher than that with γAr+ = 0.2 outside the cavity (see figure 8(a)).
Through investigation into the electron density distributions inside and outside the hollow electrode hole with different hole depths, voltages, cavity diameters and γAr+, it is found that an electron density peak exists at the orifice generated via the HCE, which plays an important role in the density enhancement outside hollow electrodes.
The plasma density enhancement mechanism and influence factors of the density enhancement magnitude in RF-CCPs with hollow electrodes are investigated via a 2D PIC/MCC model. Results show that plasma exists inside the cavity when the sheath inside the hole is fully collapsed, which is an essential condition for the plasma density enhancement outside hollow electrodes. In addition, an electron density peak exists at the orifice generated via the HCE, which also plays a crucial role in the density enhancement. It is also found that the radial width of bulk plasma at the orifice significantly affects the plasma density enhancement magnitude outside hollow electrodes. If the radial width of bulk plasma at the orifice is the narrowest, even though the HCE is the strongest and the electron density at the orifice is the highest, the plasma density outside the cavity may also be low. Therefore, it is not suitable to determine the HCE strength through the magnitude of the electron density outside the hollow electrode hole. Higher electron density at the orifice, combined with larger radial plasma bulk width at the orifice, helps to obtain higher density enhancement magnitude outside hollow electrodes.
This work was supported by National Magnetic Confined Fusion Energy R&D Program of China (Nos. 2017YFE0301100, 2019YFE03040000 and 2017YFE0301300), National Natural Science Foundation of China (No. 11875294), the Science Foundation of Institute of Plasma Physics, Chinese Academy of Sciences (No. DSJJ-2021-01) and the Collaborative Innovation Program of Hefei Science Center, CAS (No. 2021HSC-CIP019).
| [1] |
Wagner F et al 1982 Phys. Rev. Lett. 49 1408 doi: 10.1103/PhysRevLett.49.1408
|
| [2] |
Wagner F 2007 Plasma Phys. Control. Fusion 49 B1 doi: 10.1088/0741-3335/49/12B/S01
|
| [3] |
Keilhacker M et al 1984 Plasma Phys. Control. Fusion 26 49 doi: 10.1088/0741-3335/26/1A/305
|
| [4] |
Evans T E 2013 J. Nucl. Mater. 438 S11 doi: 10.1016/j.jnucmat.2013.01.283
|
| [5] |
Zatz I J et al 2011 Fusion Eng. Des. 86 1980 doi: 10.1016/j.fusengdes.2011.03.088
|
| [6] |
Evans T E et al 2005 Phys. Rev. Lett. 337-339 691
|
| [7] |
Liang Y et al 2007 Phys. Rev. Lett. 98 265004 doi: 10.1103/PhysRevLett.98.265004
|
| [8] |
Suttrop W et al 2011 Phys. Rev. Lett. 106 225004 doi: 10.1103/PhysRevLett.106.225004
|
| [9] |
Jeon Y M et al 2012 Phys. Rev. Lett. 109 035004 doi: 10.1103/PhysRevLett.109.035004
|
| [10] |
Sun Y J et al 2021 Nucl. Fusion 61 106037 doi: 10.1088/1741-4326/ac1a1d
|
| [11] |
Kirk A et al 2013 Plasma Phys. Control. Fusion 55 124003 doi: 10.1088/0741-3335/55/12/124003
|
| [12] |
Evans T E et al 2008 Nucl. Fusion 48 024002 doi: 10.1088/0029-5515/48/2/024002
|
| [13] |
Sun Y W et al 2017 Nucl. Fusion 57 036007 doi: 10.1088/1741-4326/57/3/036007
|
| [14] |
Sun Y W et al 2016 Phys. Rev. Lett. 117 115001 doi: 10.1103/PhysRevLett.117.115001
|
| [15] |
Hender T C et al 1992 Nucl. Fusion 32 2091 doi: 10.1088/0029-5515/32/12/I02
|
| [16] |
Mordijck S et al 2012 Phys. Plasma 19 056503 doi: 10.1063/1.4718316
|
| [17] |
Wang S X et al 2018 Nucl. Fusion 58 112013 doi: 10.1088/1741-4326/aae15a
|
| [18] |
Gu S et al 2019 Nucl. Fusion 59 026012 doi: 10.1088/1741-4326/aaf5a3
|
| [19] |
Boom J E et al 2011 Nucl. Fusion 51 103039 doi: 10.1088/0029-5515/51/10/103039
|
| [20] |
Yun G S et al 2011 Phys. Rev. Lett. 107 045004 doi: 10.1103/PhysRevLett.107.045004
|
| [21] |
Osborne T H et al 2008 J. Phys. Conf. Ser. 123 012014 doi: 10.1088/1742-6596/123/1/012014
|
| [22] |
Snyder P B et al 2002 Phys. Plasmas 9 2037 doi: 10.1063/1.1449463
|
| [23] |
Liang Y F et al 2013 Phys. Rev. Lett. 110 235002 doi: 10.1103/PhysRevLett.110.235002
|
| [24] |
Dong L K et al 2020 Plasma Sci. Technol. 22 115101 doi: 10.1088/2058-6272/aba3bd
|
| [25] |
Denner P et al 2012 Nucl. Fusion 52 054007 doi: 10.1088/0029-5515/52/5/054007
|
| [26] |
Hawryluk R J et al 2009 Nucl. Fusion 49 065012 doi: 10.1088/0029-5515/49/6/065012
|
| [27] |
In Y et al 2017 Nucl. Fusion 57 116054 doi: 10.1088/1741-4326/aa791c
|
| [28] |
Kim J et al 2012 Nucl. Fusion 52 114011 doi: 10.1088/0029-5515/52/11/114011
|
| [29] |
In Y et al 2019 Nucl. Fusion 59 126045 doi: 10.1088/1741-4326/ab4631
|
| [1] | Chunxia LIANG (梁春霞), Ning WANG (王宁), Zhengchao DUAN (段正超), Feng HE (何锋), Jiting OUYANG (欧阳吉庭). Experimental investigations of enhanced glow based on a pulsed hollow-cathode discharge[J]. Plasma Science and Technology, 2019, 21(2): 25401-025401. DOI: 10.1088/2058-6272/aaef49 |
| [2] | Shoujie HE (何寿杰), Peng WANG (王鹏), Jing HA (哈静), Baoming ZHANG (张宝铭), Zhao ZHANG (张钊), Qing LI (李庆). Effects of discharge parameters on the micro-hollow cathode sustained glow discharge[J]. Plasma Science and Technology, 2018, 20(5): 54006-054006. DOI: 10.1088/2058-6272/aab54b |
| [3] | Mingming SUN (孙明明), Tianping ZHANG (张天平), Xiaodong WEN (温晓东), Weilong GUO (郭伟龙), Jiayao SONG (宋嘉尧). Plasma characteristics in the discharge region of a 20A emission current hollow cathode[J]. Plasma Science and Technology, 2018, 20(2): 25503-025503. DOI: 10.1088/2058-6272/aa8edb |
| [4] | Zun ZHANG (张尊), Kan XIE (谢侃), Jiting OUYANG (欧阳吉庭), Ning GUO (郭宁), Yu QIN (秦宇), Qimeng XIA (夏启蒙), Song BAI (白松), Xianming WU (吴先明), Zengjie GU (谷增杰). Steady and oscillatory plasma properties in the near-field plume of a hollow cathode[J]. Plasma Science and Technology, 2018, 20(2): 24010-024010. DOI: 10.1088/2058-6272/aa9d7d |
| [5] | JIANG Kai (蒋锴), WANG Xianrong (王先荣), QIN Xiaogang (秦晓刚), YANG Shengsheng (杨生胜), YANG Wei (杨威), ZHAO Chengxuan (赵, 呈()选 ), CHEN Yifeng (陈益峰), SHI Liang (史亮), TANG Daotan (汤道坦), XIE Kan (谢侃). Surface Charging Controlling of the Chinese Space Station with Hollow Cathode Plasma Contactor[J]. Plasma Science and Technology, 2016, 18(7): 727-731. DOI: 10.1088/1009-0630/18/7/05 |
| [6] | HAN Qing (韩卿), WANG Jing (王敬), ZHANG Lianzhu (张连珠). PIC/MCC Simulation of Radio Frequency Hollow Cathode Discharge in Nitrogen[J]. Plasma Science and Technology, 2016, 18(1): 72-78. DOI: 10.1088/1009-0630/18/1/13 |
| [7] | ZHAO Guoming(赵国明), SUN Qian(孙倩), ZHAO Shuxia(赵书霞), GAO Shuxia(高书侠), ZHANG Lianzhu(张连珠). The Effect of Gas Flow Rate on Radio-Frequency Hollow Cathode Discharge Characteristics[J]. Plasma Science and Technology, 2014, 16(7): 669-676. DOI: 10.1088/1009-0630/16/7/07 |
| [8] | LI Shichao(李世超), HE Feng(何锋), GUO Qi(郭琦), OUYANG Jiting(欧阳吉庭). Deposition of Diamond-Like Carbon on Inner Surface by Hollow Cathode Discharge[J]. Plasma Science and Technology, 2014, 16(1): 63-67. DOI: 10.1088/1009-0630/16/1/14 |
| [9] | ZHAO Xiaoling(赵小令), CHEN Shixiu(陈仕修), CHEN Kun(陈堃), CHEN Bokai(陈柏恺). Best Magnetic Condition to Generate Hollow Cathode Glow Plasma in High Vacuum[J]. Plasma Science and Technology, 2014, 16(1): 21-25. DOI: 10.1088/1009-0630/16/1/05 |
| [10] | HE Feng (何锋), HE Shoujie (何寿杰), ZHAO Xiaofei (赵晓菲), GUO Bingang (郭滨刚), OUYANG Jiting (欧阳吉庭). Study of the Discharge Mode in Micro-Hollow Cathode[J]. Plasma Science and Technology, 2012, 14(12): 1079-1083. DOI: 10.1088/1009-0630/14/12/08 |
Figures(7)
Supported by: Beijing Renhe Information Technology Co., Ltd. 
DownLoad:
