Comparative study on the degradation of phenol by a high-voltage pulsed discharge above a liquid surface and under a liquid surface

Quanfa ZHAO; Haixia WU; Wang SHEN; Xiao HAN; Bin ZHENG; Jiawei FAN

doi:10.1088/2058-6272/accf66

Plasma Science and Technology > 2023 > 25(10): 104002. > DOI: 10.1088/2058-6272/accf66

Quanfa ZHAO, Haixia WU, Wang SHEN, Xiao HAN, Bin ZHENG, Jiawei FAN. Comparative study on the degradation of phenol by a high-voltage pulsed discharge above a liquid surface and under a liquid surface[J]. Plasma Science and Technology, 2023, 25(10): 104002. DOI: 10.1088/2058-6272/accf66

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Comparative study on the degradation of phenol by a high-voltage pulsed discharge above a liquid surface and under a liquid surface

1.
College of Urban Construction, Nanjing Tech University, Nanjing 211816, People's Republic of China
2.
College of Environment and Ecology, Chongqing University, Chongqing 400044, People's Republic of China

More Information

Corresponding author:
Haixia WU, E-mail: wuhaixia@njtech.edu.cn
Received Date: January 10, 2023
Revised Date: March 29, 2023
Accepted Date: April 19, 2023
Available Online: December 05, 2023
Published Date: June 26, 2023

Graphical Abstract

Abstract

Abstract

The degradation of phenol by pulsed discharge plasma above a liquid surface (APDP) and under a liquid surface (UPDP) was compared. The effects of discharge voltage, discharge distance, initial solution conductivity and initial pH on the removal of phenol were studied. It was concluded that the removal of phenol increases with increasing discharge voltage and with decreasing discharge distance in both APDP and UPDP systems. An increase in the initial solution's conductivity has a positive effect in the APDP system but a negative effect in the UPDP system. In addition, alkaline conditions are conducive to the degradation of phenol in the APDP system, while acidic conditions are conducive in the UPDP system. Free radical quenching experiments revealed that ·O₂^- has an important influence on the degradation of phenol in the APDP system, while ·OH plays a key role in the UPDP system. This paper verifies the differences in the two discharge methods in terms of phenol removal.
- pulsed discharge plasma,
- discharge above liquid surface,
- discharge under liquid surface,
- phenol wastewater,
- active radicals

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Acknowledgments

We gratefully acknowledge the financial support from National Natural Science Foundation of China (No. 51707093).

References (37)

References

[1]	Adamovich I et al 2022 J. Phys. D: Appl. Phys. 55 373001 doi: 10.1088/1361-6463/ac5e1c
[2]	Guo H et al 2021 Chem. Eng. J. 425 130614 doi: 10.1016/j.cej.2021.130614
[3]	Wang J et al 2023 Food Chem. 403 134329 doi: 10.1016/j.foodchem.2022.134329
[4]	Zhang S et al 2023 J. Hazard. Mater. 443 130164 doi: 10.1016/j.jhazmat.2022.130164
[5]	Marinov I, Starikovskaia S and Rousseau A 2014 J. Phys. D: Appl. Phys. 47 224017 doi: 10.1088/0022-3727/47/22/224017
[6]	Zhang H et al 2021 Environ. Sci. Technol. 55 16067 doi: 10.1021/acs.est.1c01724
[7]	Abdelaziz A A, Ishijima T and Tizaoui C 2018 J. Appl. Phys. 124 053302 doi: 10.1063/1.5037107
[8]	Wang R X et al 2022 IEEE Trans. Plasma Sci. 50 863 doi: 10.1109/TPS.2022.3152492
[9]	Rodríguez-Méndez B G et al 2019 IEEE Trans. Plasma Sci. 47 2620 doi: 10.1109/TPS.2019.2908781
[10]	Zhu D et al 2014 Chemosphere 117 506 doi: 10.1016/j.chemosphere.2014.09.031
[11]	Puertas E C et al 2021 Sci. Total Environ. 782 146895 doi: 10.1016/j.scitotenv.2021.146895
[12]	Malik M A 2010 Plasma Chem. Plasma Process. 30 21 doi: 10.1007/s11090-009-9202-2
[13]	Wang M Y et al 2009 J. Environ. Sci. 21 1652 doi: 10.1016/S1001-0742(08)62469-9
[14]	Dong B Y et al 2016 High Voltage Eng. 42 377 (in Chinese)
[15]	Sun B et al 2012 J. Environ. Sci. 24 840 doi: 10.1016/S1001-0742(11)60837-1
[16]	Lukes P et al 2011 Plasma Sources Sci. Technol. 20 034011 doi: 10.1088/0963-0252/20/3/034011
[17]	Shen Y J et al 2014 Plasma Sci. Technol. 16 1020 doi: 10.1088/1009-0630/16/11/05
[18]	Belmont G et al 2019 Introduction to Plasma Physics (Amsterdam: Elsevier)
[19]	Shang K F, Li J and Morent R 2019 Plasma Sci. Technol. 21 043001 doi: 10.1088/2058-6272/aafbc6
[20]	Magureanu M et al 2021 J. Hazard. Mater. 417 125481 doi: 10.1016/j.jhazmat.2021.125481
[21]	Bruggeman P and Leys C 2009 J. Phys. D: Appl. Phys. 42 053001 doi: 10.1088/0022-3727/42/5/053001
[22]	Liang J P et al 2020 Vacuum 181 109644 doi: 10.1016/j.vacuum.2020.109644
[23]	Nagarkatti M G 1991 J. Environ. Qual. 20 882 doi: 10.2134/jeq1991.00472425002000040041x
[24]	Bader H and Hoigné J 1981 Water Res. 15 449 doi: 10.1016/0043-1354(81)90054-3
[25]	Joshi A A et al 1995 J. Hazard. Mater. 41 3 doi: 10.1016/0304-3894(94)00099-3
[26]	Wang J et al 2020 Chem. Eng. J. 385 123732 doi: 10.1016/j.cej.2019.123732
[27]	Wang D F et al 2021 J. Clean. Prod. 316 128295 doi: 10.1016/j.jclepro.2021.128295
[28]	Ke T et al 2020 Nanotechnology 31 345603 doi: 10.1088/1361-6528/ab90ba
[29]	Chen Q W et al 2022 Chem. Eng. J. 431 133961 doi: 10.1016/j.cej.2021.133961
[30]	Jiang B et al 2014 Chem. Eng. J. 236 348 doi: 10.1016/j.cej.2013.09.090
[31]	Kovačević V V et al 2017 J. Phys. D: Appl. Phys. 50 155205 doi: 10.1088/1361-6463/aa5fde
[32]	Zeghioud H et al 2020 J. Water Process. Eng. 38 101664 doi: 10.1016/j.jwpe.2020.101664
[33]	Lukes P, Clupek M and Babicky V 2011 IEEE Trans. Plasma Sci. 39 2644 doi: 10.1109/TPS.2011.2158611
[34]	Grymonpré D R et al 2004 Ind. Eng. Chem. Res. 43 1975 doi: 10.1021/ie030620j
[35]	Sugiarto A T and Sato M 2001 Thin Solid Films 386 295 doi: 10.1016/S0040-6090(00)01669-2
[36]	Ren J Y et al 2019 Plasma Sci. Technol. 21 025501 doi: 10.1088/2058-6272/aaef65
[37]	Zhang Y F et al 2018 Sep. Purif. Technol. 201 179 doi: 10.1016/j.seppur.2018.02.054

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