Ion property and electrical characteristics of 60 MHz very-high-frequency magnetron discharge at low pressure

Amin JIANG (蒋阿敏); Chao YE (叶超); Xiangying WANG (王响英); Min ZHU (朱敏); Su ZHANG (张苏)

doi:10.1088/2058-6272/aad379

Plasma Science and Technology > 2018 > 20(10): 105401. > DOI: 10.1088/2058-6272/aad379

Amin JIANG (蒋阿敏), Chao YE (叶超), Xiangying WANG (王响英), Min ZHU (朱敏), Su ZHANG (张苏). Ion property and electrical characteristics of 60 MHz very-high-frequency magnetron discharge at low pressure[J]. Plasma Science and Technology, 2018, 20(10): 105401. DOI: 10.1088/2058-6272/aad379

Citation:

PDF (843 KB)

Ion property and electrical characteristics of 60 MHz very-high-frequency magnetron discharge at low pressure

¹ School of Physics Science and Technology, Soochow University, Suzhou 215006, People’s Republic of China
² Key Laboratory of Thin Films of Jiangsu Province, Soochow University, Suzhou 215006, People’s Republic of China
³ Medical College, Soochow University, Suzhou 215123, People’s Republic of China

Funds: The work was supported by National Natural Science Foun- dation of China (Nos. 11675118 and 11275136).

More Information

Received Date: May 11, 2018

Graphical Abstract

Abstract

Abstract

The pre-ionized 60 MHz very-high-frequency (VHF) magnetron discharge at low pressure, assisted by inductively coupled plasma (ICP) discharge, was developed. The measurement of ion flux density and ion energy to the substrate was carried out by a retarding field energy analyzer. The electric characteristics of discharge were also investigated by voltage–current probe technique. It was found that by reducing the discharge pressure of VHF magnetron discharge from 5 to 1 Pa, the ion flux density increased about four times, meanwhile the ion energy also increased doubly. The electric characteristics of discharge also showed that a little improvement of sputtering effectiveness was achieved by reducing discharge pressure. Therefore, the deposition property of VHF (60 MHz) magnetron sputtering can be improved by reducing the discharge pressure using the ICP-assisted pre-ionized discharge.
- VHF magnetron sputtering,
- low pressure discharge,
- ion property,
- electric characteristic

FullText(HTML)

References (34)

References

[1]	Br?auer G et al 2010 Vacuum 84 1354
[2]	Kelly P J and Arnell R D 2000 Vacuum 56 159
[3]	Mu Z X et al 2011 Plasma Sci. Technol. 13 667
[4]	Umm-i-Kalsoom et al 2013 Plasma Sci. Technol. 15 666
[5]	Wang Q et al 2013 Plasma Sci. Technol. 15 807
[6]	Yan R et al 2014 Plasma Sci. Technol. 16 1158
[7]	Stranak V et al 2011 Contrib. Plasma Phys. 51 237
[8]	Stranak V et al 2009 J. Phys. D: Appl. Phys. 42 105204
[9]	Stranak V et al 2012 Appl. Phys. Lett. 100 141604
[10]	Huang F P et al 2014 Plasma Sources Sci. Technol. 23 015003
[11]	Ye C et al 2014 Phys. Plasma 21 043509
[12]	Liu Y et al 2015 Thin Solid Films 579 1
[13]	Jang Y H et al 1997 J. Electrochem. Soc. 144 3973
[14]	He H J et al 2014 ECS J. Solid State Sci. Technol. 3 Q74
[15]	Prenzel M et al 2013 J. Phys. D. Appl. Phys. 46 084004
[16]	Guo J M et al 2017 Plasma Sci. Technol. 19 075502
[17]	Yang P F et al 2017 Plasma Sci. Technol. 19 085504
[18]	Poolcharuansin P, Liebig B and Bradley J 2010 IEEE Trans. Plasma Sci. 38 3007
[19]	Anders A and Yushkov G Y 2009 J. Appl. Phys. 105 073301
[20]	Stranak V et al 2012 J. Appl. Phys. 112 093305
[21]	Va?ina P et al 2007 Plasma Sources Sci. Technol. 16 501
[22]	Kulisch W et al 2006 Appl. Phys. A 82 503
[23]	Huang S Y et al 2012 J. Appl. Phys. 111 036101
[24]	Huang F P et al 2013 Plasma Sci. Technol. 15 1197
[25]	Stranak V et al 2012 Surf. Coat. Technol. 206 2801
[26]	Stranak V et al 2011 Eur. Phys. J. D 64 427
[27]	Ostrikov K, Neyts E C and Meyyappan M 2013 Adv. Phys. 62 113
[28]	Godyak V A, Piejak R B and Alexandrovich B M 1991 IEEE Trans. Plasma Sci. 19 660
[29]	Depla D, Mahieu S and De Gryse R 2009 Thin Solid Films 517 2825
[30]	Tadjine R, Alim M M and Kechouane M 2017 Surf. Coat. Technol. 309 573
[31]	Xiang N 2004 Phys. Plasmas 11 4213
[32]	Taillet J 1969 Am. J. Phys. 37 423
[33]	Godyak V A and Popov O A 1979 Sov. J. Plasma Phys. 5 227
[34]	Chabert P and Braithwaite N 2011 Physics of Radio-Frequency Plasmas (New York: Cambridge University Press)

[1]	Weichen NI, Chao YE, Yiqing YU, Xiangying WANG. Effect of gas pressure on ion energy at substrate side of Ag target radio-frequency and very-high-frequency magnetron sputtering discharge[J]. Plasma Science and Technology, 2022, 24(2): 025506. DOI: 10.1088/2058-6272/ac3c3e
[2]	Minglei SHAN (单鸣雷), Bingyan CHEN (陈秉岩), Cheng YAO (姚澄), Qingbang HAN (韩庆邦), Changping ZHU (朱昌平), Yu YANG (杨雨). Electric characteristic and cavitation bubble dynamics using underwater pulsed discharge[J]. Plasma Science and Technology, 2019, 21(7): 74002-074002. DOI: 10.1088/2058-6272/ab0b62
[3]	Min ZHU (朱敏), Chao YE (叶超), Xiangying WANG (王响英), Amin JIANG (蒋阿敏), Su ZHANG (张苏). Effect of radio-frequency substrate bias on ion properties and sputtering behavior of 2 MHz magnetron sputtering[J]. Plasma Science and Technology, 2019, 21(1): 15507-015507. DOI: 10.1088/2058-6272/aae7dd
[4]	Jian YANG (杨健), Angjian WU (吴昂键), Xiaodong LI (李晓东), Yang LIU (刘阳), Fengsen ZHU (朱凤森), Zhiliang CHEN (陈志良), Jianhua YAN (严建华), Ruijuan CHEN (陈瑞娟), Wangjun SHEN (沈望俊). Experimental and simulation investigation of electrical and plasma parameters in a low pressure inductively coupled argon plasma[J]. Plasma Science and Technology, 2017, 19(11): 115402. DOI: 10.1088/2058-6272/aa885f
[5]	Yaqi YANG (杨亚奇), Weiguo LI (李卫国), Yu XIA (夏喻), Chuangye YUAN (袁创业). Characteristics of long-gap AC streamer discharges under low pressure conditions[J]. Plasma Science and Technology, 2017, 19(10): 105401. DOI: 10.1088/2058-6272/aa79fe
[6]	Jiamin GUO (郭佳敏), Chao YE (叶超), Xiangying WANG (王响英), Peifang YANG (杨培芳), Su ZHANG (张苏). Growth and structural properties of silicon on Ag films prepared by 40.68 MHz veryhigh-frequency magnetron sputtering[J]. Plasma Science and Technology, 2017, 19(7): 75502-075502. DOI: 10.1088/2058-6272/aa6395
[7]	RAN Huijuan(冉慧娟), WANG Lei(王磊), WANG Jue(王珏), WANG Tao(王涛), YAN Ping(严萍). Discharge Characteristics of SF₆ in a Non-Uniform Electric Field Under Repetitive Nanosecond Pulses[J]. Plasma Science and Technology, 2014, 16(5): 465-470. DOI: 10.1088/1009-0630/16/5/05
[8]	LIU Wenzheng(刘文正), WANG Hao(王浩), DOU Zhijun(窦志军). Impact of the Insulator on the Electric Field and Generation Characteristics of Vacuum Arc Metal Plasmas[J]. Plasma Science and Technology, 2014, 16(2): 134-141. DOI: 10.1088/1009-0630/16/2/09
[9]	CHANG Zhengshi(常正实), YAO Congwei(姚聪伟), MU Haibao(穆海宝), ZHANG Guanjun(张冠军). Study on the Property Evolution of Atmospheric Pressure Plasma Jets in Helium[J]. Plasma Science and Technology, 2014, 16(1): 83-88. DOI: 10.1088/1009-0630/16/1/18
[10]	MU Zongxin, LIU Shengguang, ZANG Hairong, WANG Chun, MU Xiaodong. Discharge Properties of High-Power Pulsed Unbalanced Magnetron Sputtering[J]. Plasma Science and Technology, 2011, 13(6): 667-671.