Microwaves Scattering by Underdense Inhomogeneous Plasma Column

1 Su J J, Katsouleas T, Dawson J M, et al. 1990, Physical Review A, 41: 3321 2 Zhuang Z H, Yuan N C and Liu S B. 2006, The Stealth Technology of Plasma Science. Beijing, China (in Chinese) 3 Borg G G, Harris J H, Martin N M, et al. 2000, Physics of Plasmas, 7: 2198 4 Ouyang J T, Cao J, Li S, et al. 2010, IEEE Electron Device Letters, 31: 1491 5 Milchberg H M, Clark T R, Durfee C G, et al. 1996,Physics of Plasmas, 3: 2149 6 Borg G G, Harris J H, Miljak D G, et al. 1999, Applied Physics Letters, 74: 3272 7 Domier C W, Peebles W A and Luhmann N C. 1988,Review of Scientific Instruments, 59: 1588 8 Zhang L, He F, Li S C, et al. 2013, Chinese Physics B,22: 125202 9 Kim J H, Choi S C, Shin Y H, et al. 2004, Review of Scientific Instruments, 75: 2706 10 Helaly A, Soliman E A and Megahed A A. 1997,IEE Proceedings-Microwaves Antennas and Propagation, 144: 61 11 Yin W Y, Li L W, Yeo T S, et al. 2000, Journal of Electromagnetic Waves and Applications, 14: 1429 12 Yin W Y, Li L W, Yeo T S, et al. 2001, Electromagnetics, 21: 307 13 Belostotskiy S G, Khandelwal R, Wang Q, et al. 2008,Applied Physics Letters, 92: 221507 14 Hubner S, Iordanova E, Palomares J M, et al. 2012, European Physical Journal: Applied Physics, 58: 20802 15 Wu X P, Shi J M, Wang J C, et al. 2012, Journal of Applied Physics, 111: 073303 16 Wu X P, Shi J M and Wang J C. 2014, IEEE Transactions on Plasma Science, 42: 13 17 Liu S B, Liu S Q and Yuan N C. 2006, Plasma Science and Technology, 8: 190 18 Mathew J, Fernsler R F, Meger R A, et al. 1996, Physical Review Letters, 77: 1982 19 Auciello O and Flamm D L. 1989, Plasma Diagnostics:Discharge Parameters and Chemistry. Academic Press,Boston, USA 20 Sullivan D M. 2000, Electromagnetic Simulation Using the FDTD Method. John Wiley & Sons, New Jersey,USA 21 Yu W. 2009, Electromagnetic Simulation Techniques Based on the FDTD Method. John Wiley & Sons, New Jersey, USA 22 Gunderso Lc and Holmes G T. 1968, Applied Optics, 7:801