Microwaves Scattering by Underdense Inhomogeneous Plasma Column

ZHANG Lin (张林); OUYANG Jiting (欧阳吉庭)

doi:10.1088/1009-0630/18/3/09

Plasma Science and Technology > 2016 > 18(3): 266-272. > DOI: 10.1088/1009-0630/18/3/09

ZHANG Lin (张林), OUYANG Jiting (欧阳吉庭). Microwaves Scattering by Underdense Inhomogeneous Plasma Column[J]. Plasma Science and Technology, 2016, 18(3): 266-272. DOI: 10.1088/1009-0630/18/3/09

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Microwaves Scattering by Underdense Inhomogeneous Plasma Column

School of Physics, Beijing Institute of Technology, Beijing 100081, China

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Received Date: September 07, 2015

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Abstract

Abstract

The scattering characteristics of microwaves (MWs) by an underdense inhomoge¬neous plasma column have been investigated. The plasma column is generated by hollow cathode discharge (HCD) in a glass tube filled with low pressure argon. The plasma density in the column can be varied by adjusting the discharge current. The scattering power of X-band MWs by the column is measured at different discharge currents and receiving angles. The results show that the column can affect the properties of scattering wave significantly regardless of its plasma frequency much lower than the incident wave frequency. The power peak of the scattering wave shifts away from 0o to about ±15o direction. The finite-different time-domain (FDTD) method is employed to analyze the wave scattering by plasma column with different electron density distributions. The reflected MW power from a metal plate located behind the column is also measured to investigate the scattering effect on reducing MW reflectivity of a metal target. This study is expected to deepen the understanding of plasma-electromagnetic wave interaction and expand the applications concerning plasma antenna and plasma stealth.
- glow discharge plasma,
- microwaves scattering,
- FDTD method

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References

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