Investigations on MoS<sub>2</sub> plasma by infra-red pulsed laser irradiation in high vacuum

Lorenzo TORRISI; Letteria SILIPIGNI; Alfio TORRISI; Mariapompea CUTRONEO

doi:10.1088/2058-6272/ad3615

Plasma Science and Technology > 2024 > 26(7): 075507. > DOI: 10.1088/2058-6272/ad3615

Lorenzo TORRISI, Letteria SILIPIGNI, Alfio TORRISI, Mariapompea CUTRONEO. Investigations on MoS₂ plasma by infra-red pulsed laser irradiation in high vacuum[J]. Plasma Science and Technology, 2024, 26(7): 075507. DOI: 10.1088/2058-6272/ad3615

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Investigations on MoS₂ plasma by infra-red pulsed laser irradiation in high vacuum

1.
Dipartimento di Scienze Matematiche e Informatiche, Scienze Fisiche e Scienze della Terra, MIFT, Università di Messina, Messina 98166, Italy
2.
Faculty of Medicine and Surgery, Kore University of Enna, Enna 94100, Italy
3.
Nuclear Physics Institute of the CAS, Husinec Řež, Prague 25068, Czech Republic

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Author Bio:
Lorenzo TORRISI: lorenzo.torrisi@unime.it
Received Date: January 22, 2024
Revised Date: March 06, 2024
Accepted Date: March 19, 2024
Available Online: March 21, 2024
Published Date: June 26, 2024

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Abstract

Abstract

MoS₂ targets were irradiated by infra-red (IR) pulsed laser in a high vacuum to determine hot plasma parameters, atomic, molecular and ion emission, and angular and charge state distributions. In this way, pulsed laser deposition (PLD) of thin films on graphene oxide substrates was also realized. An Nd:YAG laser, operating at the 1064 nm wavelength with a 5 ns pulse duration and up to a 1 J pulse energy, in a single pulse or at a 10 Hz repetition rate, was employed. Ablation yield was measured as a function of the laser fluence. Plasma was characterized using different analysis techniques, such as time-of-flight measurements, quadrupole mass spectrometry and fast CCD visible imaging. The so-produced films were characterized by composition, thickness, roughness, wetting ability, and morphology. When compared to the MoS₂ targets, they show a slight decrease of S with respect to Mo, due to higher ablation yield, low fusion temperature and high sublimation in vacuum. The pulsed IR laser deposited MoS_x (with 1 < x < 2) films are uniform, with a thickness of about 130 nm, a roughness of about 50 nm and a higher wettability than the MoS₂ targets. Some potential applications of the pulsed IR laser-deposited MoS_x films are also presented and discussed.
- MoS₂,
- laser ablation,
- plasma,
- ion acceleration,
- quadrupole mass spectrometry,
- PLD

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Acknowledgments

The research has been realized at the CANAM (Center of Accelerators and Nuclear Analytical Methods) infrastructure LM 2015056. This publication was supported by OP RDE, MEYS, Czech Republic under the project CANAM OP (No. CZ.02.1.01/0.0/0.0/16_013/0001812) and by the Czech Science Foundation GACR (No. 23-06702S).

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Investigations on MoS₂ plasma by infra-red pulsed laser irradiation in high vacuum

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