Citation: | MU Zongxin (牟宗信), WANG Chun (王春), MU Xiaodong (牟晓东), JIA Li (贾莉), LIU Shengguang (刘升光), DONG Chuang(董闯). Experimental Study of the Effect of Applied Magnetic Field on Plasma Properties of Unbalanced Magnetron Sputtering[J]. Plasma Science and Technology, 2010, 12(5): 571-576. |
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