Effect of gas pressure on ion energy at substrate side of Ag target radio-frequency and very-high-frequency magnetron sputtering discharge

Weichen NI; Chao YE; Yiqing YU; Xiangying WANG

doi:10.1088/2058-6272/ac3c3e

Plasma Science and Technology > 2022 > 24(2): 025506. > DOI: 10.1088/2058-6272/ac3c3e

Weichen NI, Chao YE, Yiqing YU, Xiangying WANG. Effect of gas pressure on ion energy at substrate side of Ag target radio-frequency and very-high-frequency magnetron sputtering discharge[J]. Plasma Science and Technology, 2022, 24(2): 025506. DOI: 10.1088/2058-6272/ac3c3e

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Effect of gas pressure on ion energy at substrate side of Ag target radio-frequency and very-high-frequency magnetron sputtering discharge

1.
School of Physics Science and Technology, Soochow University, Suzhou 215006, People's Republic of China
2.
Key Laboratory of Thin Films of Jiangsu Province, Soochow University, Suzhou 215006, People's Republic of China
3.
Medical College, Soochow University, Suzhou 215123, People's Republic of China

More Information

Corresponding author:
Chao YE, E-mail: cye@suda.edu.cn
Received Date: June 28, 2021
Revised Date: November 17, 2021
Accepted Date: November 21, 2021
Available Online: February 22, 2024
Published Date: January 16, 2022

Graphical Abstract

Abstract

Abstract

The effect of gas pressure on ion energy distribution at the substrate side of Ag target radio-frequency (RF) and very-high-frequency (VHF) magnetron sputtering discharge was investigated. At lower pressure, the evolution of maximum ion energy (E) with discharge voltage (V) varied with the excitation frequency, due to the joint contribution of the ion generation in the bulk plasma and the ion movement across the sheath related to the ion transit sheath time τ_i and RF period τ_RF. At higher pressure, the evolution of E–V relationships did not vary with the excitation frequency, due to the balance between the energy lost through collisions and the energy gained by acceleration in the electric field. Therefore, for RF and VHF magnetron discharge, lower gas pressure can have a clear influence on the E–V relationship.
- excitation frequency,
- gas pressure,
- ion energy,
- magnetron sputtering discharge

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Acknowledgments

The work was supported by National Natural Science Foundation of China (No. 11275136).

References (36)

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